Patents by Inventor Aleksander J. Franz

Aleksander J. Franz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080171249
    Abstract: A micromachined device for efficient thermal processing at least one fluid stream includes at least one fluid conducting tube having at least a region with wall thickness of less than 50 ?m. The device optionally includes one or more thermally conductive structures in thermal communication with first and second thermally insulating portions of the fluid conducting tube. The device also may include a thermally conductive region, and at least a portion of the fluid conducting tube is disposed within the region. A plurality of structures may be provided projecting from a wall of the fluid conducting tube into an inner volume of the tube. The structures enhance thermal conduction between a fluid within the tube and a wall of the tube. A method for fabricating, from a substrate, a micromachined device for processing a fluid stream allows the selective removal of portions of the substrate to provide desired structures integrated within the device.
    Type: Application
    Filed: August 7, 2007
    Publication date: July 17, 2008
    Inventors: Leonel R. Arana, Aleksander J. Franz, Klavs F. Jensen, Samuel B. Schaevitz, Martin A. Schmidt
  • Patent number: 7267779
    Abstract: A micromachined device for efficient thermal processing at least one fluid stream includes at least one fluid conducting tube having at least a region with wall thickness of less than 50 ?m. The device optionally includes one or more thermally conductive structures in thermal communication with first and second thermally insulating portions of the fluid conducting tube. The device also may include a thermally conductive region, and at least a portion of the fluid conducting tube is disposed within the region. A plurality of structures may be provided projecting from a wall of the fluid conducting tube into an inner volume of the tube. The structures enhance thermal conduction between a fluid within the tube and a wall of the tube. A method for fabricating, from a substrate, a micromachined device for processing a fluid stream allows the selective removal of portions of the substrate to provide desired structures integrated within the device.
    Type: Grant
    Filed: July 18, 2005
    Date of Patent: September 11, 2007
    Assignee: Massachusetts Institute of Technology
    Inventors: Leonel R. Arana, Aleksander J. Franz, Klavs F. Jensen, Samuel B. Schaevitz, Martin A. Schmidt
  • Patent number: 6939632
    Abstract: A micromachined device for efficient thermal processing at least one fluid stream includes at least one fluid conducting tube having at least a region with wall thickness of less than 50 ?m. The device optionally includes one or more thermally conductive structures in thermal communication with first and second thermally insulating portions of the fluid conducting tube. The device also may include a thermally conductive region, and at least a portion of the fluid conducting tube is disposed within the region. A plurality of structures may be provided projecting from a wall of the fluid conducting tube into an inner volume of the tube. The structures enhance thermal conduction between a fluid within the tube and a wall of the tube. A method for fabricating, from a substrate, a micromachined device for processing a fluid stream allows the selective removal of portions of the substrate to provide desired structures integrated within the device.
    Type: Grant
    Filed: August 6, 2001
    Date of Patent: September 6, 2005
    Assignee: Massachusetts Institute of Technology
    Inventors: Leonel R. Arana, Aleksander J. Franz, Klavs F. Jensen, Samuel B. Schaevitz, Martin A. Schmidt
  • Patent number: 6810899
    Abstract: The present invention relates to gas separation membranes including a metal-based layer having sub-micron scale thicknesses. The metal-based layer can be a palladium alloy supported by ceramic layers such as a silicon oxide layer and a silicon nitride layer. By using MEMS, a series of perforations (holes) can be patterned to allow chemical components to access both sides of the metal-based layer. Heaters and temperature sensing devices can also be patterned on the membrane. The present invention also relates to a portable power generation system at a chemical microreactor comprising the gas separation membrane. The invention is also directed to a method for fabricating a gas separation membrane. Due to the ability to make chemical microreactors of very small sizes, a series of reactors can be used in combination on a silicon surface to produce an integrated gas membrane device.
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: November 2, 2004
    Assignee: Massachusetts Institute of Technology
    Inventors: Aleksander J. Franz, Klavs F. Jensen, Martin A. Schmidt, Samara Firebaugh
  • Publication number: 20040028602
    Abstract: The present invention relates to gas separation membranes including a metal-based layer having sub-micron scale thicknesses. The metal-based layer can be a palladium alloy supported by ceramic layers such as a silicon oxide layer and a silicon nitride layer. By using MEMS, a series of perforations (holes) can be patterned to allow chemical components to access both sides of the metal-based layer. Heaters and temperature sensing devices can also be patterned on the membrane. The present invention also relates to a portable power generation system at a chemical microreactor comprising the gas separation membrane. The invention is also directed to a method for fabricating a gas separation membrane. Due to the ability to make chemical microreactors of very small sizes, a series of reactors can be used in combination on a silicon surface to produce an integrated gas membrane device.
    Type: Application
    Filed: February 24, 2003
    Publication date: February 12, 2004
    Applicant: Massachusetts Institute of Technology
    Inventors: Aleksander J. Franz, Klavs F. Jensen, Martin A. Schmidt, Samara Firebaugh
  • Patent number: 6541676
    Abstract: The present invention relates to gas separation membranes including a metal-based layer having sub-micron scale thicknesses. The metal-based layer can be a palladium alloy supported by ceramic layers such as a silicon oxide layer and a silicon nitride layer. By using MEMS, a series of perforations (holes) can be patterned to allow chemical components to access both sides of the metal-based layer. Heaters and temperature sensing devices can also be patterned on the membrane. The present invention also relates to a portable power generation system at a chemical microreactor comprising the gas separation membrane. The invention is also directed to a method for fabricating a gas separation membrane. Due to the ability to make chemical microreactors of very small sizes, a series of reactors can be used in combination on a silicon surface to produce an integrated gas membrane device.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: April 1, 2003
    Assignee: Massachusetts Institute of Technology
    Inventors: Aleksander J. Franz, Klavs F. Jensen, Martin A. Schmidt, Samara Firebaugh
  • Publication number: 20030027022
    Abstract: A micromachined device for efficient thermal processing at least one fluid stream includes at least one fluid conducting tube having at least a region with wall thickness of less than 50 &mgr;m. The device optionally includes one or more thermally conductive structures in thermal communication with first and second thermally insulating portions of the fluid conducting tube. The device also may include a thermally conductive region, and at least a portion of the fluid conducting tube is disposed within the region. A plurality of structures may be provided projecting from a wall of the fluid conducting tube into an inner volume of the tube. The structures enhance thermal conduction between a fluid within the tube and a wall of the tube. A method for fabricating, from a substrate, a micromachined device for processing a fluid stream allows the selective removal of portions of the substrate to provide desired structures integrated within the device.
    Type: Application
    Filed: August 6, 2001
    Publication date: February 6, 2003
    Inventors: Leonel R. Arana, Aleksander J. Franz, Klavs F. Jensen, Samuel B. Schaevitz, Martin A. Schmidt