Patents by Inventor Alexander Tregub

Alexander Tregub has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060008528
    Abstract: A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.
    Type: Application
    Filed: September 13, 2005
    Publication date: January 12, 2006
    Inventors: Alexander Tregub, Tim Chen, Susan Holl
  • Publication number: 20050287032
    Abstract: A method including providing a residual bacteria-inhibiting property to a post-chemical mechanical polish (post-CMP) brush. A method including forming a post-chemical mechanical polish (post-CMP) brush; and residually modifying a bacteria-inhibiting property of a portion of an exterior surface of the formed brush. An apparatus including a post-chemical mechanical polish (post-CMP) brush including a residual bacteria inhibiting property.
    Type: Application
    Filed: June 24, 2004
    Publication date: December 29, 2005
    Inventors: Alexander Tregub, Mansour Moinpour
  • Publication number: 20050202252
    Abstract: Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.
    Type: Application
    Filed: March 12, 2004
    Publication date: September 15, 2005
    Inventors: Alexander Tregub, Florence Eschbach, Fu-Chang Lo
  • Publication number: 20050203254
    Abstract: Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.
    Type: Application
    Filed: March 12, 2004
    Publication date: September 15, 2005
    Inventors: Alexander Tregub, Florence Eschbach, Fu-Chang Lo, Susan Holl
  • Publication number: 20050045262
    Abstract: A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.
    Type: Application
    Filed: August 26, 2003
    Publication date: March 3, 2005
    Inventors: Florence Eschbach, Paul Zimmerman, Alexander Tregub, Fu-Chang Lo
  • Publication number: 20050048376
    Abstract: A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.
    Type: Application
    Filed: August 26, 2003
    Publication date: March 3, 2005
    Inventors: Florence Eschbach, Paul Zimmerman, Alexander Tregub, Fu-Chang Lo
  • Publication number: 20050029126
    Abstract: A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.
    Type: Application
    Filed: March 31, 2003
    Publication date: February 10, 2005
    Inventors: Alexander Tregub, Tim Chen, Susan Holl
  • Publication number: 20040040575
    Abstract: A brush assembly includes a first brush having a central portion and end portions. The central portion is recessed from the end portions. A second brush is provided having an outer surface and opposed to the first brush. The first brush and the second brush are adapted to receive a planar object therebetween. The outer surface and the end portions are in contact with the planar object and the central portion avoids contact with the planar object.
    Type: Application
    Filed: August 28, 2002
    Publication date: March 4, 2004
    Inventors: Alexander Tregub, Jamie Ludke, Mark P. McGhee, Mansour Moinpour, Joseph W. Parks, Jade Sun, Jonathan W. Thibado
  • Publication number: 20030207661
    Abstract: A manufactured chemical mechanical polishing pad is annealed after manufacture to improve its operating characteristics. Annealing can stabilize the operational properties of the pad, such as coefficient of thermal expansion and compressibility. In one embodiment, annealing partially or fully completes a curing process that was incomplete after the pad was manufactured.
    Type: Application
    Filed: May 1, 2002
    Publication date: November 6, 2003
    Inventors: Alexander Tregub, Jamshid Sorooshian, Mansour Moinpour