Patents by Inventor Alex N. Hegyi

Alex N. Hegyi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photo-mask and wafer image reconstruction
    Patent number: 8644588
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Grant
    Filed: September 19, 2007
    Date of Patent: February 4, 2014
    Assignee: Luminescent Technologies, Inc.
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • Photo-mask and wafer image reconstruction
    Patent number: 8331645
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: December 11, 2012
    Assignee: Luminescent Technologies, Inc.
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • Photo-mask and wafer image reconstruction
    Patent number: 8280146
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: October 2, 2012
    Assignee: Luminescent Technologies, Inc.
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • Photo-mask and wafer image reconstruction
    Patent number: 8260032
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: September 4, 2012
    Assignee: Luminescent Technologies, Inc.
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • PHOTO-MASK AND WAFER IMAGE RECONSTRUCTION
    Publication number: 20120189187
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Application
    Filed: May 29, 2009
    Publication date: July 26, 2012
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • Photo-mask and wafer image reconstruction
    Patent number: 8208712
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: June 26, 2012
    Assignee: Luminescent Technologies, Inc.
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • Photo-mask and wafer image reconstruction
    Patent number: 8204295
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: June 19, 2012
    Assignee: Luminescent Technologies, Inc.
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • Photo-mask and wafer image reconstruction
    Patent number: 8200002
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: June 12, 2012
    Assignee: Luminescent Technologies, Inc.
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • PHOTO-MASK AND WAFER IMAGE RECONSTRUCTION
    Publication number: 20100135568
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Application
    Filed: September 19, 2007
    Publication date: June 3, 2010
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • Photo-Mask and Wafer Image Reconstruction
    Publication number: 20100119143
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Application
    Filed: May 29, 2009
    Publication date: May 13, 2010
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • Photo-Mask and Wafer Image Reconstruction
    Publication number: 20100086195
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Application
    Filed: May 29, 2009
    Publication date: April 8, 2010
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • Photo-Mask and Wafer Image Reconstruction
    Publication number: 20100080443
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Application
    Filed: May 29, 2009
    Publication date: April 1, 2010
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • Photo-Mask and Wafer Image Reconstruction
    Publication number: 20100021042
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Application
    Filed: May 29, 2009
    Publication date: January 28, 2010
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • Photo-Mask and Wafer Image Reconstruction
    Publication number: 20100021043
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Application
    Filed: May 29, 2009
    Publication date: January 28, 2010
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams
  • Photo-Mask and Wafer Image Reconstruction
    Publication number: 20100021824
    Abstract: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.
    Type: Application
    Filed: May 29, 2009
    Publication date: January 28, 2010
    Inventors: Moshe E. Preil, Alex N. Hegyi, Daniel S. Abrams