Patents by Inventor Alex F. Panchula

Alex F. Panchula has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of etching photoresist on substrates
    Publication number: 20080182422
    Abstract: Methods of etching a carbon-rich layer on organic photoresist overlying an inorganic layer can utilize a process gas including a fluorine-containing gas, an oxygen-containing gas, and a hydrocarbon gas, and one or more optional components to generate a plasma effective to etch the carbon-rich layer with low removal of the inorganic layer. The carbon-rich layer can be removed in the same processing chamber, or alternatively can be removed in a different processing chamber, as used to remove the bulk photoresist.
    Type: Application
    Filed: November 5, 2007
    Publication date: July 31, 2008
    Applicant: Lam Research Corporation
    Inventors: Erik A. Edelberg, Robert P. Chebi, Alex F. Panchula