Abstract: An environmental transmission electron microscope (ETEM) suffers from gas-induced resolution deterioration. Inventors conclude that the deterioration is due to ionization of gas in the sample chamber of the ETEM, and propose to use an electric field in the sample chamber to remove the ionized gas, thereby diminishing the gas-induced resolution deterioration. The electric field need not be a strong field, and can be caused by, for example, biasing the sample with respect to the sample chamber. A bias voltage of 100 V applied via voltage source is sufficient for a marked improvement the gas-induced resolution deterioration. Alternatively an electric field perpendicular to the optical axis can be used, for example by placing an electrically biased wire or gauze off-axis in the sample chamber.

Abstract: The invention describes a corrector for the correction of chromatic aberrations in a particle lens, such as used in a SEM or a TEM. So as to reduce the stability demands on the power supplies of such a corrector, the energy with which the particle beam passes through the corrector is lower than the energy with which the beam passes through the lens to be corrected.

Abstract: Commercially available High Resolution Transmission Electron Microscopes (HR-TEM) and Scanning Transmission Electron Microscopes (HR-STEM) are nowadays equipped with correctors for correcting the axial spherical aberration Cs of the so-named objective lens. Inevitably other aberrations become the limiting aberration. For the hexapole type correctors, also known as Rose correctors, or variants thereof, six-fold axial astigmatism, also known as A5, and sixth-order three lobe aberration, also known as D6, introduced by the corrector, are known to become the limiting aberration. The invention shows that by adding a weak hexapole (126) in the cross-over between the hexapoles, a Rose like corrector or a Crewe like corrector free of A5 or D6 can be made, or, by adding both the weak hexapole and a dodecapole, a corrector that is free of both A5 and D6.

Abstract: A charged particle filter with an integrated energy filter, in which the charged particle emitter, the focusing electrodes, and the deflection electrodes are arranged round a straight axis. Where most energy filters used have a highly curved optical axis, and thus use parts with forms that are difficult to manufacture, the source according the invention uses electrodes surrounding a straight optical axis. A beam of charged particles can be deflected quite far from the axis showing respectable energy dispersion at an energy selecting slit without introducing coma or astigmatism that cannot be corrected, provided that some of the are formed as 120°/60°/120°/60°. Such electrodes can be attached to each other by gluing or brazing of ceramic, and then series of a highly concentric bores can be formed by, e.g., spark erosion.

Abstract: The invention relates to a charged-particle microscope comprising a charged-particle source; a sample holder; a charged-particle lens system; a detector; and a beam pulsing device, for causing the beam to repeatedly switch on and off so as to produce a pulsed beam. The beam pulsing device comprises a unitary resonant cavity disposed about a particle-optical axis and has an entrance aperture and an exit aperture for the beam. The resonant cavity is configured to simultaneously produce a first oscillatory deflection of the beam at a first frequency in a first direction and a second oscillatory deflection of the beam at a second, different frequency in a second, different direction. The resonant cavity may have an elongated (e.g. rectangular or elliptical) cross-section, with a long axis parallel to said first direction and a short axis parallel to said second direction.

Abstract: Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.

Abstract: A charged particle apparatus is equipped with a third stigmator positioned between the objective lens and a detector system, as a result of which a third degree of freedom is created for reducing the linear distortion. Further, a method of using said three stigmators, comprises exciting the first stigmator to reduce astigmatism when imaging the sample, exciting the second stigmator to reduce astigmatism when imaging the diffraction plane, and exciting the third stigmator to reduce the linear distortion.

Abstract: A particle source in which energy selection occurs by sending a beam of electrically charged particles eccentrically through a lens so that energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit in an energy selecting diaphragm, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam will have a reduced energy spread. The energy dispersed spot is imaged on the slit by a deflector. When positioning the energy dispersed spot on the slit, central beam is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector is avoided.

Abstract: A charged particle apparatus is equipped with a third stigmator positioned between the objective lens and a detector system, as a result of which a third degree of freedom is created for reducing the linear distortion. Further, a method of using said three stigmators, comprises exciting the first stigmator to reduce astigmatism when imaging the sample, exciting the second stigmator to reduce astigmatism when imaging the diffraction plane, and exciting the third stigmator to reduce the linear distortion.

Abstract: A charged particle filter with an integrated energy filter, in which the charged particle emitter, the focusing electrodes, and the deflection electrodes are arranged round a straight axis. Where most energy filters used have a highly curved optical axis, and thus use parts with forms that are difficult to manufacture, the source according the invention uses electrodes surrounding a straight optical axis. A beam of charged particles can be deflected quite far from the axis showing respectable energy dispersion at an energy selecting slit without introducing coma or astigmatism that cannot be corrected, provided that some of the are formed as 120°/60°/120°/60°. Such electrodes can be attached to each other by gluing or brazing of ceramic, and then series of a highly concentric bores can be formed by, e.g., spark erosion.

Abstract: A particle source in which energy selection occurs by sending a beam of electrically charged particles eccentrically through a lens so that energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit in an energy selecting diaphragm, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam will have a reduced energy spread. The energy dispersed spot is imaged on the slit by a deflector. When positioning the energy dispersed spot on the slit, central beam is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector is avoided.

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 103 eccentrically through a lens 107. As a result of this, energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit 109 in an energy selecting diaphragm 108, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 113 will have a reduced energy spread. Deflection unit 112 deflects the beam to the optical axis 101. One can also elect to deflect a beam 105 going through the middle of the lens toward the optical axis and having, for example, greater current. The energy dispersed spot is imaged on the slit by a deflector 111. When positioning the energy dispersed spot on the slit, central beam 105 is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm.

Abstract: Commercially available High Resolution Transmission Electron Microscopes (HR-TEM) and Scanning Transmission Electron Microscopes (HR-STEM) are nowadays equipped with correctors for correcting the axial spherical aberration Cs of the so-named objective lens. Inevitably other aberrations become the limiting aberration. For the hexapole type correctors, also known as Rose correctors, or variants thereof, six-fold axial astigmatism, also known as A5, and sixth-order three lobe aberration, also known as D6, introduced by the corrector, are known to become the limiting aberration. The invention shows that by adding a weak hexapole (126) in the cross-over between the hexapoles, a Rose like corrector or a Crewe like corrector free of A5 or D6 can be made, or, by adding both the weak hexapole and a dodecapole, a corrector that is free of both A5 and D6.

Abstract: Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 103 eccentrically through a lens 107. As a result of this, energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit 109 in an energy selecting diaphragm 108, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 113 will have a reduced energy spread. Deflection unit 112 deflects the beam to the optical axis 101. One can also elect to deflect a beam 105 going through the middle of the lens toward the optical axis and having, for example, greater current. The energy dispersed spot is imaged on the slit by a deflector 111. When positioning the energy dispersed spot on the slit, central beam 105 is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm.

Abstract: The invention describes a corrector for the correction of chromatic aberrations in a particle lens, such as used in a SEM or a TEM. So as to reduce the stability demands on the power supplies of such a corrector, the energy with which the particle beam passes through the corrector is lower than the energy with which the beam passes through the lens to be corrected.

Abstract: Quadrupole-octupole aberration corrector for application in a TEM, STEM or SEM. A known corrector for correcting third-order and fifth-order aberrations of the objective is embodied with eight quadrupoles and three octupoles. The corrector according to the invention has at least the same aberration-correcting power, but, according to the invention, is embodied with six quadrupoles and three octupoles. By adding octupoles with a relatively weak excitation to a portion of the quadrupoles, correction of the anisotropic coma of the objective lens is also attained. By embodying all quadrupoles, or a portion thereof, to be electromagnetic, chromatic aberrations can also be corrected for.

Abstract: Quadrupole-octupole aberration corrector for application in a TEM, STEM or SEM. A known corrector for correcting third-order and fifth-order aberrations of the objective is embodied with eight quadrupoles and three octupoles. The corrector according to the invention has at least the same aberration-correcting power, but, according to the invention, is embodied with six quadrupoles and three octupoles. By adding octupoles with a relatively weak excitation to a portion of the quadrupoles, correction of the anisotropic coma of the objective lens is also attained. By embodying all quadrupoles, or a portion thereof, to be electromagnetic, chromatic aberrations can also be corrected for.

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 13 eccentrically through a lens 6. As a result of this, energy dispersion will occur in an image 15 formed by the lens 6. By projecting this image 15 onto a diaphragm 7, it is possible to only allow particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 16 will have a reduced energy spread. By adding a deflection unit 10, this particle beam 16 can be deflected toward the optical axis 2. One can also elect to deflect a beam 12 going through the middle of the lens 6—and having, for example, greater current—toward the optical axis.

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 13 eccentrically through a lens 6. As a result of this, energy dispersion will occur in an image 15 formed by the lens 6. By projecting this image 15 onto a diaphragm 7, it is possible to only allow particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 16 will have a reduced energy spread. By adding a deflection unit 10, this particle beam 16 can be deflected toward the optical axis 2. One can also elect to deflect a beam 12 going through the middle of the lens 6—and having, for example, greater current—toward the optical axis.