Patents by Inventor Alexander Anthony Schafgans
Alexander Anthony Schafgans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230143962Abstract: Systems, apparatuses, and methods are provided for dual-pass amplification of laser beams along a common beam path. An example method can include generating a first laser beam and a second laser beam. Subsequently, the example method can include performing dual-pass amplification of the first laser beam and the second laser beam along a common beam path. In some aspects, the first laser beam can include a first wavelength, the second laser beam can include a second wavelength different from the first wavelength.Type: ApplicationFiled: March 10, 2021Publication date: May 11, 2023Inventors: Rostislav Rokitski, Philip M. Conklin, Cory Alan Stinson, Alexander Anthony Schafgans, Christoffel Johannes Liebenberg
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Publication number: 20230139746Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: ApplicationFiled: December 6, 2022Publication date: May 4, 2023Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Patent number: 11553582Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: GrantFiled: April 6, 2020Date of Patent: January 10, 2023Assignee: ASML Netherlands, B.V.Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Publication number: 20200305263Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: ApplicationFiled: April 6, 2020Publication date: September 24, 2020Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Patent number: 10663866Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.Type: GrantFiled: September 20, 2016Date of Patent: May 26, 2020Assignee: ASML Netherlands B.V.Inventors: Alexander Anthony Schafgans, Igor Vladimirovich Fomenkov, Yezheng Tao, Rostislav Rokitski, Robert Jay Rafac, Daniel John William Brown, Cory Alan Stinson
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Patent number: 10645789Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: GrantFiled: October 23, 2017Date of Patent: May 5, 2020Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Publication number: 20180081280Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.Type: ApplicationFiled: September 20, 2016Publication date: March 22, 2018Inventors: Alexander Anthony Schafgans, Igor Vladimirovich Fomenkov, Yezheng Tao, Rostislav Rokitski, Robert Jay Rafac, Daniel John William Brown, Cory Alan Stinson
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Publication number: 20180063935Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: ApplicationFiled: October 23, 2017Publication date: March 1, 2018Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Patent number: 9832855Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: GrantFiled: December 15, 2015Date of Patent: November 28, 2017Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
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Publication number: 20170099721Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: ApplicationFiled: December 15, 2015Publication date: April 6, 2017Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das