Patents by Inventor Alexander Straaijer

Alexander Straaijer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10788755
    Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: September 29, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar Van Santen
  • Patent number: 10725386
    Abstract: Disclosed is a method of measuring a parameter of a lithographic process, and associated inspection apparatus. The method comprises measuring at least two target structures on a substrate using a plurality of different illumination conditions, the target structures having deliberate overlay biases; to obtain for each target structure an asymmetry measurement representing an overall asymmetry that includes contributions due to (i) the deliberate overlay biases, (ii) an overlay error during forming of the target structure and (iii) any feature asymmetry. A regression analysis is performed on the asymmetry measurement data by fitting a linear regression model to a planar representation of asymmetry measurements for one target structure against asymmetry measurements for another target structure, the linear regression model not necessarily being fitted through an origin of the planar representation. The overlay error can then be determined from a gradient described by the linear regression model.
    Type: Grant
    Filed: May 24, 2019
    Date of Patent: July 28, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Scott Anderson Middlebrooks, Niels Geypen, Hendrik Jan Hidde Smilde, Alexander Straaijer, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij
  • Patent number: 10678139
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Grant
    Filed: January 11, 2019
    Date of Patent: June 9, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Johannes Catherinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Erik Theodorus Maria Bijlaart, Christiaan Alexander Hoogendam, Helmar Van Santen, Marcus Adrianus Van De Kerkhof, Mark Kroon, Arie Jeffrey Den Boef, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens
  • Patent number: 10656538
    Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: May 19, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer
  • Patent number: 10613446
    Abstract: The present invention provides a method for determining overlay. The method comprises obtaining an initial overlay estimate relating to a first set of targets and data about a second set of targets, wherein the data for a target comprises an intensity measurement of the target for each of a group of different wavelengths. The method further comprises using the initial overlay estimate to filter data relating to the second set of targets and using the filtered data to estimate overlay on the substrate.
    Type: Grant
    Filed: September 5, 2018
    Date of Patent: April 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventor: Alexander Straaijer
  • Publication number: 20190278190
    Abstract: Disclosed is a method of measuring a parameter of a lithographic process, and associated inspection apparatus. The method comprises measuring at least two target structures on a substrate using a plurality of different illumination conditions, the target structures having deliberate overlay biases; to obtain for each target structure an asymmetry measurement representing an overall asymmetry that includes contributions due to (i) the deliberate overlay biases, (ii) an overlay error during forming of the target structure and (iii) any feature asymmetry. A regression analysis is performed on the asymmetry measurement data by fitting a linear regression model to a planar representation of asymmetry measurements for one target structure against asymmetry measurements for another target structure, the linear regression model not necessarily being fitted through an origin of the planar representation. The overlay error can then be determined from a gradient described by the linear regression model.
    Type: Application
    Filed: May 24, 2019
    Publication date: September 12, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Scott Anderson MIDDLEBROOKS, Niels GEYPEN, Hendrik Jan Hidde SMILDE, Alexander STRAAIJER, Maurits VAN DER SCHAAR, Markus Gerardus Martinus Maria VAN KRAAIJ
  • Publication number: 20190250518
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: January 11, 2019
    Publication date: August 15, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Hans BUTLER, Sjoerd Nicolaas Lambertus DONDERS, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Hendricus Johannes Maria MEIJER, Johannes Catherinus Hubertus MULKENS, Roelof Aeilko Siebrand RITSEMA, Frank VAN SCHAIK, Timotheus Franciscus SENGERS, Klaus SIMON, Joannes Theodoor DE SMIT, Alexander STRAAIJER, Bob STREEFKERK, Erik Theodorus Maria BIJLAART, Christiaan Alexander HOOGENDAM, Helmar VAN SANTEN, Marcus Adrianus VAN DE KERKHOF, Mark KROON, Arie Jeffrey DEN BOEF, Joost Jeroen OTTENS, Jeroen Johannes Sophia Maria MERTENS
  • Publication number: 20190212661
    Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
    Type: Application
    Filed: December 21, 2018
    Publication date: July 11, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Hans BUTLER, Sjoerd Nicolaas Lambertus DONDERS, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Hendricus Johannes Maria MEIJER, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Roelof Aeilko Siebrand RITSEMA, Frank VAN SCHAIK, Timotheus Franciscus SENGERS, Klaus SIMON, Joannes Theodoor DE SMIT, Alexander STRAAIJER, Helmar VAN SANTEN
  • Patent number: 10331041
    Abstract: Disclosed is a method of measuring a parameter of a lithographic process, and associated inspection apparatus. The method comprises measuring at least two target structures on a substrate using a plurality of different illumination conditions, the target structures having deliberate overlay biases; to obtain for each target structure an asymmetry measurement representing an overall asymmetry that includes contributions due to (i) the deliberate overlay biases, (ii) an overlay error during forming of the target structure and (iii) any feature asymmetry. A regression analysis is performed on the asymmetry measurement data by fitting a linear regression model to a planar representation of asymmetry measurements for one target structure against asymmetry measurements for another target structure, the linear regression model not necessarily being fitted through an origin of the planar representation. The overlay error can then be determined from a gradient described by the linear regression model.
    Type: Grant
    Filed: October 15, 2018
    Date of Patent: June 25, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Scott Anderson Middlebrooks, Niels Geypen, Hendrik Jan Hidde Smilde, Alexander Straaijer, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij
  • Patent number: 10261427
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Grant
    Filed: January 12, 2018
    Date of Patent: April 16, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Si-Han Zeng, Yue-Lin Peng, Jen-Yu Fang, Arie Jeffrey Den Boef, Alexander Straaijer, Ching-Yi Hung, Patrick Warnaar
  • Patent number: 10261428
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: April 16, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Publication number: 20190086821
    Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
    Type: Application
    Filed: November 19, 2018
    Publication date: March 21, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Antonius Theodoras Anna Maria DERKSEN, Joeri LOF, Klaus SIMON, Alexander STRAAIJER
  • Publication number: 20190079414
    Abstract: The present invention provides a method for determining overlay. The method comprises obtaining an initial overlay estimate relating to a first set of targets and data about a second set of targets, wherein the data for a target comprises an intensity measurement of the target for each of a group of different wavelengths.
    Type: Application
    Filed: September 5, 2018
    Publication date: March 14, 2019
    Applicant: ASML Netherlands B.V.
    Inventor: Alexander STRAAIJER
  • Patent number: 10222706
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Grant
    Filed: June 18, 2015
    Date of Patent: March 5, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Publication number: 20190049860
    Abstract: Disclosed is a method of measuring a parameter of a lithographic process, and associated inspection apparatus. The method comprises measuring at least two target structures on a substrate using a plurality of different illumination conditions, the target structures having deliberate overlay biases; to obtain for each target structure an asymmetry measurement representing an overall asymmetry that includes contributions due to (i) the deliberate overlay biases, (ii) an overlay error during forming of the target structure and (iii) any feature asymmetry. A regression analysis is performed on the asymmetry measurement data by fitting a linear regression model to a planar representation of asymmetry measurements for one target structure against asymmetry measurements for another target structure, the linear regression model not necessarily being fitted through an origin of the planar representation. The overlay error can then be determined from a gradient described by the linear regression model.
    Type: Application
    Filed: October 15, 2018
    Publication date: February 14, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Scott Anderson MIDDLEBROOKS, Niels GEYPEN, Hendrik Jan Hidde SMILDE, Alexander STRAAIJER, Maurits VAN DER SCHAAR, Markus Gerardus Martinus Maria VAN KRAAIJ
  • Patent number: 10191389
    Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: January 29, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar Van Santen
  • Patent number: 10180629
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: January 15, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Johannes Catherinus Hubertus Mulkens, Roelof Aeilko Siebranc Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Erik Theodorus Maria Bijlaart, Christian Alexander Hoogendam, Helmar Van Santen, Marcus Adrianus Van De Kerkhof, Mark Kroon, Arie Jeffrey Den Boef, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens
  • Patent number: 10151989
    Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: December 11, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer
  • Patent number: 10126662
    Abstract: Disclosed is a method of measuring a parameter of a lithographic process, and associated inspection apparatus. The method comprises measuring at least two target structures on a substrate using a plurality of different illumination conditions, the target structures having deliberate overlay biases; to obtain for each target structure an asymmetry measurement representing an overall asymmetry that includes contributions due to (i) the deliberate overlay biases, (ii) an overlay error during forming of the target structure and (iii) any feature asymmetry. A regression analysis is performed on the asymmetry measurement data by fitting a linear regression model to a planar representation of asymmetry measurements for one target structure against asymmetry measurements for another target structure, the linear regression model not necessarily being fitted through an origin of the planar representation. The overlay error can then be determined from a gradient described by the linear regression model.
    Type: Grant
    Filed: March 5, 2018
    Date of Patent: November 13, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Scott Anderson Middlebrooks, Niels Geypen, Hendrik Jan Hidde Smilde, Alexander Straaijer, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij
  • Publication number: 20180196357
    Abstract: Disclosed is a method of measuring a parameter of a lithographic process, and associated inspection apparatus. The method comprises measuring at least two target structures on a substrate using a plurality of different illumination conditions, the target structures having deliberate overlay biases; to obtain for each target structure an asymmetry measurement representing an overall asymmetry that includes contributions due to (i) the deliberate overlay biases, (ii) an overlay error during forming of the target structure and (iii) any feature asymmetry. A regression analysis is performed on the asymmetry measurement data by fitting a linear regression model to a planar representation of asymmetry measurements for one target structure against asymmetry measurements for another target structure, the linear regression model not necessarily being fitted through an origin of the planar representation. The overlay error can then be determined from a gradient described by the linear regression model.
    Type: Application
    Filed: March 5, 2018
    Publication date: July 12, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Scott Anderson Middlebrooks, Niels Geypen, Hendrik Jan Hidde Smilde, Alexander Straaijer, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij