Patents by Inventor Alexander Kharchenko

Alexander Kharchenko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230296536
    Abstract: Embodiments of the present invention provide an X-ray collimator for collimating an incident X-ray beam by limiting divergence of the incident X-ray beam, the X-ray collimator having a variable acceptance angle, an X-ray analysis apparatus comprising an X-ray collimator having a variable acceptance angle and a method of using the X-ray analysis apparatus. The X-ray analysis apparatus comprises a position-sensitive X-ray detector, and the X-ray collimator is arranged between the sample and the position-sensitive X-ray detector to limit axial divergence of X-rays from the sample.
    Type: Application
    Filed: March 16, 2023
    Publication date: September 21, 2023
    Inventors: Vladimir Kogan, Detlef Beckers, Alexander Kharchenko
  • Publication number: 20230270394
    Abstract: The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 ?m.
    Type: Application
    Filed: August 30, 2022
    Publication date: August 31, 2023
    Inventors: Detlef Beckers, Alexander Kharchenko, Milen Gateshki
  • Publication number: 20220163466
    Abstract: A beam shaping apparatus (10) for use in an X-ray analysis device (40). The beam shaping apparatus processes an input N beam (32) from an X-ray beam source (20), and generates an output beam (34) with an output beam shape for irradiating a sample (112) held by a sample holder (22) of the X-ray analysis device. Movement of the output beam shape is controlled in dependence upon a varying tilt angle (?) of the sample (112), this defined by a tilt position of the sample holder (22).
    Type: Application
    Filed: April 3, 2020
    Publication date: May 26, 2022
    Inventors: Milen GATESHKI, Alexander KHARCHENKO, Detlef BECKERS, Nicholas NORBERG
  • Patent number: 10753890
    Abstract: An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.
    Type: Grant
    Filed: March 6, 2018
    Date of Patent: August 25, 2020
    Assignee: MALVERN PANALYTICAL B.V.
    Inventors: Detlef Beckers, Alexander Kharchenko, Milen Gateshki, Eugene Reuvekamp
  • Publication number: 20180259464
    Abstract: An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.
    Type: Application
    Filed: March 6, 2018
    Publication date: September 13, 2018
    Inventors: Detlef Beckers, Alexander Kharchenko, Milen Gateshki, Eugene Reuvekamp
  • Patent number: 9784699
    Abstract: Quantitative X-ray analysis is carried out by making X-ray fluorescence measurements to determine the elemental composition of a sample and a correction measurement by measuring the transmitted intensity of X-rays at an energy E transmitted directly through the sample without deviation. An X-ray diffraction measurement is made in transmission by directing X-rays from an X-ray source at the energy E onto a sample at an incident angle ?1 to the surface of the sample and measuring a measured intensity Id(?fl) of the diffracted X-rays at the energy E with an X-ray detector at an exit angle ?2 corresponding to an X-ray diffraction peak of a predetermined component. A matrix corrected X-ray intensity is obtained using the measured X-ray intensity in the X-ray diffraction measurement, the correction measurement and the mass attenuation coefficient of the sample calculated from the elemental composition and the mass attenuation coefficients of the elements.
    Type: Grant
    Filed: March 3, 2015
    Date of Patent: October 10, 2017
    Assignee: PANALYTICAL B.V.
    Inventors: Charalampos Zarkadas, Milen Gateshki, Alexander Kharchenko, Waltherus Van Den Hoogenhof, Petronella Emerentiana Hegeman, Dick Kuiper
  • Publication number: 20160258890
    Abstract: Quantitative X-ray analysis is carried out by making X-ray fluorescence measurements to determine the elemental composition of a sample and a correction measurement by measuring the transmitted intensity of X-rays at an energy E transmitted directly through the sample without deviation. An X-ray diffraction measurement is made in transmission by directing X-rays from an X-ray source at the energy E onto a sample at an incident angle ?1 to the surface of the sample and measuring a measured intensity Id(?fl) of the diffracted X-rays at the energy E with an X-ray detector at an exit angle ?2 corresponding to an X-ray diffraction peak of a predetermined component. A matrix corrected X-ray intensity is obtained using the measured X-ray intensity in the X-ray diffraction measurement, the correction measurement and the mass attenuation coefficient of the sample calculated from the elemental composition and the mass attenuation coefficients of the elements.
    Type: Application
    Filed: March 3, 2015
    Publication date: September 8, 2016
    Inventors: Charalampos Zarkadas, Milen Gateshki, Alexander Kharchenko, Waltherus Van Den Hoogenhof, Petronella Emerentiana Hegeman, Dick Kuiper
  • Patent number: 7978820
    Abstract: An instrument capable of both X-ray diffraction, XRD, and X-ray fluorescence measurements, XRF, arranges an X-ray source 10 creating an incident X-ray beam directed to a sample on a sample stage. An X-ray detection system is mounted at a fixed angle 2? for high energy energy dispersive XRD For XRF, an X-ray detection system is used.
    Type: Grant
    Filed: October 22, 2009
    Date of Patent: July 12, 2011
    Assignee: Panalytical B.V.
    Inventors: Alexander Kharchenko, Roger Meier, Walter van den Hoogenhof
  • Publication number: 20110096898
    Abstract: An instrument capable of both X-ray diffraction, XRD, and X-ray fluorescence measurements, XRF, arranges an X-ray source 10 creating an incident X-ray beam directed to a sample on a sample stage.
    Type: Application
    Filed: October 22, 2009
    Publication date: April 28, 2011
    Inventors: Alexander Kharchenko, Roger Meier, Walter van den Hoogenhof
  • Patent number: 7116754
    Abstract: A monochromator 4 is used to direct X-rays from X-ray source 2 onto a sample 14 as a convergent beam. The sample 14 is in a growth chamber. The sample is rotated, and diffraction measurements are made in parallel with multichannel detector 22. A specific reflection is used so that the intensity against angle graph measured in the multichannel detector gives information about the vertical lattice parameter. To compensate for wobble inevitably introduced by the rotation of the sample, short time measurements are made and summed.
    Type: Grant
    Filed: February 24, 2005
    Date of Patent: October 3, 2006
    Assignee: PANalytical B.V.
    Inventors: Klaus Lischka, Alexander Kharchenko
  • Publication number: 20050195941
    Abstract: A monochromator 4 is used to direct X-rays from X-ray source 2 onto a sample 14 as a convergent beam. The sample 14 is in a growth chamber. The sample is rotated, and diffraction measurements are made in parallel with multichannel detector 22. A specific reflection is used so that the intensity against angle graph measured in the multichannel detector gives information about the vertical lattice parameter. To compensate for wobble inevitably introduced by the rotation of the sample, short time measurements are made and summed.
    Type: Application
    Filed: February 24, 2005
    Publication date: September 8, 2005
    Inventors: Klaus Lischka, Alexander Kharchenko