Abstract: A cloud-based insurance underwriting and management platform based on microservice technology which is easily customizable to each insurance provider's specific needs and scalable for any size insurance provider and any number of insureds. In an embodiment, the cloud-based platform comprises an external system interface comprised of application programming interfaces (APIs) through which insurers and insureds can access the features of the platform, a plurality of microservices which provide the features and capabilities of the platform, and one or more databases which store the customer information, policy information, and financial information required for the insurance provider to manage its underwriting and/or policy management.

Abstract: One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.

Abstract: One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database.

Abstract: One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database.

Abstract: One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.