Abstract: A random intrinsic chip ID generation employs a retention fail signature. A 1st and 2nd ID are generated using testing settings with a 1st setting more restrictive than the 2nd, creating more fails in the 1st ID bit string that includes 2nd ID bit string. A retention pause time controls the number of retention fails, adjusted by a BIST engine, wherein the fail numbers satisfy a predetermined fail target. Verification confirms whether the 1st ID includes the 2nd ID bit string, the ID being the one used for authentication. Authentication is enabled by a 3rd ID with intermediate condition such that 1st ID includes 3rd ID bit string and 3rd ID includes 2nd ID bit string. The intermediate condition includes a guard-band to eliminate bit instability problem near the 1st and 2nd ID boundary. The intermediate condition is changed at each ID read operation, resulting in a more secure identification.

Abstract: A random intrinsic chip ID generation employs a retention fail signature. A 1st and 2nd ID are generated using testing settings with a 1st setting more restrictive than the 2nd, creating more fails in the 1st ID bit string that includes 2nd ID bit string. A retention pause time controls the number of retention fails, adjusted by a BIST engine, wherein the fail numbers satisfy a predetermined fail target. Verification confirms whether the 1st ID includes the 2nd ID bit string, the ID being the one used for authentication. Authentication is enabled by a 3rd ID with intermediate condition such that 1st ID includes 3rd ID bit string and 3rd ID includes 2nd ID bit string. The intermediate condition includes a guard-band to eliminate bit instability problem near the 1st and 2nd ID boundary. The intermediate condition is changed at each ID read operation, resulting in a more secure identification.

Abstract: An antifuse having a link including a region of unsilicided semiconductor material may be programmed at reduced voltage and current and with reduced generation of heat by electromigration of metal or silicide from a cathode into the region of unsilicided semiconductor material to form an alloy having reduced bulk resistance. The cathode and anode are preferably shaped to control regions from which and to which material is electrically migrated. After programming, additional electromigration of material can return the antifuse to a high resistance state. The process by which the antifuse is fabricated is completely compatible with fabrication of field effect transistors and the antifuse may be advantageously formed on isolation structures.

Abstract: An antifuse having a link including a region of unsilicided semiconductor material may be programmed at reduced voltage and current and with reduced generation of heat by electromigration of metal or silicide from a cathode into the region of unsilicided semiconductor material to form an alloy having reduced bulk resistance. The cathode and anode are preferably shaped to control regions from which and to which material is electrically migrated. After programming, additional electromigration of material can return the antifuse to a high resistance state. The process by which the antifuse is fabricated is completely compatible with fabrication of field effect transistors and the antifuse may be advantageously formed on isolation structures.

Abstract: An antifuse having a link including a region of unsilicided semiconductor material may be programmed at reduced voltage and current and with reduced generation of heat by electromigration of metal or silicide from a cathode into the region of unsilicided semiconductor material to form an alloy having reduced bulk resistance. The cathode and anode are preferably shaped to control regions from which and to which material is electrically migrated. After programming, additional electromigration of material can return the antifuse to a high resistance state. The process by which the antifuse is fabricated is completely compatible with fabrication of field effect transistors and the antifuse may be advantageously formed on isolation structures.

Abstract: An antifuse having a link including a region of unsilicided semiconductor material may be programmed at reduced voltage and current and with reduced generation of heat by electromigration of metal or silicide from a cathode into the region of unsilicided semiconductor material to form an alloy having reduced bulk resistance. The cathode and anode are preferably shaped to control regions from which and to which material is electrically migrated. After programming, additional electromigration of material can return the antifuse to a high resistance state. The process by which the antifuse is fabricated is completely compatible with fabrication of field effect transistors and the antifuse may be advantageously formed on isolation structures.

Abstract: An antifuse having a link including a region of unsilicided semiconductor material may be programmed at reduced voltage and current and with reduced generation of heat by electromigration of metal or silicide from a cathode into the region of unsilicided semiconductor material to form an alloy having reduced bulk resistance. The cathode and anode are preferably shaped to control regions from which and to which material is electrically migrated. After programming, additional electromigration of material can return the antifuse to a high resistance state. The process by which the antifuse is fabricated is completely compatible with fabrication of field effect transistors and the antifuse may be advantageously formed on isolation structures.

Abstract: An antifuse structure includes a sense pad contact region that is separate from an anode contact region and a cathode contact region. By including the sense pad contact region that is separate from the anode contact region and the cathode contact region, a programming current flow when programming the antifuse structure may travel a different pathway than a sense current flow when sensing the antifuse structure. In particular a sense current flow may avoid a depletion region created within the cathode contact region when programming the antifuse structure.

Abstract: An antifuse having a link including a region of unsilicided semiconductor material may be programmed at reduced voltage and current and with reduced generation of heat by electromigration of metal or silicide from a cathode into the region of unsilicided semiconductor material to form an alloy having reduced bulk resistance. The cathode and anode are preferably shaped to control regions from which and to which material is electrically migrated. After programming, additional electromigration of material can return the antifuse to a high resistance state. The process by which the antifuse is fabricated is completely compatible with fabrication of field effect transistors and the antifuse may be advantageously formed on isolation structures.