Patents by Inventor Alexander Svizher

Alexander Svizher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Metrology Systems and Methods
    Publication number: 20150036142
    Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
    Type: Application
    Filed: October 16, 2014
    Publication date: February 5, 2015
    Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
  • Discrete polarization scatterometry
    Patent number: 8896832
    Abstract: Systems and methods for discrete polarization scatterometry are provided.
    Type: Grant
    Filed: May 16, 2011
    Date of Patent: November 25, 2014
    Assignee: KLA-Tencor Corp.
    Inventors: Andrew V. Hill, Amnon Manassen, Daniel Kandel, Vladimir Levinski, Joel Seligson, Alexander Svizher, David Y. Wang, Lawrence D. Rotter, Johannes D. de Veer
  • Metrology systems and methods
    Patent number: 8873054
    Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
    Type: Grant
    Filed: April 17, 2013
    Date of Patent: October 28, 2014
    Assignee: KLA-Tencor Corp.
    Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
  • PHASE CHARACTERIZATION OF TARGETS
    Publication number: 20140111791
    Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.
    Type: Application
    Filed: October 18, 2013
    Publication date: April 24, 2014
    Inventors: Amnon Manassen, Ohad Bachar, Daria Negri, Boris Golovanevsky, Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher, Meir Aloni, Guy Ben Dov, Hadar Shalmoni, Vladimir Levinski
  • Metrology Systems and Methods
    Publication number: 20130229661
    Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
    Type: Application
    Filed: April 17, 2013
    Publication date: September 5, 2013
    Applicant: KLA-Tencor Corporation
    Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
  • Metrology systems and methods
    Patent number: 8441639
    Abstract: Various metrology systems and methods are provided.
    Type: Grant
    Filed: August 31, 2010
    Date of Patent: May 14, 2013
    Assignee: KLA-Tencor Corp.
    Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
  • Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods
    Patent number: 8390808
    Abstract: A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.
    Type: Grant
    Filed: July 13, 2012
    Date of Patent: March 5, 2013
    Assignee: KLA-Tencor Corporation
    Inventors: Vladimir Levinski, Michael E. Adel, Mark Ghinovker, Alexander Svizher
  • Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods
    Patent number: 8243273
    Abstract: A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.
    Type: Grant
    Filed: June 4, 2009
    Date of Patent: August 14, 2012
    Assignee: KLA-Tencor Corporation
    Inventors: Vladimir Levinski, Michael Adel, Mark Ghinovker, Alexander Svizher
  • OPTICS SYMMETRIZATION FOR METROLOGY
    Publication number: 20120033226
    Abstract: The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.
    Type: Application
    Filed: July 22, 2011
    Publication date: February 9, 2012
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Amnon Manassen, Daniel Kandel, Moshe Baruch, Joel L. Seligson, Alexander Svizher, Guy Cohen, Efraim Rotem, Ohad Bachar, Daria Negri, Noam Sapiens
  • DISCRETE POLARIZATION SCATTEROMETRY
    Publication number: 20110310388
    Abstract: Systems and methods for discrete polarization scatterometry are provided.
    Type: Application
    Filed: May 16, 2011
    Publication date: December 22, 2011
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Andrew V. Hill, Amnon Manassen, Daniel Kandel, Vladimir Levinski, Joel Seligson, Alexander Svizher, David Y. Wang, Lawrence D. Rotter, Johannes D. de Veer
  • METROLOGY SYSTEMS AND METHODS
    Publication number: 20110069312
    Abstract: Various metrology systems and methods are provided.
    Type: Application
    Filed: August 31, 2010
    Publication date: March 24, 2011
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Daniel Kandel, Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew Hill, Ohad Bachar, Amnon Manassen, Yung-Ho Alex Chuang, Ilan Sela, Moshe Markowitz, Daria Negri, Efraim Rotem
  • Enhanced Ovl dummy field enabling "on-the-fly" ovl measurement methods
    Publication number: 20090303482
    Abstract: A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field.
    Type: Application
    Filed: June 4, 2009
    Publication date: December 10, 2009
    Inventors: Vladimir Levinski, Michael E. Adel, Mark Ghinovker, Alexander Svizher