Patents by Inventor Albert Schnieders

Albert Schnieders has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230285909
    Abstract: A method for manufacturing a porous device (10) is described. The method comprises creating (340) a carbon nanomembrane (40) on a top surface (22) of a base material (20) having latent pores (23) and etching (360) the latent pores (23) in the base material (20) to form open pores (24). The porous device (10) can be used as a filtration device.
    Type: Application
    Filed: April 27, 2023
    Publication date: September 14, 2023
    Applicant: CNM Technologies GmbH
    Inventors: Nikolaus Meyerbröker, Polina Angelova, Albert Schnieders, Henning Vieker
  • Patent number: 11666866
    Abstract: A method for manufacturing a porous device (10) is described. The method comprises creating (340) a carbon nanomembrane (40) on a top surface (22) of a base material (20) having latent pores (23) and etching (360) the latent pores (23) in the base material (20) to form open pores (24). The porous device (10) can be used as a filtration device.
    Type: Grant
    Filed: May 27, 2019
    Date of Patent: June 6, 2023
    Assignee: CNM Technologies GmbH
    Inventors: Nikolaus Meyerbröker, Polina Angelova, Albert Schnieders, Henning Vieker
  • Publication number: 20210205763
    Abstract: A method for manufacturing a porous device (10) is described. The method comprises creating (340) a carbon nanomembrane (40) on a top surface (22) of a base material (20) having latent pores (23) and etching (360) the latent pores (23) in the base material(20) to form open pores (24). The porous device (10) can be used as a filtration device.
    Type: Application
    Filed: May 27, 2019
    Publication date: July 8, 2021
    Inventors: Nikolaus Meyerbröker, Polina Angelova, Albert Schnieders, Henning Vieker
  • Patent number: 11009802
    Abstract: A pellicle for a lithographic device and a method for its manufacture. The pellicle comprises a carbon-based film having a thickness of between 0.1 nm and 10 nm and at least one layer of cross-linked aromatic molecules, heteroaromatic molecules, or polyyne-based or polyene-based amphiphilic molecules. The carbon-based film has a periphery and a center portion and the center portion is transparent to the radiation beam. A support structure is coupled at least to the periphery of the carbon-based film.
    Type: Grant
    Filed: January 13, 2016
    Date of Patent: May 18, 2021
    Assignee: CNM TECHNOLOGIES GMBH
    Inventor: Albert Schnieders
  • Publication number: 20200197860
    Abstract: A method of separating fluidic water from impure fluids is disclosed. The impure fluids comprising fluidic water and one or more substances having a kinetic diameter similar to that of water molecules. The kinetic diameter of the one or more substances is at most 50% and preferably 33% greater than that of the water molecules. The method comprises applying to a first side of a carbon nanomembrane the impure fluid; and collecting from the opposite of the carbon nanomembrane the fluidic water. The method can be used in filter applications.
    Type: Application
    Filed: May 28, 2018
    Publication date: June 25, 2020
    Inventors: Wulf Siegfried Luck, Xianghui Zhang, Yang Yang, Armin Gölzhäuser, Albert Schnieders
  • Patent number: 10646831
    Abstract: A method for the manufacture of a carbon nanomembrane is disclosed. The method comprises preparing a metallised polymer substrate and applying on the metallised polymer substrate a monolayer prepared from an aromatic molecule. The aromatic molecule is cross-linked to form a carbon nanomembrane. The carbon nanomembrane is coated by a protective layer and subsequently the carbon nanomembrane and the protective layer are released from the metallised polymer substrate. Finally, the carbon nanomembrane and the protective layer are optionally placed on a support. The protective layer can be optionally removed. The carbon nanomembrane can be used for filtration.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: May 12, 2020
    Assignee: CNM Technologies GmbH
    Inventors: Polina Angelova, Albert Schnieders
  • Publication number: 20200087147
    Abstract: The present invention relates to the immobilisation of nucleic acids or other biomolecules on surfaces which are suitable amongst other purposes for biosensors. The invention provides a method and use of an azide-terminated CNM that may be functionalised by coupling of receptors or oligonucleotides.
    Type: Application
    Filed: June 1, 2018
    Publication date: March 19, 2020
    Inventors: Albert Schnieders, Nikolaus Meyerbröker, Axel Vater, Christian Maasch, Lucas Bethge
  • Publication number: 20180284598
    Abstract: A pellicle for a lithographic device and a method for its manufacture. The pellicle comprises a carbon-based film having a thickness of between 0.1 nm and 10 nm and at least one layer of cross-linked aromatic molecules, heteroaromatic molecules, or polyyne-based or polyene-based amphiphilic molecules. The carbon-based film has a periphery and a center portion and the center portion is transparent to the radiation beam. A support structure is coupled at least to the periphery of the carbon-based film.
    Type: Application
    Filed: January 13, 2016
    Publication date: October 4, 2018
    Inventor: Albert SCHNIEDERS
  • Publication number: 20180236410
    Abstract: A method for the manufacture of a carbon nanomembrane is disclosed. The method comprises preparing a metallised polymer substrate and applying on the metallised polymer substrate a monolayer prepared from an aromatic molecule. The aromatic molecule is cross-linked to form a carbon nanomembrane. The carbon nanomembrane is coated by a protective layer and subsequently the carbon nanomembrane and the protective layer are released from the metallised polymer substrate. Finally, the carbon nanomembrane and the protective layer are optionally placed on a support. The protective layer can be optionally removed. The carbon nanomembrane can be used for filtration.
    Type: Application
    Filed: April 24, 2018
    Publication date: August 23, 2018
    Inventors: Polina Angelova, Albert Schnieders