Abstract: Systems, devices, and methods for combined wafer and photomask inspection are provided. In some embodiments, chucks are provided, the chucks comprising: a removable insert, wherein the removable insert is configured to support a wafer so that an examination surface of the wafer lies within a focal range when the chuck is in a first configuration, wherein the removable insert is inserted into the chuck in the first configuration; and a first structure forming a recess that has a depth sufficient to support a photomask so that an examination surface of the photomask lies within the focal range when the chuck is in a second configuration, wherein the removable insert is not inserted into the chuck in the second configuration.

Abstract: Cutting apparatuses comprising: a base; a first platen and a second platen that are coupled to the base and that are configured to hold a specimen, wherein the first platen includes a first cutting surface and the second platen includes a second cutting surface; a moveable carriage that is moveably coupled to the base; a cutting arm that is pivotably coupled at a pivot point to the carriage and that is configured to hold a cutting blade; and a spring coupled to the arm so as to apply a directional force to the arm and the blade, wherein the moveable carriage can be moved in a manner that causes the blade to slide on at least one of the first cutting surface and the second cutting surface while being pressed against the at least one of the first cutting surface and the second cutting surface by the directional force.

Abstract: Systems, devices, and methods for combined wafer and photomask inspection are provided. In some embodiments, chucks are provided, the chucks comprising: a removable insert, wherein the removable insert is configured to support a wafer so that an examination surface of the wafer lies within a focal range when the chuck is in a first configuration, wherein the removable insert is inserted into the chuck in the first configuration; and a first structure forming a recess that has a depth sufficient to support a photomask so that an examination surface of the photomask lies within the focal range when the chuck is in a second configuration, wherein the removable insert is not inserted into the chuck in the second configuration.