Patents by Inventor Alexander Kremer
Alexander Kremer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220350923Abstract: A computer network includes user endpoint devices geographically distributed relative to one another such that at least one of the endpoint devices is subject to a different set of data protection or privacy restrictions than other endpoint devices and data processing facilities coupled to the user endpoint devices over a network. The data processing facilities are in different geographical regions or sovereignties. A computer-based endpoint agent is in each of the endpoint devices. Each endpoint agent is configured to collect telemetry data relating to user activity at its associated endpoint device and transmit the collected telemetry data to a selected one of the data processing facilities, according to an applicable realm definition, in compliance with the data protection or privacy restrictions that apply to the agent's endpoint device.Type: ApplicationFiled: September 21, 2020Publication date: November 3, 2022Inventors: Alexander Kremer, Khurram Ghofoor, Marc Steven Burt
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Publication number: 20220342986Abstract: A computer-based method includes monitoring user activities at an endpoint device on a computer network, determining if one of the user activities at the endpoint device presents a potential threat to network security, creating an alert of the potential threat, and providing, with the alert, a redacted version of a screenshot from the endpoint device. One or more open windows that appeared on the screen of the endpoint device are obscured or removed in the redacted version of the screenshot of the endpoint device.Type: ApplicationFiled: September 22, 2020Publication date: October 27, 2022Inventors: Yigal Meshlum, Tamir Pivnik, David Cohen, Alexander Kremer, Mayank Choudhary, Tal Tikotzki, Mike McKee, Nir Barak, Tal Yaffee
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Publication number: 20220343010Abstract: A system controls access to data for customer of a multi-tenant software as a service (SaaS) system. A multi-tenant SaaS system cloud includes a metadata store. A customer-controlled storage realm includes a customer-controlled key management system (KMS) and a data store for storing encrypted customer data objects. An agent at a user endpoint identifies customer data for storage in the customer data store, transmits metadata and telemetry information related to the customer data to a SaaS application interface (API), and provides a storage reference for a SaaS metadata store. The agent is pre-configured with credentials from the KMS for storing customer data objects in the data store. The customer-controlled storage realm is not in direct communication with the SaaS system cloud.Type: ApplicationFiled: September 21, 2020Publication date: October 27, 2022Inventors: Khurram Ghafoor, Alexander Kremer
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Publication number: 20220334869Abstract: A distributed system provides access by a principal to a resource associated with sensitive data. Micro-services in communication with an authorization engine each include a resource provider that receives a resource action request from the principal to access the resource, determines a context for the request, and transmits the context to the authorization engine in an authorization request. The authorization engine receives the authorization request, resolves the authorization request context against a plurality of pre-defined resource conditions, and responds to the resource provider with an authorization response of allow, deny, or allow-with-conditions. The context for the request includes metadata regarding attributes of the principal, and each of the resource conditions includes a logical expression operating upon the attributes.Type: ApplicationFiled: September 22, 2020Publication date: October 20, 2022Inventors: Alexander Kremer, Tamir Pivnik
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Publication number: 20220291594Abstract: The present disclosure provides an ultraviolet radiation control system and a related method for control an ultraviolet radiation in a lithographic apparatus. The ultraviolet radiation control system comprises a housing; a conversion crystal (540), disposed on or in the housing, configured to convert an ultraviolet radiation to a fluorescent radiation; a plurality of photodetectors (550) configured to detect an intensity of a scattered portion of the fluorescent radiation; and at least one diffusive surface (545), disposed on or in the conversion crystal, configured to increase the intensity of the scattered portion of the fluorescent radiation.Type: ApplicationFiled: August 5, 2020Publication date: September 15, 2022Applicant: ASML Netherlands B.V.Inventor: Alexander KREMER
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Publication number: 20210268748Abstract: The invention relates to a method for increasing the dosing precision of microfluidic pumps and valves based on a flexible cover film/diaphragm and a valve trough, in which the surface of the diaphragm facing the valve trough is heated with a laser beam.Type: ApplicationFiled: November 29, 2019Publication date: September 2, 2021Applicant: m2p-labs GmbHInventors: Niklas FRISCHE, Alexander KREMERS, Karlheinz HILDENBRAND, Christoph PETRY
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Patent number: 7843549Abstract: Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus position of the illumination beam, wherein the light attenuating filter has a two-dimensional pattern that compensates for ellipticity variations in the illumination beam. The light attenuating filter may stand alone, or the filter may be combined with a uniformity correction system, such that it corrects both uniformity and ellipticity. In one embodiment, the light attenuating filter is printed with an assembly of microscopic dots according to the two-dimensional pattern.Type: GrantFiled: May 23, 2007Date of Patent: November 30, 2010Assignee: ASML Holding N.V.Inventor: Alexander Kremer
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Publication number: 20080291422Abstract: Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus position of the illumination beam, wherein the light attenuating filter has a two-dimensional pattern that compensates for ellipticity variations in the illumination beam. The light attenuating filter may stand alone, or the filter may be combined with a uniformity correction system, such that it corrects both uniformity and ellipticity. In one embodiment, the light attenuating filter is printed with an assembly of microscopic dots according to the two-dimensional pattern.Type: ApplicationFiled: May 23, 2007Publication date: November 27, 2008Applicant: ASML Holding N.V.Inventor: Alexander Kremer
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Patent number: 7362413Abstract: A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.Type: GrantFiled: December 9, 2004Date of Patent: April 22, 2008Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Alexander Kremer, Marcel Mathijs Theodore Marie Dierichs, Erik Roelof Loopstra
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Patent number: 7333176Abstract: A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.Type: GrantFiled: December 29, 2006Date of Patent: February 19, 2008Assignee: ASML Holding N.V.Inventors: Roberto B. Wiener, Alexander Kremer, Elizabeth Stone, Richard Zimmerman
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Publication number: 20070109518Abstract: A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each “pupil” is mapped to a second grid such that the center of the second grid is coincident with the “pupil” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and “pupil” mappings.Type: ApplicationFiled: December 29, 2006Publication date: May 17, 2007Applicant: ASML Holding N.V.Inventors: Roberto Wiener, Alexander Kremer, Elizabeth Stone, Richard Zimmerman
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Publication number: 20070103665Abstract: A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction element has a first protrusion on a longitudinal edge of the correction element and a second protrusion on the opposite longitudinal edge. The slope of a sloped edge of the first protrusion and the slope of a sloped edge of the second protrusion are tied to the slope of a gradient in the non-uniformity profile of the illumination field. In addition, the angles defined by the flat tip of the correction element and the sloped edge of the first and second protrusions are tied to the angle of a gradient of the illumination field.Type: ApplicationFiled: December 7, 2005Publication date: May 10, 2007Applicant: ASML Holding N.V.Inventors: Richard Zimmerman, Eric Catey, David Hult, Alexander Kremer, Heine Mulder, Hendrikus Greevenbroek, Roberto Wiener
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Patent number: 7173688Abstract: A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.Type: GrantFiled: December 28, 2004Date of Patent: February 6, 2007Assignee: ASML Holding N.V.Inventors: Roberto B. Wiener, Alexander Kremer, Elizabeth Stone, Richard Zimmerman
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Publication number: 20060139608Abstract: A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.Type: ApplicationFiled: December 28, 2004Publication date: June 29, 2006Applicant: ASML Holding N.V.Inventors: Roberto Wiener, Alexander Kremer, Elizabeth Stone, Richard Zimmerman
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Publication number: 20060126036Abstract: A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.Type: ApplicationFiled: December 9, 2004Publication date: June 15, 2006Applicants: ASML NETHERLANDS B.V., ASML HOLDING NVInventors: Alexander Kremer, Marcel Mathijs Marie Dierichs, Erik Loopstra
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Patent number: 7027129Abstract: An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.Type: GrantFiled: September 23, 2004Date of Patent: April 11, 2006Assignee: ASML Holding N.V.Inventors: Alexander Kremer, Stanley W. Drazkiewicz
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Publication number: 20050036125Abstract: An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.Type: ApplicationFiled: September 23, 2004Publication date: February 17, 2005Applicant: ASML Holding N.V.Inventors: Alexander Kremer, Stanley Drazkiewicz
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Patent number: 6801299Abstract: An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.Type: GrantFiled: July 31, 2002Date of Patent: October 5, 2004Assignee: ASML Holding N.V.Inventors: Alexander Kremer, Stanley W. Drazkiewicz
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Publication number: 20040021842Abstract: An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.Type: ApplicationFiled: July 31, 2002Publication date: February 5, 2004Applicant: ASML US, Inc.Inventors: Alexander Kremer, Stanley W. Drazkiewicz
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Patent number: 5579106Abstract: An apparatus for providing an astigmatically-reduced image with a spectroscopic instrument is disclosed which comprises a collimator which collimates electromagnetic radiation; a cylindrical mirror which receives and reflects the collimated electromagnetic radiation; a diffractor having a surface with a plurality of diffraction rulings inscribed thereon for diffracting electromagnetic radiation directed from the collimator; and a focuser which collects, focuses and directs diffracted electromagnetic radiation and directs it towards an exit aperture. In the preferred embodiment, the cylindrical mirror comprises a concave cylindrical mirror positioned such that the cylindrical axis is substantially normal to rulings on the diffractor. In another preferred embodiment, the cylindrical mirror is convex and is positioned such that the cylindrical axis is substantially parallel to rulings on the diffractor.Type: GrantFiled: February 21, 1995Date of Patent: November 26, 1996Assignee: Oriel CorporationInventor: Alexander Kremer