Patents by Inventor Alexander Kratsch

Alexander Kratsch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210237199
    Abstract: A method for adaptively splitting a coherent primary light beam, comprising producing a desired far-field distribution by phase modulating the primary light beam with a Spatial Light Modulator (SLM), the primary coherent light beam being directed to reflect on a display element of the spatial light modulator, thereby avoiding any moving elements to shape the primary coherent light beam, extracting from the primary light beam, after it has passed the spatial light modulator, a monitoring beam and a main beam, measuring the monitoring beam with a camera, directing the desired far-field distribution in the monitoring beam on a sensor surface of the camera.
    Type: Application
    Filed: September 6, 2019
    Publication date: August 5, 2021
    Inventors: Charles Boegli, Alexander Kratsch, Felix Lustenberger, Steffen Weissmantel
  • Patent number: 10780525
    Abstract: The present application relates to a device for the mask projection of femtosecond or picosecond laser beams (2) onto a substrate surface, in which the laser beam (2) consisting of laser beam pulses is, at a location of the optical axis, formed to make laser beam pulses with an expanded laser beam cross section or laser beam pulses with a reduced laser beam cross section and said laser beam (2) has a homogeneous intensity distribution over the laser beam cross section. A stop (6) with a predetermined stop aperture geometry and a mask (7) with a predetermined mask aperture geometry are positioned in succession in the beam (2) path at the location.
    Type: Grant
    Filed: May 12, 2015
    Date of Patent: September 22, 2020
    Assignee: Boegli-Gravures SA
    Inventors: Günter Reisse, Steffen Weissmantel, Andy Engel, Manuel Pfeiffer, Alexander Kratsch, Charles Boegli, Matthias Kahl
  • Publication number: 20170066079
    Abstract: The present application relates to a device for the mask projection of femtosecond or picosecond laser beams (2) onto a substrate surface, in which the laser beam (2) consisting of laser beam pulses is, at a location of the optical axis, formed to make laser beam pulses with an expanded laser beam cross section or laser beam pulses with a reduced laser beam cross section and said laser beam (2) has a homogeneous intensity distribution over the laser beam cross section. A stop (6) with a predetermined stop aperture geometry and a mask (7) with a predetermined mask aperture geometry are positioned in succession in the beam (2) path at the location.
    Type: Application
    Filed: May 12, 2015
    Publication date: March 9, 2017
    Inventors: Günther Reisse, Steffen Weissmantel, Andy Engel, Manuel Pfeiffer, Alexander Kratsch, Charles Boegli, Matthias Kahl