Patents by Inventor Alex A. Granovsky

Alex A. Granovsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Increasing photoresist processing throughput
    Patent number: 8617784
    Abstract: Two acids may be formed per exposed photon using free radical promotion so that two acid products are produced via two parallel pathways. This results in increased fabrication facility throughput. In some embodiments, this may be achieved while reducing side-lobe defect liability.
    Type: Grant
    Filed: May 26, 2006
    Date of Patent: December 31, 2013
    Assignee: Intel Corporation
    Inventors: David Fryer, Vivek Singh, Nikolay Suetin, Alex A. Granovsky
  • Increasing photoresist processing throughput
    Publication number: 20070275323
    Abstract: Two acids may be formed per exposed photon using free radical promotion so that two acid products are produced via two parallel pathways. This results in increased fabrication facility throughput. In some embodiments, this may be achieved while reducing side-lobe defect liability.
    Type: Application
    Filed: May 26, 2006
    Publication date: November 29, 2007
    Inventors: David Fryer, Vivek Singh, Nikolay Suetin, Alex A. Granovsky