Patents by Inventor Alberto Dioses

Alberto Dioses has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9146467
    Abstract: Developable bottom antireflective coating compositions are provided.
    Type: Grant
    Filed: April 26, 2013
    Date of Patent: September 29, 2015
    Assignee: MERCK PATENT GMBH
    Inventors: Francis Houlihan, Lin Zhang, Alberto Dioses, Meng Li
  • Patent number: 8623589
    Abstract: The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
    Type: Grant
    Filed: June 6, 2011
    Date of Patent: January 7, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Publication number: 20130236833
    Abstract: Developable bottom antireflective coating compositions are provided.
    Type: Application
    Filed: April 26, 2013
    Publication date: September 12, 2013
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Francis HOULIHAN, Lin ZHANG, Alberto DIOSES, Meng LI
  • Patent number: 8455176
    Abstract: Developable bottom antireflective coating compositions are provided.
    Type: Grant
    Filed: November 12, 2008
    Date of Patent: June 4, 2013
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Francis Houlihan, Lin Zhang, Alberto Dioses, Meng Li
  • Publication number: 20120308939
    Abstract: The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
    Type: Application
    Filed: June 6, 2011
    Publication date: December 6, 2012
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Publication number: 20120122029
    Abstract: The present invention relates to a photoimageable underlayer composition comprising a polymer, a crosslinker comprising a vinyl ether group, and a thermal acid generator comprising a salt of a mono or polycarboxylic acid and an amine, where the amine has a boiling point of at least 150° C. The invention also relates to a process for forming an image in the underlayer comprising the novel composition.
    Type: Application
    Filed: November 11, 2010
    Publication date: May 17, 2012
    Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
  • Publication number: 20100119972
    Abstract: Developable bottom antireflective coating compositions are provided.
    Type: Application
    Filed: November 12, 2008
    Publication date: May 13, 2010
    Inventors: Francis Houlihan, Lin Zhang, Alberto Dioses, Meng Li
  • Publication number: 20090162800
    Abstract: The process of the present invention relates to imaging a photoresist film coated over an antireflective coating film comprising a) forming an antireflective coating film from an antireflective coating composition, where the composition comprises a siloxane polymer, b) treating the antireflective film with an aqueous alkaline treating solution, c) rinsing the antireflective film treated with an aqueous rinsing solution, d) forming a coating of a photoresist over the film of the antireflective coating composition, e) imagewise exposing the photoresist film, and, f) developing the photoresist with an aqueous alkaline developing solution.
    Type: Application
    Filed: December 20, 2007
    Publication date: June 25, 2009
    Inventors: David Abdallah, Alberto Dioses, Allen Timko, Ruzhi Zhang