Patents by Inventor Alex T. Demos

Alex T. Demos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dry etching of transparent electrodes in a low pressure plasma reactor
    Patent number: 5667631
    Abstract: A method for dry etching an indium tin oxide (ITO) layer disposed above a substrate in a low pressure plasma reactor is disclosed. The method includes a step of placing a substrate having the ITO layer into the low pressure plasma reactor, a step of introducing an etchant gas into the low pressure plasma reactor; a step of striking a plasma from the etchant gas in the low pressure plasma reactor; and a step of etching the ITO layer with the plasma.
    Type: Grant
    Filed: June 28, 1996
    Date of Patent: September 16, 1997
    Assignee: Lam Research Corporation
    Inventors: John P. Holland, Alex T. Demos