Patents by Inventor Alberto D. Dioses
Alberto D. Dioses has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9499698Abstract: The present invention relates to a novel composition with improved stability containing soluble, multi-ligand-substituted metal compound, a polyol compound and a solvent useful for filling material on photoresist patterns with good trench or via filling properties of microlithographic features, where the filled patterns having good plasma etch resistance in oxygen based plasmas and are used as a hard mask in forming fine patterns on semiconductor substrates by pattern transfer of this hard mask. The present invention further relates to using the novel composition in methods for manufacturing electronic devices.Type: GrantFiled: February 11, 2015Date of Patent: November 22, 2016Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG)S.A.R.L.Inventors: Huirong Yao, Elizabeth Wolfer, Salem K. Mullen, Alberto D. Dioses, JoonYeon Cho
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Patent number: 9418836Abstract: The present invention relates to novel compositions comprising a metal component selected from a group chosen from at least one polyoxometalate, at least one heteropolyoxometalate and a mixture thereof; and, at least one organic component. The present invention also relates to methods of preparing the nanorod arrays and the nanorod materials and films. The present invention also relates to novel compositions to generate metal-oxide rich films, and also relates to processes for via or trench filling, reverse via or trench filling and imaging with underlayers. The materials are useful in wide range of manufacturing applications in many industries, including the semiconductor devices, electro-optical devices and energy storage industry.Type: GrantFiled: July 29, 2014Date of Patent: August 16, 2016Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Venkata Gopal Reddy Chada, Huirong Yao, Munirathna Padmanaban, JoonYeon Cho, Elizabeth Wolfer, Alberto D. Dioses, Salem K. Mullen
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Publication number: 20160230019Abstract: The present invention relates to a novel composition with improved stability containing soluble, multi-ligand-substituted metal compound, a polyol compound and a solvent useful for filling material on photoresist patterns with good trench or via filling properties of microlithographic features, where the filled patterns having good plasma etch resistance in oxygen based plasmas and are used as a hard mask in forming fine patterns on semiconductor substrates by pattern transfer of this hard mask. The present invention further relates to using the novel composition in methods for manufacturing electronic devices.Type: ApplicationFiled: February 11, 2015Publication date: August 11, 2016Inventors: Huirong YAO, Elizabeth WOLFER, Salem K. MULLEN, Alberto D. DIOSES, JoonYeon CHO
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Patent number: 9409793Abstract: The present invention relates to a novel spin coatable composition comprising (a) metallosilicic acid; (b) at least one compound comprising two or more 4-hydroxyphenyl groups; and, c) a solvent. The component b) can be a 4-hydroxyphenyl compound of structure (I) wherein W is a linking group chosen from the group consisting of an organic linking moiety, a heteroatom containing linking moiety and a direct valence bond, m is a positive integer of 1 and n is a positive integer equal to 1 or and Ri, Rii, Riii and Riv are independently chosen substituents from a group consisting of hydrogen, (C1-C6) alkyl, (C1-C6) alkoxy, (C6-C20) aryl, halides (such as Cl, I, F), hydroxyl, alkylcarbonyl (alkyl-C(?O)—), alkylcarbonyloxy (alkyl-C(?O)—O—), alkyloxycarbonyl (alkyl-O—C(?O)—), alkyloxycarbonyloxy (alkyl-O—C(?O)—O—) and mixtures of these; and a solvent. The present invention further relates to processes using the novel compositions.Type: GrantFiled: January 14, 2014Date of Patent: August 9, 2016Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Venkata Gopal Reddy Chada, Huirong Yao, Salem Mullen, Elizabeth Wolfer, Alberto D. Dioses, JoonYeon Cho, Munirathna Padmanaban
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Patent number: 9274426Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C8 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.Type: GrantFiled: June 4, 2014Date of Patent: March 1, 2016Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: M. Dalil Rahman, Takanori Kudo, Alberto D. Dioses, Douglas McKenzie, Clement Anyadiegwu, Munirathna Padmanaban, Salem K. Mullen
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Publication number: 20150309403Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least repeat (B) unit having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C8 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.Type: ApplicationFiled: April 29, 2014Publication date: October 29, 2015Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: M. Dalil RAHMAN, Takanori KUDO, Alberto D. DIOSES, Douglas MCKENZIE, Clement ANYADIEGWU, Munirathna PADMANABAN, Salem K. Mullen
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Publication number: 20150309410Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C5 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.Type: ApplicationFiled: June 4, 2014Publication date: October 29, 2015Inventors: M. Dalil RAHMAN, Takanori KUDO, Alberto D. DIOSES, Douglas MCKENZIE, Clement ANYADIEGWU, Munirathna PADMANABAN, Salem K. MULLEN
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Publication number: 20150200091Abstract: The present invention relates to novel compositions comprising a metal component selected from a group chosen from at least one polyoxometalate, at least one heteropolyoxometalate and a mixture thereof; and, at least one organic component. The present invention also relates to methods of preparing the nanorod arrays and the nanorod materials and films. The present invention also relates to novel compositions to generate metal-oxide rich films, and also relates to processes for via or trench filling, reverse via or trench filling and imaging with underlayers. The materials are useful in wide range of manufacturing applications in many industries, including the semiconductor devices, electro-optical devices and energy storage industry.Type: ApplicationFiled: July 29, 2014Publication date: July 16, 2015Inventors: Venkata Gopal Reddy CHADA, Huirong YAO, Munirathna PADMANABAN, JoonYeon CHO, Elizabeth WOLFER, Alberto D. DIOSES, Salem K. MULLEN
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Publication number: 20150200090Abstract: The present invention relates to a novel spin coatable composition comprising (a) metallosilicic acid; (b) at least one compound comprising two or more 4-hydroxyphenyl groups; and, c) a solvent. The component b) can be a 4-hydroxyphenyl compound of structure (I) wherein W is a linking group chosen from the group consisting of an organic linking moiety, a heteroatom containing linking moiety and a direct valence bond, m is a positive integer of 1 and n is a positive integer equal to 1 or and Ri, Rii, Riii and Riv are independently chosen substituents from a group consisting of hydrogen, (C1-C6) alkyl, (C1-C6) alkoxy, (C6-C20) aryl, halides (such as Cl, I, F), hydroxyl, alkylcarbonyl (alkyl-C(?O)—), alkylcarbonyloxy (alkyl-C(?O)—O—), alkyloxycarbonyl (alkyl-O—C(?O)—), alkyloxycarbonyloxy (alkyl-O—C(?O)—O—) and mixtures of these; and a solvent. The present invention further relates to processes using the novel compositions.Type: ApplicationFiled: January 14, 2014Publication date: July 16, 2015Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Venkata Gopal Reddy CHADA, Huirong YAO, Salem MULLEN, Elizabeth WOLFER, Alberto D. DIOSES, JoonYeon CHO, Munirathna PADMANABAN
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Patent number: 8900797Abstract: The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen-containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. The cross-linking agent of the formula (1) can be produced by reaction of a nitrogen-containing aromatic compound, a halogen compound having a vinyloxy group or N-methoxymethylamide group and a basic compound.Type: GrantFiled: September 26, 2012Date of Patent: December 2, 2014Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.Inventors: Shigemasa Nakasugi, Shinji Miyazaki, Munirathna Padmanaban, Alberto D. Dioses
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Publication number: 20140087311Abstract: The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen-containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. The cross-linking agent of the formula (1) can be produced by reaction of a nitrogen-containing aromatic compound, a halogen compound having a vinyloxy group or N-methoxymethylamide group and a basic compound.Type: ApplicationFiled: September 26, 2012Publication date: March 27, 2014Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Shigemasa NAKASUGI, Shinji MIYAZAKI, Munirathna PADMANABAN, Alberto D. DIOSES
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Patent number: 8088548Abstract: Developable bottom antireflective coating compositions are provided.Type: GrantFiled: October 23, 2007Date of Patent: January 3, 2012Assignee: AZ Electronic Materials USA Corp.Inventors: Francis M. Houlihan, Shinji Miyazaki, Mark O. Neisser, Alberto D. Dioses, Joseph E. Oberlander
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Publication number: 20110086312Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is wherein W is selected from (C1-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted is or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n?2. The invention further relates to a process for using such a composition.Type: ApplicationFiled: October 9, 2009Publication date: April 14, 2011Inventors: Ralph R. Dammel, Srinivasan Chakrapani, Munirathna Padmanaban, Shinji Miyazaki, Edward W. Ng, Takanori Kudo, Alberto D. Dioses, Francis M. Houlihan
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Publication number: 20090104559Abstract: Developable bottom antireflective coating compositions are provided.Type: ApplicationFiled: October 23, 2007Publication date: April 23, 2009Inventors: Francis M. Houlihan, Shinjl Miyazaki, Mark O. Neisser, Alberto D. Dioses, Joseph E. Oberlander
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Patent number: 6733949Abstract: Disclosed is an alkali-soluble, film-forming novolak resin mixture containing at least two novolak resins, each novolak resin containing the addition-condensation reaction product of at least one phenolic compound with at least one aldehyde source, wherein the phenolic compound for first novolak resin contains 90-100 mole % of meta-cresol, and the phenolic compound for the second novolak resin contains less than 50 mole % of meta-cresol. Also disclosed is a photosensitive composition, containing an admixture of: a) the above-mentioned novolak resin mixture; b) at least one o-quinone photoactive compound; and c) at least one photoresist solvent.Type: GrantFiled: April 11, 2002Date of Patent: May 11, 2004Assignee: Clariant Finance (BVI) LimitedInventors: J. Neville Eilbeck, Alberto D. Dioses
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Publication number: 20030207195Abstract: Disclosed is an alkali-soluble, film-forming novolak resin mixture containing at least two novolak resins, each novolak resin containing the addition-condensation reaction product of at least one phenolic compound with at least one aldehyde source, wherein the phenolic compound for first novolak resin contains 90-100 mole % of meta-cresol, and the phenolic compound for the second novolak resin contains less than 50 mole % of meta-cresol. Also disclosed is a photosensitive composition, containing an admixture of: a) the above-mentioned novolak resin mixture; b) at least one o-quinone photoactive compound; and c) at least one photoresist solvent.Type: ApplicationFiled: April 11, 2002Publication date: November 6, 2003Inventors: J. Neville Eilbeck, Alberto D. Dioses
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Patent number: 6391514Abstract: A photosensitive positive working composition suitable for use as a photoresist, which comprises an admixture of at least one film forming resin; at least one photosensitizer; and a photoresist solvent mixture containing more than 50 weight percent of an alkylene glycol alkyl ether and less than 50 weight percent of either an alkyl alkoxy propionate or an alkyl amyl ketone, and a process for producing such a photoresist composition.Type: GrantFiled: August 18, 2000Date of Patent: May 21, 2002Assignee: Clariant Finance (BVI) LimitedInventors: J. Neville Eilbeck, Alberto D. Dioses