Patents by Inventor Alexander Charles Van Well

Alexander Charles Van Well has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070013915
    Abstract: A level sensor for determining a height of a substrate. In one configuration, the level sensor forms part of a lithographic apparatus that includes a projection lens system. The level sensor generates one or more measurement beams and directs the measurement beam to a measurement spot on a substrate having a first reflecting surface, and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal.
    Type: Application
    Filed: June 5, 2006
    Publication date: January 18, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Nicolaas Antonius Allegondus Van Asten, Oana Balan, Luberthus Ouwehand, Machiel Jacobus Viguurs, Alexander Charles Van Well, Lun Cheng, Huibert Blokland, Elke Loenhout, Hans Bakker
  • Publication number: 20060274324
    Abstract: The invention relates to a level sensor for determining a height of a substrate. The level sensor generates one or more measurement beam and directs the measurement beam to a measurement spot on the substrate and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal. The level sensor has an optical arrangement in a predetermined area close to where the substrate is to be located. The measurement beam and the reference beam propagate along substantially equal optical paths of propagation in the predetermined area.
    Type: Application
    Filed: October 18, 2005
    Publication date: December 7, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Nicolaas Antonius Allegondus Van Asten, Oana Balan, Luberthus Ouwehand, Machiel Jacobus Viguurs, Alexander Charles Van Well, Lun Cheng, Huibert Blokland, Elke Van Loenhout, Hans Baltus Bakker
  • Publication number: 20050274909
    Abstract: A level sensor for a lithographic projection apparatus includes a light source configured to direct light onto a substrate to be measured, a detector configured to detect light reflected from the substrate, and a processor configured to calculate a difference between measurements made with the filter in the first configuration and in the second configuration. The sensor is adjustable between a first configuration, in which the light is given a first property, and a second configuration, in which the light is given a second property. The sensor may include a polarizing filter, such that the first and second properties are different polarization states.
    Type: Application
    Filed: June 10, 2004
    Publication date: December 15, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Paulus Teunissen, Rene Marinus Queens, Petra Albertina Dekkers-Rog, Alexander Charles Van Well