Patents by Inventor Alex F. Fong

Alex F. Fong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8389084
    Abstract: A fluid impermeable protective layer is described for a structure that has a 3-dimensional profile. The 3-dimensional profile can include actuators. The protective layer is applied so that there are no breaches in the protective layer and so that the protective layer is not too thick to prevent the actuators from being able to properly function.
    Type: Grant
    Filed: February 27, 2009
    Date of Patent: March 5, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Regan Nayve, Darren T. Imai, Alex F. Fong
  • Publication number: 20100221497
    Abstract: A fluid impermeable protective layer is described for a structure that has a 3-dimensional profile. The 3-dimensional profile can include actuators. The protective layer is applied so that there are no breaches in the protective layer and so that the protective layer is not too thick to prevent the actuators from being able to properly function.
    Type: Application
    Filed: February 27, 2009
    Publication date: September 2, 2010
    Inventors: Regan Nayve, Darren T. Imai, Alex F. Fong
  • Publication number: 20090207399
    Abstract: A method of calibrating a front to backside alignment capable lithographic apparatus. The method includes attaching a substrate having a plurality of alignment marks to a carrier, the substrate being arranged such that the alignment marks face towards the carrier; reducing the thickness of the substrate; using an alignment system of the apparatus to measure the positions of images of alignment marks formed by optics in a substrate table of the apparatus; projecting a pattern onto the substrate, the position of the pattern being determined according to the measured positions of the alignment marks; measuring the positions of the projected pattern and the alignment marks provided on the opposite side of the substrate, the position of the alignment marks provided on the opposite side of the substrate being measured by the alignment system directing radiation through the substrate; and comparing the measured positions in order to determine an overlay error.
    Type: Application
    Filed: December 19, 2008
    Publication date: August 20, 2009
    Applicants: ASML NETHERLANDS B.V., ASML Holding NV
    Inventors: Alex F. Fong, Henricus Wilhelmus Maria Van Buel, Joseph J. Consolini, Michael Josephus Evert Van De Moosdijk, Michael Charles Robles