Patents by Inventor Alex Oudshoorn

Alex Oudshoorn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device manufacturing method, lithographic apparatus and a computer program
    Patent number: 8477287
    Abstract: The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.
    Type: Grant
    Filed: March 14, 2008
    Date of Patent: July 2, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Alex Oudshoorn, Leon Martin Levasier, Erik Roelof Loopstra, Roland Blok
  • Device manufacturing method, lithographic apparatus, and a computer program
    Patent number: 7894038
    Abstract: A device manufacturing method includes exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, determining a non-linear function for approximating a height and a tilt profile of a surface of the reticle with respect to the reticle stage, and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function.
    Type: Grant
    Filed: March 14, 2007
    Date of Patent: February 22, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Alex Oudshoorn, Roland Blok
  • Device Manufacturing Method, Lithographic Apparatus and a Computer Program
    Publication number: 20100231890
    Abstract: The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.
    Type: Application
    Filed: March 14, 2008
    Publication date: September 16, 2010
    Inventors: Alex Oudshoorn, Roland Blok, Erik Roelof Loopstra, Leon Martin Levasier
  • Device manufacturing method, lithographic apparatus, and a computer program
    Publication number: 20080225252
    Abstract: A device manufacturing method includes exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, determining a non-linear function for approximating a height and a tilt profile of a surface of the reticle with respect to the reticle stage, and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function.
    Type: Application
    Filed: March 14, 2007
    Publication date: September 18, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Alex Oudshoorn, Roland Blok