Patents by Inventor Alexander Henricus Waltherus Van Eeuwijk

Alexander Henricus Waltherus Van Eeuwijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8382319
    Abstract: A light output device comprises a first and a second substrate arrangement (1,2), the first substrate arrangement (1) comprising a light output surface of the device. An electrode arrangement (3a,3b) is sandwiched between the substrate arrangements and at least one light source (4) is connected to the electrode arrangement. The first substrate (1) arrangement comprises a light diffuser for changing the level of uniformity of the light output from the light source and the second substrate (2) arrangement comprises a light scattering or reflecting layer. This arrangement uses a scattering substrate arrangement for the substrate from which illumination is provided. In order to enhance the level of uniformity, the opposite substrate arrangement is also either scattering or reflecting.
    Type: Grant
    Filed: March 31, 2008
    Date of Patent: February 26, 2013
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Alexander Henricus Waltherus Van Eeuwijk, Eduard Matheus Johannes Niessen
  • Publication number: 20100110675
    Abstract: A light output device comprises a first and a second substrate arrangement (1,2), the first substrate arrangement (1) comprising a light output surface of the device. An electrode arrangement (3a,3b) is sandwiched between the substrate arrangements and at least one light source (4) is connected to the electrode arrangement. The first substrate (1) arrangement comprises a light diffuser for changing the level of uniformity of the light output from the light source and the second substrate (2) arrangement comprises a light scattering or reflecting layer. This arrangement uses a scattering substrate arrangement for the substrate from which illumination is provided. In order to enhance the level of uniformity, the opposite substrate arrangement is also either scattering or reflecting.
    Type: Application
    Filed: March 31, 2008
    Publication date: May 6, 2010
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Alexander Henricus Waltherus Van Eeuwijk, Eduard Matheus Johannes Niessen
  • Patent number: 7692646
    Abstract: A method of scaling a three-dimensional input model 100 in a three-dimensional input space into a three-dimensional output model 200 which fits in a predetermined three-dimensional output space 104 is disclosed. The scaling is such that a first input surface 106 in the three-dimensional input space, having a first distance to a viewpoint, is projected to a first output surface 110 in the predetermined three-dimensional output space by applying a first scaling factor and whereby a second input surface 108 in the three-dimensional input space, having a second distance to the viewpoint, which is smaller than the first distance, is projected to a second output surface 112 in the predetermined three-dimensional space, by applying a second scaling factor which is larger than the first scaling factor.
    Type: Grant
    Filed: December 6, 2004
    Date of Patent: April 6, 2010
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Peter-Andre Redert, Alexander Henricus Waltherus Van Eeuwijk
  • Publication number: 20090009536
    Abstract: A method of scaling a three-dimensional input model (100) in a three-dimensional input space into a three-dimensional output model (200) which fits in a predetermined three-dimensional output space (104) is disclosed. The scaling is such that a first input surface (106) in the three-dimensional input space, having a first distance to a viewpoint, is projected to a first output surface (110) in the predetermined three-dimensional output space by applying a first scaling factor and whereby a second input surface (108) in the three-dimensional input space, having a second distance to the viewpoint, which is smaller than the first distance, is projected to a second output surface (112) in the predetermined three-dimensional space, by applying a second scaling factor which is larger than the first scaling factor.
    Type: Application
    Filed: December 6, 2004
    Publication date: January 8, 2009
    Applicant: KONINKLIJKE PHILIPS ELECTRONIC, N.V.
    Inventors: Peter-Andre REDERT, Alexander Henricus Waltherus VAN EEUWIJK