Patents by Inventor Alberto Soppelsa

Alberto Soppelsa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10352764
    Abstract: An optoelectronic module that includes a reflectance member which exhibits mitigated or eliminated fan-out field-of-view overlap can be concealed or its visual impact minimized compared to a host device in which the optoelectronic module is mounted. In some instances, the reflectance member can be implemented as a plurality of through holes and in other instances the reflectance member may be a contiguous spin-coated polymeric coating. In general, the reflectance member can be diffusively reflective to the same particular wavelengths or ranges of wavelengths as the host device in which it is mounted.
    Type: Grant
    Filed: September 23, 2016
    Date of Patent: July 16, 2019
    Assignee: ams Sensors Singapore Pte. Ltd.
    Inventors: Jens Geiger, Frank Sobel, Rene Kromhof, Alberto Soppelsa, Kevin Hauser, Robert Lenart
  • Publication number: 20170089757
    Abstract: An optoelectronic module that includes a reflectance member which exhibits mitigated or eliminated fan-out field-of-view overlap can be concealed or its visual impact minimized compared to a host device in which the optoelectronic module is mounted. In some instances, the reflectance member can be implemented as a plurality of through holes and in other instances the reflectance member may be a contiguous spin-coated polymeric coating. In general, the reflectance member can be diffusively reflective to the same particular wavelengths or ranges of wavelengths as the host device in which it is mounted.
    Type: Application
    Filed: September 23, 2016
    Publication date: March 30, 2017
    Applicant: Heptagon Micro Optics Pte. Ltd.
    Inventors: Jens Geiger, Frank Sobel, Rene Kromhof, Alberto Soppelsa, Kevin Hauser, Robert Lenart