Abstract: The present invention relates to a way of presenting a musical composition such as an orchestral piece, a song, jingle, or other musical content (complete or excerpts) as a sort of game made up of component audio tracks. In one preferred embodiment, the individual tracks are defined by layers (also called “segments”) that represent different instruments. For example, in the case of an orchestral music, the layers may represent the sounds made by a violin, flute, trumpet, drum, piano, and so on. The separate digital recordings of each layer then are the audio tracks that become pieces of a puzzle.

Abstract: The present invention relates to a way of presenting a musical composition such as an orchestral piece, a song, jingle, or other musical content (complete or excerpts) as a sort of game made up of component audio tracks. In one preferred embodiment, the individual tracks are defined by layers (also called “segments”) that represent different instruments. For example, in the case of an orchestral music, the layers may represent the sounds made by a violin, flute, trumpet, drum, piano, and so on. The separate digital recordings of each layer then are the audio tracks that become pieces of a puzzle.

Abstract: Disclosed is a process for reducing lithographic image size for integrated circuit manufacture. A mask of photosensitive material having an opening of a minimum size dictated by the limits of lithography is formed on a substrate. Reduction in the image size is achieved by establishing sidewalls to the interior vertical surfaces of the opening by depositing a conformal layer, followed by anisotropic etching. The dimension of the opening is reduced by the combined thickness of the two opposite insulator sidewalls.In a specific direct application of the disclosed process, a photomask/stencil having a pattern of openings of a minimum size smaller than possible by lighography, per se, is formed.

Abstract: Disclosed is a process for reducing lithographic image size for integrated circuit manufacture. A mask of photosensitive material having an opening of a minimum size dictated by the limits of lithography is formed on a substrate. Reduction in the image size is achieved by establishing sidewalls to the interior vertical surfaces of the opening by depositing a conformal layer, followed by anisotropic etching. The dimension of the opening is reduced by the combined thickness of the two opposite insulator sidewalls.In a specific direct application of the disclosed process, a photomask/stencil having a pattern of openings of a minimum size smaller than possible by lithography, per se, is formed.