Patents by Inventor Albert Lang, Jr.

Albert Lang, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • 2,6-Bis(1-piperidinoalkylideneamino)anthraquinones and method of treating cecal and hepatic amebic infections therewith
    Patent number: 4118498
    Abstract: Novel 2,6-bis(1-piperidinoalkylideneamino)anthraquinones that are effective against cecal and hepatic amebic infestations in warm-blooded animals are disclosed.
    Type: Grant
    Filed: November 15, 1977
    Date of Patent: October 3, 1978
    Assignee: American Cyanamid Company
    Inventors: Stanley Albert Lang, Jr., Paul Frank Fabio, Yang-I Lin, Keith Chadwick Murdock, Thomas Lynn Fields
  • Pyrazolyltriazole herbicides
    Patent number: 4115097
    Abstract: The invention is novel 4-(pyrazolyl)-4H-1,2,4-triazoles, the preparation thereof including their salts, and a method for controlling undesirable plant species therewith.
    Type: Grant
    Filed: April 27, 1977
    Date of Patent: September 19, 1978
    Assignee: American Cyanamid Company
    Inventors: Stanley Albert Lang, Jr., Bryant Leonidas Walworth
  • 2,3-Bis(4-alkyl-1-piperazinyl)quinoxalines
    Patent number: 4029788
    Abstract: This disclosure describes compounds of the class of 5- or 6-substituted 2,3-bis(4-alkyl-1-piperazinyl)quinoxalines useful for ameliorating cecal and hepatic amebic infestations in warm-blooded animals.
    Type: Grant
    Filed: July 16, 1976
    Date of Patent: June 14, 1977
    Assignee: American Cyanamid Company
    Inventors: Paul Frank Fabio, Yang-I Lin, Stanley Albert Lang, Jr., Andrew Stephen Tomcufcik
  • Sputter coating apparatus having improved target electrode structure
    Patent number: 3933644
    Abstract: A gaseous discharge sputter coating apparatus is described for sequentially sputtering different materials onto discrete batches of substrate objects. The apparatus includes a chamber defining a controlled environment capable of sustaining a gaseous discharge, a table within the chamber for supporting separate batches of substrate objects, and means for sustaining a gaseous discharge within the chamber. A plurality of target electrode structures is also provided, each of which has a surface in the chamber which has a layer on it of one of the materials desired to be coated onto the substrate objects. The target electrode structures are part of the wall of the controlled environment chamber, and each includes an insulating material separating it from the remainder of the wall. In order to obviate the necessity of including a ground shield around each of the target electrodes, only that portion of the electrode within the chamber having the material on it has power applied to it to cause the sputtering.
    Type: Grant
    Filed: May 24, 1973
    Date of Patent: January 20, 1976
    Assignee: Varian Associates
    Inventors: James R. Skinner, Albert Lang, Jr.