Abstract: The invention is directed to the use of magnetic field designed pulses for the diagnoses and classification of severity of disease states and disability in humans and animals.

Abstract: A method and apparatus comprising image-guided application of a pulsed magnetic field for the diagnosis and/or treatment of various physiological, neurological and/or behavioral pathologies or conditions.

Abstract: The invention discloses an electrotherapy device for generating specifically designed low frequency pulsed magnetic fields (Cnp waveforms). The device comprises a memory storing at least one digital Cnp waveform and a digital to analog converter converting the at least one digital Cnp waveform into an analog Cnp waveform for application to a subject. A processor communicates with the memory and is responsive to operator input and conditioning the memory to output the at least one digital Cnp waveform directly to the digital to analog converter thereby to bypass the processor. The electrotherapy device is useful for electrotherapy of a subject to modify a variety of clinical physiological, neurological and behavioural conditions.

Abstract: The invention is directed to the use of magnetic field designed pulses for the diagnoses and classification of severity of disease states and disability in humans and animals.

Abstract: The invention relates to a method of manufacturing a matrix for the production of optical disks by applying a photoresist film to an unstructured matrix plate and structuring the photoresist film by selectively exposing and developing said film. When a negatively acting photoresist is used, the matrix may be metal-plated on the surface provided with the photoresist film after structuring of the photoresist film. Structuring of the photoresist film may comprise heating of the selectively exposed photoresist film, integral exposure of the photoresist film prior to developing and heating of the photoresist film following developing. The unstructured matrix plate may be etched, using the structured photoresist film as a mask, after which the photoresist film is removed to produce the matrix. Prior to applying the photoresist film to the unstructured matrix plate a metal film may be applied, to a thickness equal to the height of the structure desired in the matrix.