Patents by Inventor Alexander Kharchenko
Alexander Kharchenko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250020601Abstract: The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 ?m.Type: ApplicationFiled: June 24, 2024Publication date: January 16, 2025Inventors: Detlef Beckers, Alexander Kharchenko, Milen Gateshki
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Publication number: 20240298400Abstract: The present invention relates to an X-ray analysis apparatus and an X-ray method for analysing a sample. The X-ray analysis apparatus includes an X-ray source comprising an anode and a cathode, and configured to irradiate an irradiated area on a target surface of the anode. The X-ray analysis apparatus further includes a steering arrangement, a processor and a controller. The steering arrangement is configured to position the irradiated area on the target surface of the anode. The processor is configured to receive X-ray analysis information, and to determine a change in position of the irradiated area on the target surface based on the X-ray analysis information. The controller is configured to control the steering arrangement to move the irradiated area on the target surface according to the change in position determined by the processor.Type: ApplicationFiled: March 1, 2024Publication date: September 5, 2024Inventors: Detlef Beckers, Alexander Kharchenko, Dmitriy Malyutin
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Patent number: 12031925Abstract: The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 ?m.Type: GrantFiled: August 30, 2022Date of Patent: July 9, 2024Assignee: Malvern Panalytical B.V.Inventors: Detlef Beckers, Alexander Kharchenko, Milen Gateshki
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Patent number: 12007343Abstract: A beam shaping apparatus (10) for use in an X-ray analysis device (40). The beam shaping apparatus processes an input beam (32) from an X-ray beam source (20), and generates an output beam (34) with an output beam shape for irradiating a sample (112) held by a sample holder (22) of the X-ray analysis device. Movement of the output beam shape is controlled in dependence upon a varying tilt angle (?) of the sample (112), this defined by a tilt position of the sample holder (22).Type: GrantFiled: April 3, 2020Date of Patent: June 11, 2024Assignee: Malvern Panalytical B.V.Inventors: Milen Gateshki, Alexander Kharchenko, Detlef Beckers, Nicholas Norberg
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Publication number: 20230296536Abstract: Embodiments of the present invention provide an X-ray collimator for collimating an incident X-ray beam by limiting divergence of the incident X-ray beam, the X-ray collimator having a variable acceptance angle, an X-ray analysis apparatus comprising an X-ray collimator having a variable acceptance angle and a method of using the X-ray analysis apparatus. The X-ray analysis apparatus comprises a position-sensitive X-ray detector, and the X-ray collimator is arranged between the sample and the position-sensitive X-ray detector to limit axial divergence of X-rays from the sample.Type: ApplicationFiled: March 16, 2023Publication date: September 21, 2023Inventors: Vladimir Kogan, Detlef Beckers, Alexander Kharchenko
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Publication number: 20230270394Abstract: The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 ?m.Type: ApplicationFiled: August 30, 2022Publication date: August 31, 2023Inventors: Detlef Beckers, Alexander Kharchenko, Milen Gateshki
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Publication number: 20220163466Abstract: A beam shaping apparatus (10) for use in an X-ray analysis device (40). The beam shaping apparatus processes an input N beam (32) from an X-ray beam source (20), and generates an output beam (34) with an output beam shape for irradiating a sample (112) held by a sample holder (22) of the X-ray analysis device. Movement of the output beam shape is controlled in dependence upon a varying tilt angle (?) of the sample (112), this defined by a tilt position of the sample holder (22).Type: ApplicationFiled: April 3, 2020Publication date: May 26, 2022Inventors: Milen GATESHKI, Alexander KHARCHENKO, Detlef BECKERS, Nicholas NORBERG
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Patent number: 10753890Abstract: An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.Type: GrantFiled: March 6, 2018Date of Patent: August 25, 2020Assignee: MALVERN PANALYTICAL B.V.Inventors: Detlef Beckers, Alexander Kharchenko, Milen Gateshki, Eugene Reuvekamp
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Publication number: 20180259464Abstract: An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.Type: ApplicationFiled: March 6, 2018Publication date: September 13, 2018Inventors: Detlef Beckers, Alexander Kharchenko, Milen Gateshki, Eugene Reuvekamp
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Patent number: 9784699Abstract: Quantitative X-ray analysis is carried out by making X-ray fluorescence measurements to determine the elemental composition of a sample and a correction measurement by measuring the transmitted intensity of X-rays at an energy E transmitted directly through the sample without deviation. An X-ray diffraction measurement is made in transmission by directing X-rays from an X-ray source at the energy E onto a sample at an incident angle ?1 to the surface of the sample and measuring a measured intensity Id(?fl) of the diffracted X-rays at the energy E with an X-ray detector at an exit angle ?2 corresponding to an X-ray diffraction peak of a predetermined component. A matrix corrected X-ray intensity is obtained using the measured X-ray intensity in the X-ray diffraction measurement, the correction measurement and the mass attenuation coefficient of the sample calculated from the elemental composition and the mass attenuation coefficients of the elements.Type: GrantFiled: March 3, 2015Date of Patent: October 10, 2017Assignee: PANALYTICAL B.V.Inventors: Charalampos Zarkadas, Milen Gateshki, Alexander Kharchenko, Waltherus Van Den Hoogenhof, Petronella Emerentiana Hegeman, Dick Kuiper
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Publication number: 20160258890Abstract: Quantitative X-ray analysis is carried out by making X-ray fluorescence measurements to determine the elemental composition of a sample and a correction measurement by measuring the transmitted intensity of X-rays at an energy E transmitted directly through the sample without deviation. An X-ray diffraction measurement is made in transmission by directing X-rays from an X-ray source at the energy E onto a sample at an incident angle ?1 to the surface of the sample and measuring a measured intensity Id(?fl) of the diffracted X-rays at the energy E with an X-ray detector at an exit angle ?2 corresponding to an X-ray diffraction peak of a predetermined component. A matrix corrected X-ray intensity is obtained using the measured X-ray intensity in the X-ray diffraction measurement, the correction measurement and the mass attenuation coefficient of the sample calculated from the elemental composition and the mass attenuation coefficients of the elements.Type: ApplicationFiled: March 3, 2015Publication date: September 8, 2016Inventors: Charalampos Zarkadas, Milen Gateshki, Alexander Kharchenko, Waltherus Van Den Hoogenhof, Petronella Emerentiana Hegeman, Dick Kuiper
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Patent number: 7978820Abstract: An instrument capable of both X-ray diffraction, XRD, and X-ray fluorescence measurements, XRF, arranges an X-ray source 10 creating an incident X-ray beam directed to a sample on a sample stage. An X-ray detection system is mounted at a fixed angle 2? for high energy energy dispersive XRD For XRF, an X-ray detection system is used.Type: GrantFiled: October 22, 2009Date of Patent: July 12, 2011Assignee: Panalytical B.V.Inventors: Alexander Kharchenko, Roger Meier, Walter van den Hoogenhof
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Publication number: 20110096898Abstract: An instrument capable of both X-ray diffraction, XRD, and X-ray fluorescence measurements, XRF, arranges an X-ray source 10 creating an incident X-ray beam directed to a sample on a sample stage.Type: ApplicationFiled: October 22, 2009Publication date: April 28, 2011Inventors: Alexander Kharchenko, Roger Meier, Walter van den Hoogenhof
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Patent number: 7116754Abstract: A monochromator 4 is used to direct X-rays from X-ray source 2 onto a sample 14 as a convergent beam. The sample 14 is in a growth chamber. The sample is rotated, and diffraction measurements are made in parallel with multichannel detector 22. A specific reflection is used so that the intensity against angle graph measured in the multichannel detector gives information about the vertical lattice parameter. To compensate for wobble inevitably introduced by the rotation of the sample, short time measurements are made and summed.Type: GrantFiled: February 24, 2005Date of Patent: October 3, 2006Assignee: PANalytical B.V.Inventors: Klaus Lischka, Alexander Kharchenko
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Publication number: 20050195941Abstract: A monochromator 4 is used to direct X-rays from X-ray source 2 onto a sample 14 as a convergent beam. The sample 14 is in a growth chamber. The sample is rotated, and diffraction measurements are made in parallel with multichannel detector 22. A specific reflection is used so that the intensity against angle graph measured in the multichannel detector gives information about the vertical lattice parameter. To compensate for wobble inevitably introduced by the rotation of the sample, short time measurements are made and summed.Type: ApplicationFiled: February 24, 2005Publication date: September 8, 2005Inventors: Klaus Lischka, Alexander Kharchenko