Patents by Inventor Alexander Glas

Alexander Glas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240150147
    Abstract: The application relates to an unloading device for a substrate magazine, wherein the substrate magazine has multiple drawers in which substrates are arrangeable for storage or temporary storage, having at least one controllable conveyor belt on which substrates can be placed, and having at least one controllable gripper arm, which is designed to push at least one substrate out of a drawer of the substrate magazine to the conveyor belt, wherein the conveyor belt and the gripper arm are arranged on a common and movably mounted carrier, wherein the gripper arm is arranged at least in a starting position below the conveyor belt in order to grip at least one substrate from below for pushing out.
    Type: Application
    Filed: November 2, 2023
    Publication date: May 9, 2024
    Inventors: Markus GLAß, Matthias BAIKER, Alexander STREHL
  • Patent number: 9601920
    Abstract: According to an embodiment, a transient voltage protection circuit includes a first integrated circuit including an input node, an output node, a first transient voltage protection component coupled between the input node and a reference voltage node, and an impedance element coupled between the input node and the output node. The first transient voltage protection component has a first dynamic resistance and the output node is configured to be coupled to an electrostatic discharge (ESD) protection component having a second dynamic resistance that is greater than the first dynamic resistance.
    Type: Grant
    Filed: July 10, 2014
    Date of Patent: March 21, 2017
    Assignee: Infineon Technologies AG
    Inventors: Alexander Glas, Klaus Scharnagl
  • Patent number: 9577852
    Abstract: A common-mode suppressor for eliminating common-mode noise in high frequency differential data transmission systems and an associated method includes a long coiled differential transmission line configured to transfer data between a source and a load. The differential transmission line comprises a first conductive wire and a second conductive wire which are inductively and capacitively coupled and are laterally aligned or vertically aligned with each other. Further, the differential transmission line is matched for differential signals and un-matched for common-mode noise.
    Type: Grant
    Filed: November 3, 2014
    Date of Patent: February 21, 2017
    Assignee: Infineon Technologies AG
    Inventors: Maciej Wojnowski, Alexander Glas, Hubert Werthmann, Josef-Paul Schaffer, Francesca Arcioni, Gabriele Bettineschi
  • Publication number: 20160127157
    Abstract: A common-mode suppressor for eliminating common-mode noise in high frequency differential data transmission systems and an associated method includes a long coiled differential transmission line configured to transfer data between a source and a load. The differential transmission line comprises a first conductive wire and a second conductive wire which are inductively and capacitively coupled and are laterally aligned or vertically aligned with each other. Further, the differential transmission line is matched for differential signals and un-matched for common-mode noise.
    Type: Application
    Filed: November 3, 2014
    Publication date: May 5, 2016
    Inventors: Maciej Wojnowski, Alexander Glas, Hubert Werthmann, Josef-Paul Schaffer, Francesca Arcioni, Gabriele Bettineschi
  • Publication number: 20160013638
    Abstract: According to an embodiment, a transient voltage protection circuit includes a first integrated circuit including an input node, an output node, a first transient voltage protection component coupled between the input node and a reference voltage node, and an impedance element coupled between the input node and the output node. The first transient voltage protection component has a first dynamic resistance and the output node is configured to be coupled to an electrostatic discharge (ESD) protection component having a second dynamic resistance that is greater than the first dynamic resistance.
    Type: Application
    Filed: July 10, 2014
    Publication date: January 14, 2016
    Inventors: Alexander Glas, Klaus Scharnagl
  • Patent number: 8975612
    Abstract: In one embodiment, a method of forming a semiconductor device includes forming a first inductor coil within and/or over a substrate. The first inductor coil is formed adjacent a top side of the substrate. First trenches are formed within the substrate adjacent the first inductor coil. The first trenches are filled at least partially with a magnetic fill material. At least a first portion of the substrate underlying the first inductor coil is thinned. A backside magnetic layer is formed under the first portion of the substrate. The backside magnetic layer and the magnetic fill material form at least a part of a magnetic core region of the first inductor coil.
    Type: Grant
    Filed: March 19, 2014
    Date of Patent: March 10, 2015
    Assignee: Infineon Technologies AG
    Inventors: Renate Hofmann, Carsten Ahrens, Wolfgang Klein, Alexander Glas
  • Patent number: 8952489
    Abstract: A semiconductor package includes a semiconductor chip, an inductor applied to the semiconductor chip. The inductor includes at least one winding. A space within the at least one winding is filled with a magnetic material.
    Type: Grant
    Filed: October 9, 2012
    Date of Patent: February 10, 2015
    Assignee: Infineon Technologies AG
    Inventors: Klaus Elian, Jens Pohl, Horst Theuss, Renate Hofmann, Alexander Glas, Carsten Ahrens
  • Publication number: 20140203399
    Abstract: In one embodiment, a method of forming a semiconductor device includes forming a first inductor coil within and/or over a substrate. The first inductor coil is formed adjacent a top side of the substrate. First trenches are formed within the substrate adjacent the first inductor coil. The first trenches are filled at least partially with a magnetic fill material. At least a first portion of the substrate underlying the first inductor coil is thinned. A backside magnetic layer is formed under the first portion of the substrate. The backside magnetic layer and the magnetic fill material form at least a part of a magnetic core region of the first inductor coil.
    Type: Application
    Filed: March 19, 2014
    Publication date: July 24, 2014
    Inventors: Renate Hofmann, Carsten Ahrens, Wolfgang Klein, Alexander Glas
  • Patent number: 8709831
    Abstract: In one embodiment, a method of forming a semiconductor device includes forming a first inductor coil within and/or over a substrate. The first inductor coil is formed adjacent a top side of the substrate. First trenches are formed within the substrate adjacent the first inductor coil. The first trenches are filled at least partially with a magnetic fill material. At least a first portion of the substrate underlying the first inductor coil is thinned. A backside magnetic layer is formed under the first portion of the substrate. The backside magnetic layer and the magnetic fill material form at least a part of a magnetic core region of the first inductor coil.
    Type: Grant
    Filed: May 28, 2013
    Date of Patent: April 29, 2014
    Assignee: Infineon Technologies AG
    Inventors: Renate Hofmann, Carsten Ahrens, Wolfgang Klein, Alexander Glas
  • Publication number: 20140097514
    Abstract: A semiconductor package includes a semiconductor chip, an inductor applied to the semiconductor chip. The inductor includes at least one winding. A space within the at least one winding is filled with a magnetic material.
    Type: Application
    Filed: October 9, 2012
    Publication date: April 10, 2014
    Applicant: INFINEON TECHNOLOGIES AG
    Inventors: Klaus Elian, Jens Pohl, Horst Theuss, Renate Hofmann, Alexander Glas, Carsten Ahrens
  • Publication number: 20130260483
    Abstract: In one embodiment, a method of forming a semiconductor device includes forming a first inductor coil within and/or over a substrate. The first inductor coil is formed adjacent a top side of the substrate. First trenches are formed within the substrate adjacent the first inductor coil. The first trenches are filled at least partially with a magnetic fill material. At least a first portion of the substrate underlying the first inductor coil is thinned. A backside magnetic layer is formed under the first portion of the substrate. The backside magnetic layer and the magnetic fill material form at least a part of a magnetic core region of the first inductor coil.
    Type: Application
    Filed: May 28, 2013
    Publication date: October 3, 2013
    Applicant: Infineon Technologies AG
    Inventors: Renate Hofmann, Carsten Ahrens, Wolfgang Klein, Alexander Glas
  • Patent number: 8470612
    Abstract: In one embodiment, a method of forming a semiconductor device includes forming a first inductor coil within and/or over a substrate. The first inductor coil is formed adjacent a top side of the substrate. First trenches are formed within the substrate adjacent the first inductor coil. The first trenches are filled at least partially with a magnetic fill material. At least a first portion of the substrate underlying the first inductor coil is thinned. A backside magnetic layer is formed under the first portion of the substrate. The backside magnetic layer and the magnetic fill material form at least a part of a magnetic core region of the first inductor coil.
    Type: Grant
    Filed: October 7, 2010
    Date of Patent: June 25, 2013
    Assignee: Infineon Technologies AG
    Inventors: Renate Hofmann, Carsten Ahrens, Wolfgang Klein, Alexander Glas
  • Publication number: 20120086102
    Abstract: In one embodiment, a method of forming a semiconductor device includes forming a first inductor coil within and/or over a substrate. The first inductor coil is formed adjacent a top side of the substrate. First trenches are formed within the substrate adjacent the first inductor coil. The first trenches are filled at least partially with a magnetic fill material. At least a first portion of the substrate underlying the first inductor coil is thinned. A backside magnetic layer is formed under the first portion of the substrate. The backside magnetic layer and the magnetic fill material form at least a part of a magnetic core region of the first inductor coil.
    Type: Application
    Filed: October 7, 2010
    Publication date: April 12, 2012
    Inventors: Renate Hofmann, Carsten Ahrens, Wolfgang Klein, Alexander Glas