Abstract: The invention relates to a polyamine-based or polyhydric alcohol-based suppressing agent. The suppressing agent is modified by reaction with a compound that introduces a branching group into the suppressing agent before they are reacted with an alkylene oxide. The suppressing agent shows extraordinary superfilling properties, particularly when used to fill in features having extremely small aperture sizes and/or high aspect ratios.

Abstract: An aqueous composition including (a) metal ions including tin ions and silver ions and (b) at least one complexing agent of formula C11 RC12-XC11-RC11 ??(C11) and their salts, where XC11 is selected from (a) a divalent 5 or 6 membered aromatic N-heterocyclic group; (b) a divalent 6 membered aromatic carbocyclic group; and (c) a divalent 5 or 6 membered aliphatic N-heterocyclic group including one N atom and optionally a second heteroatom selected from N and O; ?all of which may be unsubstituted or substituted by one or more OH or one or more RC14; RC11 is selected from ?; and RC12 is selected from RC11, XC11-RC11, H, OH, NRC142, C1 to C10 alkyl, and C1 to C10 alkoxy

Abstract: Disclosed herein is an aqueous composition including tin ions, optionally alloy metal ions selected from the group consisting of silver, indium, and bismuth ions and at least one additive of formula L1a or of formula L1b

Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula I wherein X1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety, R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight, R11 is selected from H, R11, R40, R13, R14 are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13; X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O, S or NR43; R40 is H or a linear or branched C1-C20 alkyl, R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.

Abstract: Described herein is an acidic aqueous composition for copper electroplating including (a) copper ions; (b) bromide ions; and (c) at least one additive of formula S1 where XS1 is selected from the group consisting of a linear, branched or cyclic C1-C12 alkanediyl; RS1 is a monovalent (a) poly(oxy(C3 to C6)alkylene)-block-poly(oxyethylene) group, or (b) a poly(oxyethylene)-block-poly(oxy(C3 to C6)alkylene)-block-poly(oxyethylene) group; RS2, RS3, RS4 (a) are selected from the group consisting of H, RS1, RS40, or (b) RS3 and an adjacent group RS4 or, if n>2, two adjacent groups RS4 may together form a divalent group XS3; RS40 is selected from the group consisting of (a) linear or branched C1-C20 alkyl, and (b) linear or branched C1-C20 alkenyl; XS3 is selected from the group consisting of a linear, branched or cyclic C1-C12 alkanediyl; and n is an integer of from 1 to 6.

Abstract: Disclosed herein is a A polyalkanolamine including the structure of formula L1 A L n B L m wherein AL is BL is - O-X L21 o -, XL1, XL2, XL3 are independently selected from a C1 to C6 alkanediyl; ArL is a 5 or 6 membered N-heteroaromatic ring system including from 1 to 4 N atoms, which may be unsubstituted or substituted by C1 to C6 alkyl; n is an integer of from 2 to 350; m is 0 or an integer of from 1 to 600; o is 1 or an integer of from 2 to 25; BL1 is a continuation of the backbone BL by branching; XL11, XL12, XL13 are independently selected from a C1 to C6 alkanediyl; XL21 is a C1 to C6 alkanediyl; and derivatives thereof obtainable by N-protonation, N-quaternization, substitution, or polyalkoxylation.

Abstract: Described herein is a composition for depositing copper on a semiconductor substrate, the composition including (a) copper ions; (b) a grain refiner of formula G1 or salts thereof (c) a complexing agent; and (d) optionally a buffer or a base capable of adjusting the pH to a pH of from 7 to 13; where the variables are as defined herein; and where the pH of the composition is from 7 to 13.

Abstract: Described herein is a composition for depositing copper on a semiconductor substrate, the composition including (a) copper ions; (b) an additive of formula S1 (c) a complexing agent; and (d) optionally a buffer or base capable of adjusting the pH to a pH of from 7 to 13; where the variables are as defined herein; and where the pH of the composition is from 7 to 13 and where the composition is free of any cyanide.

Abstract: Described herein is a composition including copper ions, an acid, and at least one polyaminoamide including, a group of formula L1 [A-B-A?-Z]n[Y—Z]m??(L1) where B is a diacid fragment of formula L2 A, A? are amine fragments independently selected from the group consisting of formula L3a and formula L3b Y is a co-monomer fragment; Z is a coupling fragment of formula L4 n is an integer of from 1 to 400; and m is 0 or an integer of from 1 to 400.

Abstract: The present invention relates to the use of an aqueous composition comprising tin ions optionally further alloy metal ions selected from silver, copper, indium, and bismuth ions and at least one additive comprising a linear or branched polyimidazolium compound comprising the structural unit of formula (L1) for depositing tin or tin alloy containing layers and a process for depositing tin alloy layer onto a substrate.

Abstract: Disclosed herein is a composition including copper ions and at least one additive including a polyalkyleneimine backbone including N-hydrogen atoms, where (a) the polyalkyleneimine backbone has a mass average molecular weight MW of from 600 g/mol to 100 000 g/mol, (b) the N-hydrogen atoms are each substituted by a polyoxyalkylene group including an oxyethylene and a C3 to C6 oxyalkylene unit, and (c) the average number of oxyalkylene units in the polyoxyalkylene groups is of from more than 10 to less than 30 per N-hydrogen atom in the polyalkyleneimine.

Abstract: Disclosed herein is a composition for copper bump electrodeposition including copper ions and at least one additive including a polyalkyleneimine backbone including N-hydrogen atoms, where (a) the polyalkyleneimine backbone has a mass average molecular weight Mw of from 900 g/mol to 100 000 g/mol, (b) the N-hydrogen atoms are each substituted by a C2 to C6 polyoxyalkylene group, and (c) the average number of oxyalkylene units in the polyoxyalkylene group is from more than 10 to less than 30 per N-hydrogen atoms in the polyalkyleneimine.

Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula I where X1, X2 are independently selected from a linear or branched C1-C12 alkanediyl, R11 is a monovalent group of formula —(O—CH2—CHR41)m—OR42, R12, R13, R14 are independently selected from H, R11, and R40; R15 is selected from H, R11, R40 and —X4—N(R21)2, X4 is a divalent group selected from (a) a linear or branched C1 to C12 alkanediyl, and (b) formula —(O—CH2—CHR41)o—, R21 is selected from R11 and R40, R40 is a linear or branched C1-C20 alkyl, R41 is selected from H and a linear or branched C1 to C5 alkyl, R42 is selected from H and a linear or branched C1-C20 alkyl, n is an integer of from 1 to 6, m is an integer of from 2 to 250, and o is an integer of from 1 to 250.

Abstract: Described herein is a cobalt electrodeposition composition including cobalt ions, and particular leveling agents including X1—CO—O—R11, X1—SO2—O—R11, X1—PO(OR11)2, X1—SO—O—R11 functional groups, where X1 is a divalent group selected from (i) a chemical bond (ii) aryl, (iii) C1 to C12 alkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group —X11—X12—, (v) an alkylaryl group —X12—X11— and (vi) —(O—C2H3R12)mO—, R11 is selected from H and C1 to C4 alkyl. R12 is selected from H and C1 to C4 alkyl, X12 is a divalent aryl group, and X11 is a divalent C1 to C15 alkandiyl group.

Abstract: A composition for metal plating comprising a source of metal ions and at least one leveling agent comprising at least one polyaminoamide comprising a polymer fragment of formula (I) or derivatives thereof obtainable by complete or partial protonation or N-quarternisation.

Abstract: A cobalt electrodeposition composition comprising cobalt ions, and particular leveling agents comprising X1—CO—O—R11, X1—SO2—O—R11, X1—PO(OR11)2, X1—SO—O—R11 functional groups, wherein X1 is a divalent group selected from (i) a chemical bond (ii) aryl, (iii) C1 to C12 alkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group —X11—X12—, (v) an alkylaryl group —X12—X11—, and (vi) —(O—C2H3R12)mO—, R11 is selected from H and C1 to C4 alkyl. R12 is selected from H and C1 to C4 alkyl, X12 is a divalent aryl group, X11 is a divalent C1 to C15 alkandiyl group.

Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula I wherein X1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety, R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight, R11 is selected from H, R11, R40, R13, R14 are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13; X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O, S or NR43; R40 is H or a linear or branched C1-C20 alkyl, R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.

Abstract: The present invention provides an aqueous composition comprising tin ions and at least one compound of formula I wherein X1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety, R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight, R12 is selected from H, R11, R40, R13, R14, are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13; X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O, S or NR43; R40 is H or a linear or branched C1-C20 alkyl, R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.

Abstract: Described herein is a composition including metal ions consisting essentially of cobalt ions, and a specific monomeric and polymeric suppressing agent including a carboxylic, sulfonic, sulfinic, phosphonic, or phosphinic acid functional groups which show a suppressing effect that is required for void-free bottom-up filling of nanometer-sized recessed features.

Abstract: The present invention provides an aqueous composition comprising tin ions and at least one compound of formula I wherein X1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety, R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight, R12 is selected from H, R11, R40, R13, R14, are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13; X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O, S or NR43; R40 is H or a linear or branched C1-C20 alkyl, R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.