Patents by Inventor Albertus Adrianus Smits

Albertus Adrianus Smits has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Light emitting device with heat conducting fluid
    Patent number: 10473316
    Abstract: The invention relates to a light emitting device, comprising at least one light source (101) and a closed container, the container comprising a first area (105) and a second area (107) that is arranged opposite to the first area (105), the closed container being filled with a heat conducting fluid (111) that is thermally coupled to an inside surface of the closed container, wherein the at least one light source (101) is arranged on an outside surface (115) of the first area of the closed container and thermally coupled to the inside surface (113) of the closed container.
    Type: Grant
    Filed: August 5, 2015
    Date of Patent: November 12, 2019
    Assignee: SIGNIFY HOLDING B.V.
    Inventors: Albertus Adrianus Smits, Dmitri Anatolievich Chestakov, Hendrik Jan Eggink, Ralph Theodorus Hubertus Maessen
  • LIGHT EMITTING DEVICE
    Publication number: 20170261194
    Abstract: The invention relates to a light emitting device, comprising at least one light source (101) and a closed container, the container comprising a first area (105) and a second area (107) that is arranged opposite to the first area (105), the closed container being filled with a heat conducting fluid (111) that is thermally coupled to an inside surface of the closed container, wherein the at least one light source (101) is arranged on an outside surface (115) of the first area of the closed container and thermally coupled to the inside surface (113) of the closed container.
    Type: Application
    Filed: August 5, 2015
    Publication date: September 14, 2017
    Inventors: Albertus Adrianus SMITS, Dmitri Anatolievich CHESTAKOV, Hendrik Jan EGGINK, Ralph Theodorus Hubertus MAESSEN
  • Lithographic apparatus having an encoder type position sensor system
    Patent number: 8836913
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: September 16, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Lithographic apparatus having encoder type position sensor system
    Patent number: 8760615
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Grant
    Filed: May 23, 2008
    Date of Patent: June 24, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Lithographic apparatus having an encoder position sensor system
    Patent number: 8687166
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Grant
    Filed: May 24, 2007
    Date of Patent: April 1, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Melanie Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Lithographic Apparatus Having an Encoder Type Position Sensor System
    Publication number: 20120075613
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Application
    Filed: November 30, 2011
    Publication date: March 29, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Peter Paul STEIJAERT, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
  • Lithographic apparatus having encoder type position sensor system
    Publication number: 20090002653
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Application
    Filed: May 23, 2008
    Publication date: January 1, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Van Der Pasch, Ruud Antonius Beerens, Albertus Adrianus Smits
  • Lithographic apparatus having encoder type position sensor system
    Publication number: 20080291413
    Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
    Type: Application
    Filed: May 24, 2007
    Publication date: November 27, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Melanie Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits