Patents by Inventor Alexander K. Eidukonis

Alexander K. Eidukonis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230016122
    Abstract: A method of operating a beamline ion implanter may include performing, in an ion implanter, a first implant procedure to implant a dopant of a first polarity into a given semiconductor substrate, and generating an estimated implant dose of the dopant of the first polarity based upon a set of filtered information, generated by the first implant procedure. The method may also include calculating an actual implant dose of the dopant of the first polarity using a predictive model based upon the estimated implant dose, and performing, in the ion implanter, an adjusted second implant procedure to implant a dopant of a second polarity into a select semiconductor substrate, based upon the actual implant dose.
    Type: Application
    Filed: December 23, 2021
    Publication date: January 19, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Alexander K. Eidukonis, Hans-Joachim L. Gossmann, Dennis Rodier, Stanislav S. Todorov, Richard White, Wei Zhao, Wei Zou, Supakit Charnvanichborikarn