Patents by Inventor Alex P. G. Robinson

Alex P. G. Robinson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Hard-mask composition
    Patent number: 11746255
    Abstract: Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative substituted with an amine and a crosslinking agent. The formulation is drain compatible with other solvents used in the semiconductor industry.
    Type: Grant
    Filed: February 25, 2018
    Date of Patent: September 5, 2023
    Assignee: IRRESISTIBLE MATERIALS LTD
    Inventors: Alex P. G. Robinson, Guy Dawson, Alan G. Brown, Thomas Lada, John Roth, Edward Jackson
  • Sensitivity Enhanced Photoresists
    Publication number: 20230273520
    Abstract: The present disclosure relates to novel negative- working and novel positive-working photoresist compositions for high speed, fine line processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays. The novel photoresists contain specific metals components which are added to positive and negative photoresist compositions which are themselves composed of conventional photoresist materials.
    Type: Application
    Filed: July 27, 2021
    Publication date: August 31, 2023
    Inventors: Alex P.G. ROBINSON, Andreas FROMMHOLD, John ROTH
  • Enhanced EUV photoresist materials, formulations and processes
    Patent number: 11681227
    Abstract: The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: June 20, 2023
    Inventors: Alex P. G. Robinson, Carmen Popescu, John Roth, Andreas Frommhold, Edward Jackson, Alexandra McClelland, Tom Lada, Greg O'Callahan
  • Enhanced EUV Photoresist Materials, Formulations and Processes
    Publication number: 20200272050
    Abstract: The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.
    Type: Application
    Filed: February 25, 2019
    Publication date: August 27, 2020
    Applicant: IRRESISTIBLE MATERIALS, LTD
    Inventors: Alex P. G. Robinson, Carmen Popescu, John Roth, Andreas Frommhold, Edward Jackson, Alexandra McClelland, Tom Lada, Greg O'Callahan
  • HARD-MASK COMPOSITION
    Publication number: 20190127604
    Abstract: Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative substituted with an amine and a crosslinking agent. The formulation is drain compatible with other solvents used in the semiconductor industry.
    Type: Application
    Filed: February 25, 2018
    Publication date: May 2, 2019
    Inventors: Alex P. G. Robinson, Guy Dawson, Allan G. Brown, Thomas Lada, John Roth, Edward Jackson