Patents by Inventor Alex Kontos

Alex Kontos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10600616
    Abstract: In one embodiment, an apparatus to treat a substrate may include an extraction plate to extract a plasma beam from a plasma chamber and direct the plasma beam to the substrate. The plasma beam may comprise ions forming a non-zero angle of incidence with respect to a perpendicular to a plane of the substrate; and a gas outlet system disposed outside the plasma chamber, the gas outlet system coupled to a gas source and arranged to deliver to the substrate a reactive gas received from the gas source, wherein the reactive gas does not pass through the plasma chamber.
    Type: Grant
    Filed: September 6, 2018
    Date of Patent: March 24, 2020
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Shurong Liang, Costel Biloiu, Glen Gilchrist, Vikram Singh, Christopher Campbell, Richard John Hertel, Alex Kontos
  • Publication number: 20190006149
    Abstract: In one embodiment, an apparatus to treat a substrate may include an extraction plate to extract a plasma beam from a plasma chamber and direct the plasma beam to the substrate. The plasma beam may comprise ions forming a non-zero angle of incidence with respect to a perpendicular to a plane of the substrate; and a gas outlet system disposed outside the plasma chamber, the gas outlet system coupled to a gas source and arranged to deliver to the substrate a reactive gas received from the gas source, wherein the reactive gas does not pass through the plasma chamber.
    Type: Application
    Filed: September 6, 2018
    Publication date: January 3, 2019
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Shurong Liang, Costel Biloiu, Glen Gilchrist, Vikram Singh, Christopher Campbell, Richard John Hertel, Alex Kontos
  • Patent number: 10128082
    Abstract: In one embodiment, an apparatus to treat a substrate may include an extraction plate to extract a plasma beam from a plasma chamber and direct the plasma beam to the substrate. The plasma beam may comprise ions forming a non-zero angle of incidence with respect to a perpendicular to a plane of the substrate; and a gas outlet system disposed outside the plasma chamber, the gas outlet system coupled to a gas source and arranged to deliver to the substrate a reactive gas received from the gas source, wherein the reactive gas does not pass through the plasma chamber.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: November 13, 2018
    Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Shurong Liang, Costel Biloiu, Glen Gilchrist, Vikram Singh, Christopher Campbell, Richard John Hertel, Alex Kontos
  • Publication number: 20170025252
    Abstract: In one embodiment, an apparatus to treat a substrate may include an extraction plate to extract a plasma beam from a plasma chamber and direct the plasma beam to the substrate. The plasma beam may comprise ions forming a non-zero angle of incidence with respect to a perpendicular to a plane of the substrate; and a gas outlet system disposed outside the plasma chamber, the gas outlet system coupled to a gas source and arranged to deliver to the substrate a reactive gas received from the gas source, wherein the reactive gas does not pass through the plasma chamber.
    Type: Application
    Filed: July 24, 2015
    Publication date: January 26, 2017
    Inventors: Shurong Liang, Costel Biloiu, Glen Gilchrist, Vikram Singh, Christopher Campbell, Richard John Hertel, Alex Kontos