Patents by Inventor Alexander Orchowski

Alexander Orchowski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220230843
    Abstract: The system described herein relates to a method for operating a beam apparatus, such as a particle beam apparatus or laser beam apparatus, a computer program product and a beam apparatus for carrying out the method, and to an object holder for an object that, for example, is able to be arranged in a particle beam apparatus. The method includes generating a marking on an object holder using a laser beam of a laser beam device and/or using a particle beam of the particle beam apparatus, where the particle beam includes charged particles, arranging an object on the object holder, moving the object holder, positioning the particle beam and/or the laser beam in relative fashion in relation to the object using the marking, and processing, imaging and/or analyzing the object using the particle beam and/or the laser beam.
    Type: Application
    Filed: August 27, 2021
    Publication date: July 21, 2022
    Applicant: Carl Zeiss Microscopy GmbH
    Inventor: Alexander Orchowski
  • Patent number: 7015487
    Abstract: A projection apparatus for imaging a pattern of a mask onto a substrate by means of a beam of projected charged particles is disclosed. The apparatus includes a radiation sensitive layer. The apparatus also includes a mask. The mask includes a membrane layer made of a first material, scattering regions forming the pattern and made of a second material scattering the charged particles more than the membrane layer, and a plurality of straightly extending supporting struts spaced apart from one another and supporting the membrane layer together with the scattering regions. The apparatus also includes a projection apparatus. The projection apparatus includes a beam shaping device for producing the projection beam with a predetermined projection beam cross-section in the mask plane, and a positioning device for moving the projection beam cross-section in the mask plane along a predetermined path over the mask parallel to the direction into which the struts extend.
    Type: Grant
    Filed: August 21, 2001
    Date of Patent: March 21, 2006
    Assignee: Carl Zeiss SMT AG
    Inventors: Oliver Kienzle, Alexander Orchowski
  • Publication number: 20020071996
    Abstract: A projection apparatus for imaging a pattern of a mask onto a substrate by means of a beam of projected charged particles is disclosed. The apparatus includes a radiation sensitive layer. The apparatus also includes a mask. The mask includes a membrane layer made of a first material, scattering regions forming the pattern and made of a second material scattering the charged particles more than the membrane layer, and a plurality of straightly extending supporting struts spaced apart from one another and supporting the membrane layer together with the scattering regions. The apparatus also includes a projection apparatus. The projection apparatus includes a beam shaping device for producing the projection beam with a predetermined projection beam cross-section in the mask plane, and a positioning device for moving the projection beam cross-section in the mask plane along a predetermined path over the mask parallel to the direction into which the struts extend.
    Type: Application
    Filed: August 21, 2001
    Publication date: June 13, 2002
    Inventors: Oliver Kienzle, Alexander Orchowski