Patents by Inventor Albert Karabekov
Albert Karabekov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11264202Abstract: A method, a non-transitory computer readable medium and a three-dimensional evaluation system for providing three dimensional information regarding structural elements of a specimen. The method can include illuminating the structural elements with electron beams of different incidence angles, where the electron beams pass through the structural elements and the structural elements are of nanometric dimensions; detecting forward scattered electrons that are scattered from the structural elements to provide detected forward scattered electrons; and generating the three dimensional information regarding structural elements based at least on the detected forward scattered electrons.Type: GrantFiled: May 18, 2020Date of Patent: March 1, 2022Assignee: APPLIED MATERIALS ISRAEL LTD.Inventors: Konstantin Chirko, Itamar Shani, Albert Karabekov, Guy Eytan, Lior Yaron, Alon Litman
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Publication number: 20210358712Abstract: A method, a non-transitory computer readable medium and a three-dimensional evaluation system for providing three dimensional information regarding structural elements of a specimen. The method can include illuminating the structural elements with electron beams of different incidence angles, where the electron beams pass through the structural elements and the structural elements are of nanometric dimensions; detecting forward scattered electrons that are scattered from the structural elements to provide detected forward scattered electrons; and generating the three dimensional information regarding structural elements based at least on the detected forward scattered electrons.Type: ApplicationFiled: May 18, 2020Publication date: November 18, 2021Applicant: Applied Materials Israel Ltd.Inventors: Konstantin Chirko, Itamar Shani, Albert Karabekov, Guy Eytan, Lior Yaron, Alon Litman
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Patent number: 10716197Abstract: A computer program product and a method for dissipation of an electrical charge stored in a region of an object. The method may include (a) sensing, by at least one sensor, an electrical charging status of the region of the object, while the object is located within a vacuum chamber and while a gaseous pressure within the vacuum chamber is below a certain vacuum pressure threshold; and (b) performing, based on the charging status of the given region, an electrical charge dissipation process that comprises increasing the gaseous pressure within the vacuum chamber to be within a given gaseous pressure range that facilitates a dissipation, by breakdown, of the electrical charge stored in the region of the object to the vacuum chamber.Type: GrantFiled: September 19, 2017Date of Patent: July 14, 2020Assignee: APPLIED MATERIALS ISRAEL LTD.Inventors: Guy Eytan, Emil Weisz, Samuel Ives Nackash, Albert Karabekov
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Publication number: 20190090335Abstract: A computer program product and a method for dissipation of an electrical charge stored in a region of an object. The method may include (a) sensing, by at least one sensor, an electrical charging status of the region of the object, while the object is located within a vacuum chamber and while a gaseous pressure within the vacuum chamber is below a certain vacuum pressure threshold; and (b) performing, based on the charging status of the given region, an electrical charge dissipation process that comprises increasing the gaseous pressure within the vacuum chamber to be within a given gaseous pressure range that facilitates a dissipation, by breakdown, of the electrical charge stored in the region of the object to the vacuum chamber.Type: ApplicationFiled: September 19, 2017Publication date: March 21, 2019Applicant: APPLIED MATERIALS ISRAEL LTD.Inventors: Guy Eytan, Emil Weisz, Samuel Ives Nackash, Albert Karabekov
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Patent number: 10156785Abstract: A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask.Type: GrantFiled: June 8, 2016Date of Patent: December 18, 2018Assignee: Applied Materials Israel Ltd.Inventors: Alon Litman, Nir Ben-David Dodzin, Albert Karabekov, Alex Goldenshtein
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Publication number: 20160282714Abstract: A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography maskType: ApplicationFiled: June 8, 2016Publication date: September 29, 2016Inventors: Alon Litman, Nir Ben-David Dodzin, Albert Karabekov, Alex Goldenshtein
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Patent number: 9366954Abstract: A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask.Type: GrantFiled: July 23, 2013Date of Patent: June 14, 2016Assignee: Applied Materials Israel Ltd.Inventors: Alon Litman, Nir Ben-David Dodzin, Albert Karabekov, Alex Goldenshtein
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Publication number: 20150028203Abstract: A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography maskType: ApplicationFiled: July 23, 2013Publication date: January 29, 2015Applicant: Applied Materials Israel, Ltd.Inventors: Alon Litman, Nir Ben-David Dodzin, Albert Karabekov, Alex Goldenshtein
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Patent number: 7525091Abstract: A method and system for inspecting an inspected object. The system includes: a detector adapted to detect charged particles scattered from a sample; a magnetic lens adapted to generate a magnetic field such as to direct a charge particle beam towards a sample and an first electrode positioned very close to an inspected object, wherein the first electrode comprises a very thin portion that defines a narrow aperture through which the charged particle beam can propagate.Type: GrantFiled: August 23, 2006Date of Patent: April 28, 2009Assignee: Applied Materials, Israel, Ltd.Inventors: Igor Petrov, Guy Eitan, Albert Karabekov
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Publication number: 20080073531Abstract: A method and system for inspecting an inspected object. The system includes: a detector adapted to detect charged particles scattered from a sample; a magnetic lens adapted to generate a magnetic field such as to direct a charge particle beam towards a sample and an first electrode positioned very close to an inspected object, wherein the first electrode comprises a very thin portion that defines a narrow aperture through which the charged particle beam can propagate.Type: ApplicationFiled: August 23, 2006Publication date: March 27, 2008Inventors: Igor Petrov, Guy Eitan, Albert Karabekov
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Patent number: 7112803Abstract: A method and system are presented for directing a charged particle beam towards and away from a sample. The system comprises a lens arrangement having an electrode formed with a beam opening for a charged particle beam passage therethrough; and a magnetic deflector. The magnetic deflector has a magnetic circuit formed by a core part for carrying excitation coils and a polepieces part. The polepieces of the magnetic deflector are in electrical communication with the electrode of the lens arrangement and are electrically insulated from the other part of the magnetic circuit.Type: GrantFiled: July 23, 2004Date of Patent: September 26, 2006Assignee: Applied Materials, Israel, Ltd.Inventors: Igor Petrov, Igor Krivts (Krayvitz), Albert Karabekov
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Publication number: 20060016988Abstract: A method and system are presented for directing a charged particle beam towards and away from a sample. The system comprises a lens arrangement having an electrode formed with a beam opening for a charged particle beam passage therethrough; and a magnetic deflector. The magnetic deflector has a magnetic circuit formed by a core part for carrying excitation coils and a polepieces part. The polepieces of the magnetic deflector are in electrical communication with the electrode of the lens arrangement and are electrically insulated from the other part of the magnetic circuit.Type: ApplicationFiled: July 23, 2004Publication date: January 26, 2006Inventors: Igor Petrov, Igor Krivts (Krayvitz), Albert Karabekov