Patents by Inventor Albert Johannes Maria Jansen
Albert Johannes Maria Jansen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9470988Abstract: A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.Type: GrantFiled: October 17, 2013Date of Patent: October 18, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Albert Johannes Maria Jansen, Andre Bernardus Jeunink, Johannes Mathias Theodorus Antonius Adriaens, Frank Auer, Peterjan Broomans, Suzanne Johanna Antonetta Geertruda Cosijns, Willem Herman Gertruda Anna Koenen, Sebastiaan Smit, Joris Wilhelmus Henricus Vermunt
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Publication number: 20150277242Abstract: A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.Type: ApplicationFiled: October 17, 2013Publication date: October 1, 2015Applicant: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Albert Johannes Maria Jansen, Andre Bernardus Jeunink, Johannes Mathias Theodorus Antonius Adriaens, Frank Auer, Peterjan Broomans, Suzanne Johanna Antonetta Geertruda Cosijns, Willem Herman Gertruda Anna Koenen, Sebastiaan Smit, Joris Wilhelmus Henricus Vermunt
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Patent number: 8755026Abstract: An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.Type: GrantFiled: December 16, 2010Date of Patent: June 17, 2014Assignee: ASML Netherlands B.V.Inventors: Jeroen Gerard Gosen, Albert Johannes Maria Jansen, Nicolaas Ten Kate, Marco Koert Stavenga, Koen Steffens, Laurentius Johannes Adrianus Van Bokhoven, Henricus Jozef Castelijns, Koen Cuypers
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Publication number: 20110149258Abstract: An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.Type: ApplicationFiled: December 16, 2010Publication date: June 23, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Gerard Gosen, Albert Johannes Maria Jansen, Nicolaas Ten Kate, Marco Koert Stavenga, Koen Steffens, Laurentius Johannes Adrianus Van Bokhoven, Henricus Jozef Castelijns, Koen Cuypers
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Patent number: 7459701Abstract: A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing the object table in a first direction. The apparatus further includes a clamping device for clamping the object to the object table by a first clamping force, the first clamping force being controlled by an electronic control unit based upon a state of the object.Type: GrantFiled: June 8, 2005Date of Patent: December 2, 2008Assignee: ASML Netherlands B.V.Inventors: Marcel Koenraad Marie Baggen, Dirk-Jan Bijvoet, Sjoerd Nicolaas Lambertus Donders, Jan Frederik Hoogkamp, Albert Johannes Maria Jansen, Jan-Jaap Kuit, Peter Schaap, Joep Janssen, Hubrecht Bastiaan Jasperse, Arjan Martin Van Der Wel
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Patent number: 7423722Abstract: A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.Type: GrantFiled: January 29, 2004Date of Patent: September 9, 2008Assignee: ASML Netherlands B.V.Inventors: Albert Johannes Maria Jansen, Jan Jaap Kuit, Erik Roelof Loopstra, Raymond Laurentius Johannes Schrijver
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Publication number: 20080137049Abstract: A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.Type: ApplicationFiled: February 5, 2008Publication date: June 12, 2008Applicant: ASML Netherlands B.V.Inventors: Johannes Christiaan Maria Jasper, Marcel Koenraad Marie Baggen, Richard Joseph Bruls, Orlando Serapio Cicilia, Hendrikus Alphonsus Ludovicus Van Dijck, Gerardus Carolus Johannus Hofmans, Albert Johannes Maria Jansen, Carlo Cornelis Maria Luijten, Willem Richard Pongers, Martijn Gerard Dominique Wehrens, Tammo Uitterdijk, Herman Boom, Marcel Johannes Louis Marie Demarteau
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Patent number: 7239370Abstract: In a projection system a pattern plane on a reticle is illuminated to have a projection image focussed on an image plane. The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle the image plane of the projection image needs to be adapted for proper focussing. A compensator counteracts the virtual shift of pattern plane due to the pellicle, by shifting the position of the pattern plane.Type: GrantFiled: December 19, 2003Date of Patent: July 3, 2007Assignee: ASML Netherlands B.V.Inventors: Albert Johannes Maria Jansen, Marcel Koenraad Marie Baggen, Johannes Christiaan Maria Jasper, Raymond Laurentius Johannes Schrijver, Richard Joseph Bruls, Johannes Jacobus Matheus Baselmans, Willem Richard Pongers, Tammo Uitterdijk
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Publication number: 20040174509Abstract: In a projection system a pattern plane on a reticle is illuminated to have a projection image focussed on an image plane. The presence of a pellicle in the optical path causes a virtual shift of the position of the pattern plane on the reticle. Depending on the presence or absence of the pellicle the image plane of the projection image needs to be adapted for proper focussing. A compensator counteracts the virtual shift of pattern plane due to the pellicle, by shifting the position of the pattern plane.Type: ApplicationFiled: December 19, 2003Publication date: September 9, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Albert Johannes Maria Jansen, Marcel Koenraad Marie Baggen, Johannes Christiaan Maria Jasper, Raymond Laurentius Johannes Schrijver, Richard Joseph Bruls, Johannes Jacobus Matheus Baselmans, Willem Richard Pongers, Tammo Uitterdijk