Abstract: Methods of and apparatuses for monitoring a plating bath composition by using complex designer voltammetry. The designer waveforms are optimized in order to maximize analytical output of the solitary measurement thus drastically reducing the total time required for a full analysis of a plating bath compared to traditional analytical techniques.

Abstract: A process for creating a predictive data set predicting the amount of target constituents are in an electrolyte solution at varying temperatures is provided.

Abstract: A process for creating a predictive data set predicting the amount of target constituents are in an electrolyte solution at varying temperatures is provided.

Abstract: A loopback card includes a connector configured to connect to an IO interface and emulate a storage device interface. The connector includes a port configured to receive a set of signals from the IO interface and transmit them to a redriver. The connector is configured to receive the set of signals from the redriver and transmit them from the redriver to the IO interface. The connector includes control signal inputs configured to receive control signals from the IO interface. The connector further includes one or more logic gates configured to receive the control signals. The one or more logic gates apply a logic operation on the control signals to generate an output and route the output to the IO interface through the connector. The redriver is operably connected to the port and configured to receive the set of signals from the port and transmit them back to the port.

Abstract: A loopback card includes a connector configured to connect to an IO interface and emulate a storage device interface. The connector includes a port configured to receive a set of signals from the IO interface and transmit them to a redriver. The connector is configured to receive the set of signals from the redriver and transmit them from the redriver to the IO interface. The connector includes control signal inputs configured to receive control signals from the IO interface. The connector further includes one or more logic gates configured to receive the control signals. The one or more logic gates apply a logic operation on the control signals to generate an output and route the output to the IO interface through the connector. The redriver is operably connected to the port and configured to receive the set of signals from the port and transmit them back to the port.

Abstract: The present invention relates generally to any electrolyte and methods for monitoring the constituents contained therein. More specifically, the present invention relates to plating baths and methods for monitoring the constituents contained therein based on chemometric analysis of voltammetric data obtained for these baths. More particularly, the method of the present invention relates to application of numerous chemometric techniques of modeling power, outlier detection, regression and calibration transfer for analysis of voltammetric data obtained for various plating baths.

Abstract: The present invention relates generally to any plating solution and methods for monitoring its performance. More specifically, the present invention relates to plating bath and methods for monitoring its plating functionality based on chemometric analysis of voltammetric data obtained for these baths. More particularly, the method of the present invention relates to application of numerous chemometric techniques to describe quantitatively plating bath functionality in order to maintain its proper performance.

Abstract: The present invention relates generally to any electrolyte and methods for monitoring the constituents contained therein. More specifically, the present invention relates to plating baths and methods for monitoring the constituents contained therein based on chemometric analysis of voltammetric data obtained for these baths. More particularly, the method of the present invention relates to application of numerous chemometric techniques of modeling power, outlier detection, regression and calibration transfer for analysis of voltamrnmetric data obtained for various plating baths.

Abstract: The present invention relates generally to any plating solution and methods for monitoring its performance. More specifically, the present invention relates to plating bath and methods for monitoring its plating functionality based on chemometric analysis of voltammetric data obtained for these baths. More particularly, the method of the present invention relates to application of numerous chemometric techniques to describe quantitatively plating bath functionality in order to maintain its proper performance.