Patents by Inventor Alco Looije

Alco Looije has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Simultaneous measurement of beams in lithography system
    Patent number: 8431912
    Abstract: The present invention relates to a lithography system in which intensities of individually modulated beams from a multitude of beams are determined, comprising a measuring device with a sensor having a sensor area adapted for simultaneously sensing a plurality of beams and providing an aggregated signal thereof. The beams are individually modulated according to associated temporal blanking patterns. The present invention further relates to a method for calculating individual beam intensities dependent on the measured aggregated signal and the temporal blanking patterns of the beams.
    Type: Grant
    Filed: November 5, 2009
    Date of Patent: April 30, 2013
    Assignee: Mapper Lithography IP B.V.
    Inventor: Alco Looije
  • SIMULTANEOUS MEASUREMENT OF BEAMS IN LITHOGRAPHY SYSTEM
    Publication number: 20100117001
    Abstract: The present invention relates to a lithography system in which intensities of individually modulated beams from a multitude of beams are determined, comprising a measuring device with a sensor having a sensor area adapted for simultaneously sensing a plurality of beams and providing an aggregated signal thereof. The beams are individually modulated according to associated temporal blanking patterns. The present invention further relates to a method for calculating individual beam intensities dependent on the measured aggregated signal and the temporal blanking patterns of the beams.
    Type: Application
    Filed: November 5, 2009
    Publication date: May 13, 2010
    Inventor: Alco Looije