Patents by Inventor Alexander Kremer

Alexander Kremer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220350923
    Abstract: A computer network includes user endpoint devices geographically distributed relative to one another such that at least one of the endpoint devices is subject to a different set of data protection or privacy restrictions than other endpoint devices and data processing facilities coupled to the user endpoint devices over a network. The data processing facilities are in different geographical regions or sovereignties. A computer-based endpoint agent is in each of the endpoint devices. Each endpoint agent is configured to collect telemetry data relating to user activity at its associated endpoint device and transmit the collected telemetry data to a selected one of the data processing facilities, according to an applicable realm definition, in compliance with the data protection or privacy restrictions that apply to the agent's endpoint device.
    Type: Application
    Filed: September 21, 2020
    Publication date: November 3, 2022
    Inventors: Alexander Kremer, Khurram Ghofoor, Marc Steven Burt
  • Publication number: 20220342986
    Abstract: A computer-based method includes monitoring user activities at an endpoint device on a computer network, determining if one of the user activities at the endpoint device presents a potential threat to network security, creating an alert of the potential threat, and providing, with the alert, a redacted version of a screenshot from the endpoint device. One or more open windows that appeared on the screen of the endpoint device are obscured or removed in the redacted version of the screenshot of the endpoint device.
    Type: Application
    Filed: September 22, 2020
    Publication date: October 27, 2022
    Inventors: Yigal Meshlum, Tamir Pivnik, David Cohen, Alexander Kremer, Mayank Choudhary, Tal Tikotzki, Mike McKee, Nir Barak, Tal Yaffee
  • Publication number: 20220343010
    Abstract: A system controls access to data for customer of a multi-tenant software as a service (SaaS) system. A multi-tenant SaaS system cloud includes a metadata store. A customer-controlled storage realm includes a customer-controlled key management system (KMS) and a data store for storing encrypted customer data objects. An agent at a user endpoint identifies customer data for storage in the customer data store, transmits metadata and telemetry information related to the customer data to a SaaS application interface (API), and provides a storage reference for a SaaS metadata store. The agent is pre-configured with credentials from the KMS for storing customer data objects in the data store. The customer-controlled storage realm is not in direct communication with the SaaS system cloud.
    Type: Application
    Filed: September 21, 2020
    Publication date: October 27, 2022
    Inventors: Khurram Ghafoor, Alexander Kremer
  • Publication number: 20220334869
    Abstract: A distributed system provides access by a principal to a resource associated with sensitive data. Micro-services in communication with an authorization engine each include a resource provider that receives a resource action request from the principal to access the resource, determines a context for the request, and transmits the context to the authorization engine in an authorization request. The authorization engine receives the authorization request, resolves the authorization request context against a plurality of pre-defined resource conditions, and responds to the resource provider with an authorization response of allow, deny, or allow-with-conditions. The context for the request includes metadata regarding attributes of the principal, and each of the resource conditions includes a logical expression operating upon the attributes.
    Type: Application
    Filed: September 22, 2020
    Publication date: October 20, 2022
    Inventors: Alexander Kremer, Tamir Pivnik
  • Publication number: 20220291594
    Abstract: The present disclosure provides an ultraviolet radiation control system and a related method for control an ultraviolet radiation in a lithographic apparatus. The ultraviolet radiation control system comprises a housing; a conversion crystal (540), disposed on or in the housing, configured to convert an ultraviolet radiation to a fluorescent radiation; a plurality of photodetectors (550) configured to detect an intensity of a scattered portion of the fluorescent radiation; and at least one diffusive surface (545), disposed on or in the conversion crystal, configured to increase the intensity of the scattered portion of the fluorescent radiation.
    Type: Application
    Filed: August 5, 2020
    Publication date: September 15, 2022
    Applicant: ASML Netherlands B.V.
    Inventor: Alexander KREMER
  • Publication number: 20210268748
    Abstract: The invention relates to a method for increasing the dosing precision of microfluidic pumps and valves based on a flexible cover film/diaphragm and a valve trough, in which the surface of the diaphragm facing the valve trough is heated with a laser beam.
    Type: Application
    Filed: November 29, 2019
    Publication date: September 2, 2021
    Applicant: m2p-labs GmbH
    Inventors: Niklas FRISCHE, Alexander KREMERS, Karlheinz HILDENBRAND, Christoph PETRY
  • Patent number: 7843549
    Abstract: Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus position of the illumination beam, wherein the light attenuating filter has a two-dimensional pattern that compensates for ellipticity variations in the illumination beam. The light attenuating filter may stand alone, or the filter may be combined with a uniformity correction system, such that it corrects both uniformity and ellipticity. In one embodiment, the light attenuating filter is printed with an assembly of microscopic dots according to the two-dimensional pattern.
    Type: Grant
    Filed: May 23, 2007
    Date of Patent: November 30, 2010
    Assignee: ASML Holding N.V.
    Inventor: Alexander Kremer
  • Publication number: 20080291422
    Abstract: Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus position of the illumination beam, wherein the light attenuating filter has a two-dimensional pattern that compensates for ellipticity variations in the illumination beam. The light attenuating filter may stand alone, or the filter may be combined with a uniformity correction system, such that it corrects both uniformity and ellipticity. In one embodiment, the light attenuating filter is printed with an assembly of microscopic dots according to the two-dimensional pattern.
    Type: Application
    Filed: May 23, 2007
    Publication date: November 27, 2008
    Applicant: ASML Holding N.V.
    Inventor: Alexander Kremer
  • Patent number: 7362413
    Abstract: A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.
    Type: Grant
    Filed: December 9, 2004
    Date of Patent: April 22, 2008
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Alexander Kremer, Marcel Mathijs Theodore Marie Dierichs, Erik Roelof Loopstra
  • Patent number: 7333176
    Abstract: A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.
    Type: Grant
    Filed: December 29, 2006
    Date of Patent: February 19, 2008
    Assignee: ASML Holding N.V.
    Inventors: Roberto B. Wiener, Alexander Kremer, Elizabeth Stone, Richard Zimmerman
  • Publication number: 20070109518
    Abstract: A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each “pupil” is mapped to a second grid such that the center of the second grid is coincident with the “pupil” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and “pupil” mappings.
    Type: Application
    Filed: December 29, 2006
    Publication date: May 17, 2007
    Applicant: ASML Holding N.V.
    Inventors: Roberto Wiener, Alexander Kremer, Elizabeth Stone, Richard Zimmerman
  • Publication number: 20070103665
    Abstract: A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction element has a first protrusion on a longitudinal edge of the correction element and a second protrusion on the opposite longitudinal edge. The slope of a sloped edge of the first protrusion and the slope of a sloped edge of the second protrusion are tied to the slope of a gradient in the non-uniformity profile of the illumination field. In addition, the angles defined by the flat tip of the correction element and the sloped edge of the first and second protrusions are tied to the angle of a gradient of the illumination field.
    Type: Application
    Filed: December 7, 2005
    Publication date: May 10, 2007
    Applicant: ASML Holding N.V.
    Inventors: Richard Zimmerman, Eric Catey, David Hult, Alexander Kremer, Heine Mulder, Hendrikus Greevenbroek, Roberto Wiener
  • Patent number: 7173688
    Abstract: A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: February 6, 2007
    Assignee: ASML Holding N.V.
    Inventors: Roberto B. Wiener, Alexander Kremer, Elizabeth Stone, Richard Zimmerman
  • Publication number: 20060139608
    Abstract: A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.
    Type: Application
    Filed: December 28, 2004
    Publication date: June 29, 2006
    Applicant: ASML Holding N.V.
    Inventors: Roberto Wiener, Alexander Kremer, Elizabeth Stone, Richard Zimmerman
  • Publication number: 20060126036
    Abstract: A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.
    Type: Application
    Filed: December 9, 2004
    Publication date: June 15, 2006
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING NV
    Inventors: Alexander Kremer, Marcel Mathijs Marie Dierichs, Erik Loopstra
  • Patent number: 7027129
    Abstract: An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.
    Type: Grant
    Filed: September 23, 2004
    Date of Patent: April 11, 2006
    Assignee: ASML Holding N.V.
    Inventors: Alexander Kremer, Stanley W. Drazkiewicz
  • Publication number: 20050036125
    Abstract: An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.
    Type: Application
    Filed: September 23, 2004
    Publication date: February 17, 2005
    Applicant: ASML Holding N.V.
    Inventors: Alexander Kremer, Stanley Drazkiewicz
  • Patent number: 6801299
    Abstract: An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.
    Type: Grant
    Filed: July 31, 2002
    Date of Patent: October 5, 2004
    Assignee: ASML Holding N.V.
    Inventors: Alexander Kremer, Stanley W. Drazkiewicz
  • Publication number: 20040021842
    Abstract: An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.
    Type: Application
    Filed: July 31, 2002
    Publication date: February 5, 2004
    Applicant: ASML US, Inc.
    Inventors: Alexander Kremer, Stanley W. Drazkiewicz
  • Patent number: 5579106
    Abstract: An apparatus for providing an astigmatically-reduced image with a spectroscopic instrument is disclosed which comprises a collimator which collimates electromagnetic radiation; a cylindrical mirror which receives and reflects the collimated electromagnetic radiation; a diffractor having a surface with a plurality of diffraction rulings inscribed thereon for diffracting electromagnetic radiation directed from the collimator; and a focuser which collects, focuses and directs diffracted electromagnetic radiation and directs it towards an exit aperture. In the preferred embodiment, the cylindrical mirror comprises a concave cylindrical mirror positioned such that the cylindrical axis is substantially normal to rulings on the diffractor. In another preferred embodiment, the cylindrical mirror is convex and is positioned such that the cylindrical axis is substantially parallel to rulings on the diffractor.
    Type: Grant
    Filed: February 21, 1995
    Date of Patent: November 26, 1996
    Assignee: Oriel Corporation
    Inventor: Alexander Kremer