Patents by Inventor Alexander Matthijs Struycken
Alexander Matthijs Struycken has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10712667Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.Type: GrantFiled: November 16, 2017Date of Patent: July 14, 2020Assignee: ASML Netherlands B.V.Inventors: Sumant Sukdew Ramanujan Oemrawsingh, Arno Jan Bleeker, Alexander Matthijs Struycken, Engelbertus Antonius Fransiscus Van Der Pasch, Bert Pieter Van Drieënhuizen
-
Publication number: 20190377267Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.Type: ApplicationFiled: November 16, 2017Publication date: December 12, 2019Applicant: ASML Netherlands B.V.Inventors: Sumant Sukdew Ramanujan OEMRAWSINGH, Arno Jan BLEEKER, Alexander Matthijs STRUYCKEN, Engelbertus Antonius Fransiscus VAN DER PASCH, Bert Pieter VAN DRIEËNHUIZEN
-
Patent number: 10222702Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.Type: GrantFiled: January 21, 2016Date of Patent: March 5, 2019Assignee: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Ramon Mark Hofstra, Erik Petrus Buurman, Johannes Hubertus Josephina Moors, Alexander Matthijs Struycken, Harm-Jan Voorma, Sumant Sukdew Ramanujan Oemrawsingh, Markus Franciscus Antonius Eurlings, Peter Frans Maria Muys
-
Patent number: 9986628Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.Type: GrantFiled: October 10, 2013Date of Patent: May 29, 2018Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Andrey Nikipelov, Edgar Alberto Osorio Oliveros, Alexander Matthijs Struycken, Bert Pieter Van Drieënhuizen, Jan Bernard Plechelmus Van Schoot
-
Patent number: 9983482Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.Type: GrantFiled: February 26, 2014Date of Patent: May 29, 2018Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Erik Roelof Loopstra, Olav Waldemar Vladimir Frijns, Stig Bieling, Antonius Theodorus Wilhelmus Kempen, Ivo Vanderhallen, Nicolaas Ten Kate, Ruud Antonius Catharina Maria Beerens, Richard Henricus Adrianus Van Lieshout, Theodorus Petrus Maria Cadee, Sjoerd Nicolaas Lambertus Donders, Alexander Matthijs Struycken, Marcus Petrus Scheepers
-
Publication number: 20180031979Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.Type: ApplicationFiled: January 21, 2016Publication date: February 1, 2018Applicant: ASML Netherlands B.V.Inventors: Arno Jan BLEEKER, Ramon Mark HOFSTRA, Erik Petrus BUURMAN, Johannes Hubertus Josephina MOORS, Alexander Matthijs STRUYCKEN, Harm-Jan VOORMA, Sumant Sukdew Ramanujan OEMRAWSINGH, Markus Franciscus Antonius EURLINGS, Peter Frans Maria MUYS
-
Patent number: 9335641Abstract: A mount configured to mount an optical element in a module for a lithographic apparatus. The mount includes a plurality of resilient members constructed and arranged to circumferentially support the optical element. Each resilient member includes a plurality of resilient subsections that are configured to engage the optical element around a perimeter thereof. Each resilient subsection is configured to flex independent of another resilient subsection.Type: GrantFiled: July 16, 2009Date of Patent: May 10, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Henricus Gerardus Tegenbosch, Alexander Matthijs Struycken, Jacob Kleijn, Ruud Antonius Catharina Maria Beerens, Ivo Vanderhallen
-
Publication number: 20160041374Abstract: A radiation collector (141) comprising a plurality of reflective surfaces (400-405), wherein each of the plurality of reflective surfaces is coincident with part of one of a plurality of ellipsoids (40-45), wherein the plurality of ellipsoids have in common a first focus (12) and a second focus (16), each of the plurality of reflective surfaces coincident with a different one of the plurality of ellipsoids, wherein the plurality of reflective surfaces are configured to receive radiation originating from the first focus (12) and reflect the radiation to the second focus (16). An apparatus (820) shown in FIG.Type: ApplicationFiled: March 24, 2014Publication date: February 11, 2016Applicant: ASML Netherlands B.V.Inventors: Ivo VANDERHALLEN, Alexander Matthijs STRUYCKEN, Johannes Christiaan Leonardu FRANKEN
-
Publication number: 20160026091Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.Type: ApplicationFiled: February 26, 2014Publication date: January 28, 2016Applicants: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Erik Roelof LOOPSTRA, Olav Waldemar Vladimir FRIJNS, Stig BIELING, Antonius Theodorus Wilhelmus KEMPEN, Ivo VANDERHALLEN, Nicolaas TEN KATE, Ruud Antonius Catharina Maria BEERENS, Richard Henricus Adrianus VAN LIESHOUT, Theodorus Petrus Maria CADEE, Sjoerd Nicolaas Lambertus DONDERS, Alexander Matthijs STRUYCKEN, Marcus Petrus SCHEEPERS
-
Publication number: 20150296602Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.Type: ApplicationFiled: October 10, 2013Publication date: October 15, 2015Applicant: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Andrey Nikipelov, Edgar Alberto Osorio Oliveros, Alexander Matthijs Struycken, Bert Pieter Van Drieënhuizen, Jan Bernard Plechelmus Van Schoot
-
Patent number: 8598550Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: GrantFiled: February 3, 2012Date of Patent: December 3, 2013Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Johannes Bernardus Ridder, Harm-Jan Voorma, Carolus Ida Maria Antonius Spee, Klaas Timmer
-
Publication number: 20120140196Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: ApplicationFiled: February 3, 2012Publication date: June 7, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Harm-Jan Voorma, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Carolus Ida Maria Antonius Spee, Klaas Timmer, Johannes Bernardus Ridder
-
Patent number: 8134136Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: GrantFiled: June 22, 2010Date of Patent: March 13, 2012Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Johannes Bernardus Ridder, Harm-Jan Voorma, Carolus Ida Maria Antonius Spee, Klaas Timmer
-
Publication number: 20110205517Abstract: A mount configured to mount an optical element in a module for a lithographic apparatus. The mount includes a plurality of resilient members constructed and arranged to circumferentially support the optical element. Each resilient member includes a plurality of resilient subsections that are configured to engage the optical element around a perimeter thereof Each resilient subsection is configured to flex independent of another resilient subsection.Type: ApplicationFiled: July 16, 2009Publication date: August 25, 2011Applicant: ASML Netherlands B.V.Inventors: Henricus Gerardus Tegenbosch, Alexander Matthijs Struycken, Jacob Klenijn, Ruud, Antonius Catharina, Maria Beerens, Ivo Vanderhallen
-
Publication number: 20110122389Abstract: A lithographic apparatus includes a source module that include a collector and a radiation source. The collector is configured to collect radiation from the radiation source. An illuminator is configured to condition the radiation, collected by the collector and to provide a radiation beam. A detector is disposed in a fixed positional relationship with respect to the illuminator. The detector is configured to determine a position of the radiation source relative to the collector and a position of the source module relative to the illuminator.Type: ApplicationFiled: July 15, 2009Publication date: May 26, 2011Applicant: ASML Netherlands B.V.Inventors: Michel Fransois Hubert Klaassen, Rogier Herman Mathijs Groeneveld, Alexander Matthijs Struycken, Gerardus Hubertus Petrus Maria Swinkels
-
Patent number: 7897941Abstract: A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.Type: GrantFiled: November 4, 2008Date of Patent: March 1, 2011Assignee: ASML Netherlands B.V.Inventors: Johannes Christiaan Leonardus Franken, Alexander Matthijs Struycken, Leon Joseph Marie Van Den Schoor
-
Publication number: 20100290015Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: ApplicationFiled: June 22, 2010Publication date: November 18, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich BANINE, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Harm-Jan Voorma, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Carolus Ida Maria Antonius Spee, Klaas Timmer, Johannes Bernardus Ridder
-
Patent number: 7767989Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.Type: GrantFiled: September 27, 2006Date of Patent: August 3, 2010Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Harm-Jan Voorma, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Carolus Ida Maria Antonius Spee, Klaas Timmer, Johannes Bernardus Ridder
-
Patent number: 7602472Abstract: A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.Type: GrantFiled: June 12, 2007Date of Patent: October 13, 2009Assignee: ASML Netherlands B.V.Inventors: Edwin Johan Buis, Erik Theodorus Maria Bijlaart, Christiaan Alexander Hoogendam, Alexander Matthijs Struycken, Arnoud Cornelis Wassink, Paul Peter Anna Antonius Brom
-
Publication number: 20090066924Abstract: A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.Type: ApplicationFiled: November 4, 2008Publication date: March 12, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Christiaan Leonardus Franken, Alexander Matthijs Struycken, Leon Joseph Marie Van Den Schoor