Abstract: Embodiments of the present disclosure generally relate to planarization of surfaces on substrates and on layers formed on substrates. More specifically, embodiments of the present disclosure relate to planarization of surfaces on substrates for advanced packaging applications, such as surfaces of polymeric material layers. In one implementation, the method includes mechanically grinding a substrate surface against a polishing surface in the presence of a grinding slurry during a first polishing process to remove a portion of a material formed on the substrate; and then chemically mechanically polishing the substrate surface against the polishing surface in the presence of a polishing slurry during a second polishing process to reduce any roughness or unevenness caused by the first polishing process.

Abstract: Embodiments of the present disclosure generally relate to planarization of surfaces on substrates and on layers formed on substrates. More specifically, embodiments of the present disclosure relate to planarization of surfaces on substrates for advanced packaging applications, such as surfaces of polymeric material layers. In one implementation, the method includes mechanically grinding a substrate surface against a polishing surface in the presence of a grinding slurry during a first polishing process to remove a portion of a material formed on the substrate; and then chemically mechanically polishing the substrate surface against the polishing surface in the presence of a polishing slurry during a second polishing process to reduce any roughness or unevenness caused by the first polishing process.

Abstract: A spatial light modulator having two static random access memory (SRAM) devices, including a display controller configured with a display sequence, the display sequence including a first display slice and a second display slice, the first display slice having a display time less than two times a minimum time period determined by the time of a write event, and the second display slice having a display time of more than two times the minimum time period. The controller controls write events from the two SRAM devices, and the first display slice and second display slice are ordered in the display sequence so that the controller causes the spatial light modulator to output light and causes the two SRAM devices each to perform a write event during the second display slice.

Abstract: A spatial light modulator system includes an array of pixel cells each that includes two static random access memory (SRAM) devices configured to store digital data and output a first voltage signal in response to the digital data, a level shifter configured to receive the first voltage signal from at least one of the two SRAM devices and output a second voltage signal and a spatial light modulator configured to output light in an on direction or an off direction in response to the second voltage signal.

Abstract: A one-hand-operated ultrasound transducer and method for delivering a controlled and uniform distribution of a sterile or a non-sterile topical reagent to skin for use in diagnostic, therapeutic, and aesthetic therapies. The transducer includes a head, a cartridge, and feeding apparatus for feeding contents of the cartridge out of the head. The cartridge is removably disposed in the head and delivers the controlled and uniform distribution of the sterile or the non-sterile topical reagent to the skin for use in the diagnostic, therapeutic, and aesthetic therapies.

Abstract: A rotatable cover plate assembly (10) has a cavity (13) and a rotatable base plate assembly (12) has a cavity (42) with a semiconductor wafer (14) mounted therein. The cover plate assembly (10) comes down onto the base plate assembly (12) enclosing the semiconductor wafer (14) and a dispenser (28) in a chamber formed by the cavities (13) and (42). The cover and base plates (16) and (40) are rotated as a single assembly, and coating material dispensed by the dispenser (28) onto the semiconductor wafer (14). A flow regulator (25) coupled via an exhaust manifold (20) controls the rate of evaporate of solvent from the dispensed coating material.

Abstract: A rotatable cover plate assembly 10 has a cavity 13 and a rotatable base plate assembly 12 has a cavity 42 with a semiconductor wafer 14 mounted therein. The cover plate assembly 10 comes down onto the base plate assembly 12 enclosing the semiconductor wafer 14 and a dispenser 28 in a chamber formed by the cavities 13 and 42. The cover and base plates 16 and 40 are rotated as a single assembly, and coating material dispensed by the dispenser 28 onto the semiconductor wafer 14. A flow regulator 25 coupled via an exhaust manifold 20 controls the rate of evaporate of solvent from the dispensed coating material.

Abstract: An apparatus for wet processing of substrates in a controlled environment. It is a single-substrate processing apparatus which is capable of carrying out etching, rinsing, and drying processes all in a single apparatus and in a controlled environment. A closed processing chamber is provided for processing a substrate in a closed environment. Processing liquids and gases are introduced into the chamber and the chamber is rotated with the substrate. Temperature inside the chamber is controlled by heating the gases. Humidity is controlled by varying the proportion of water vapor. The rotation of the chamber with the substrate creates a stable environment where processing parameters are more easily controlled.

Abstract: A method and apparatus for generating addresses. The present invention provides for fast generation of a series of addresses in an array where the series comprises a column or diagonal of the array, such as for layered ECC code words in CD-ROM. Whereas each address is computable individually using multipliers and modulo circuits, the present invention operates on the series of addresses as a whole, forming a dependence between successive addresses. The dependence is separated into multiple address indices that may be summed together for the desired address. The present invention is thus able to generate a series of addresses by accumulation processes requiring only selection of the appropriate increment value and addition to a previously stored address index value. Address generation throughput is increased with savings in layout area and power.

Abstract: An apparatus for wet processing of substrates in a controlled environment. It is a single-substrate processing apparatus which is capable of carrying out etching, rinsing, and drying processes all in a single apparatus and in a controlled environment. A closed processing chamber is provided for processing a substrate in a closed environment. Processing liquids and gases are introduced into the chamber and the chamber is rotated with the substrate. Temperature inside the chamber is controlled by heating the gases. Humidity is controlled by varying the proportion of water vapor. The rotation of the chamber with the substrate creates a stable environment where processing parameters are more easily controlled.

Abstract: A method and apparatus for generating addresses. The present invention provides for fast generation of a series of addresses in an array where the series comprises a column or diagonal of the array, such as for layered ECC code words in CD-ROM. Whereas each address is computable individually using multipliers and modulo circuits, the present invention operates on the series of addresses as a whole, forming a dependence between successive addresses. The dependence is separated into multiple address indices that may be summed together for the desired address. The present invention is thus able to generate a series of addresses by accumulation processes requiring only selection of the appropriate increment value and addition to a previously stored address index value. Address generation throughput is increased with savings in layout area and power.