Patents by Inventor Albrecht Fester

Albrecht Fester has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7521408
    Abstract: The present invention recites a composition comprising a first compound and a second compound. The first compound has the chemical formula ( 1a), wherein m, n and o are independently from each other equal to 2 or 3; wherein p is equal to 1 or 2; R being a chemical group with the chemical formula (1a?), wherein q is equal to 1, 2 or 3; wherein R1, R2 and R3 are independently selected from the group consisting of hydrogen and an organic group. The second compound has the chemical formula (1c). Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate.
    Type: Grant
    Filed: December 12, 2005
    Date of Patent: April 21, 2009
    Assignees: Interuniversitair Microelektronica Centrum ( IMEC), Air Products and Chemicals Inc.
    Inventors: Rita Vos, Paul Mertens, Bernd Kolbesen, Albrecht Fester, Oliver Doll
  • Patent number: 7160482
    Abstract: The present invention is related to a composition comprising an oxidizing compound and a complexing compound with the chemical formula wherein R1, R2, R3 and R4 are selected from the group consisting of H and any organic side chain. The oxidizing compound can be in the form of an aqueous solution. The complexing compound is for complexing metal ions. Metal ions can be present in the solution or in an external medium being contacted with the solution.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: January 9, 2007
    Assignees: IMEC vzw, Air Products and Chemicals, Inc.
    Inventors: Rita Vos, Paul Mertens, Albrecht Fester, Oliver Doll, Bernd Kolbesen
  • Publication number: 20060089280
    Abstract: The present invention recites a composition comprising a first compound and a second compound. The first compound has the chemical formula (1a), wherein m, n and o are independently from each other equal to 2 or 3; wherein p is equal to 1 or 2; R being a chemical group with the chemical formula (1a?), wherein q is equal to 1, 2 or 3; wherein R1, R2 and R3 are independently selected from the group consisting of hydrogen and an organic group. The second compound has the chemical formula (1c). Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate.
    Type: Application
    Filed: December 12, 2005
    Publication date: April 27, 2006
    Inventors: Rita Vos, Paul Mertens, Bernd Kolbesen, Albrecht Fester, Oliver Doll
  • Publication number: 20050009207
    Abstract: The present invention is related to a composition comprising an oxidizing compound and a complexing compound with the chemical formula wherein R1, R2, R3 and R4 are selected from the group consisting of H and any organic side chain. The oxidizing compound can be in the form of an aqueous solution. The complexing compound is for complexing metal ions. Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate.
    Type: Application
    Filed: December 21, 2001
    Publication date: January 13, 2005
    Inventors: Rita Vos, Paul Mertens, Albrecht Fester, Oliver Doll, Bernd Kolbesen