Abstract: An optical apparatus for a lithography system comprises at least one optical element comprising an optical surface. The optical apparatus also comprises one or more actuators for deforming the optical surface. A strain gauge device is provided for determining the deformation of the optical surface. The strain gauge device comprises at least one optical fiber that maintains polarization.

Abstract: An adaptive optical element for microlithography comprises at least one manipulator for changing the shape of an optical surface of the optical element. The manipulator comprises a one-piece dielectric medium which is deformable by applying an electric field, electrodes that are arranged in interconnection with the one-piece dielectric medium, and a voltage generator which is wired to the electrodes and configured to apply to the electrodes, firstly, a control voltage that serves to change a longitudinal extent of the dielectric medium and, secondly, an AC voltage that serves to heat the dielectric medium.

Abstract: A method for measuring an actuator in a projection exposure apparatus for semiconductor lithography, comprises: driving and deflecting a first actuator with a constant control signal; deflecting a further actuator by way of the mechanical coupling; and determining the capacitance of the further actuator, which was deflected by way of the coupling. A projection exposure apparatus for semiconductor lithography comprises a control device and a measuring device, wherein the measuring device is configured to determine the capacitance of at least one actuator in the projection exposure apparatus.

Abstract: A method for marking at least one portion of a surface of an object, said surface being made of a material that is paper, cardboard or fabric, the method comprising the following steps: heating the surface of the material by means of a heat source to a temperature lower than a temperature at which the visual appearance of the material changes; marking the heated surface by means of a marking laser, so that the light beam of the laser raises the temperature on the surface of the material enough to change the visual appearance of said surface; in which the marking laser is a laser with a light beam that belongs to the visible or ultraviolet spectrum.

Abstract: A measuring assembly for the frequency-based determination of the position of a component, in particular in an optical system for microlithography, includes at least one optical resonator, which has a stationary first resonator mirror, a movable measurement target assigned to the component, and a stationary second resonator mirror. The second resonator mirror is formed by an inverting mirror (130, 330, 430, 530), which reflects back on itself a measurement beam coming from the measurement target.

Abstract: A measuring assembly for the frequency-based determination of the position of a component, in particular in an optical system for microlithography, includes at least one optical resonator, which has a stationary first resonator mirror, a movable measurement target assigned to the component, and a stationary second resonator mirror. The second resonator mirror is formed by an inverting mirror (130, 330, 430, 530), which reflects back on itself a measurement beam coming from the measurement target.

Abstract: The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.

Abstract: The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.

Abstract: The invention relates to an arrangement for actuating an element in an optical system, in particular an optical system of a projection exposure apparatus, wherein the optical element is tiltable about at least one tilting axis via at least one joint having a joint stiffness, comprising at least one actuator for exerting a force on the optical element, wherein the actuator has an actuator stiffness which at least partly compensates for the joint stiffness.

Abstract: Method of controlling a laser marking matrix system, the matrix system comprising an N×M matrix of lasers to produce the laser marking, the method comprising the sequential transformation of at least two images to be marked into a series of marking commands according to an N×M matrix of dots, which comprises the following phases: division of a first image into a fixed portion and a variable portion, transformation of the fixed portion into a fixed matrix and the variable portion into a variable matrix, combination of said fixed and variable matrices, laser marking of the first image, processing of a second image, obtaining a new variable matrix which is added to the previous fixed matrix, producing a complete new matrix, laser marking of the second image.

Abstract: Method of producing equipment for marking products by laser, comprising the steps of: having at least one base plate; having various types of modules in which equipment components are grouped; having casings, rear covers and front covers that can be attached to said base plate; selecting modules from each of the different module types; removably attaching the selected modules to the base plate; attaching the casing, rear cover and front cover to the base plate.

Abstract: Cutting module for packaging machine for sachet-type packages made from flexible film, comprising a shaping module that cuts out the package leaving a free zone for subsequent filling and sealing of the sachet, comprising a laser cutting module for making the aforementioned cut, said laser cutting module comprising a laser generator and an optical module that comprises a submodule for modifying the focal length of the laser, comprising in turn a fixed lens and a movable lens and, in series with said submodule, a head for modifying the exit angle of the laser.

Abstract: A lithography device includes an eddy-current brake for damping the movement of a structural element of the lithography device. The eddy-current brake includes a plurality of magnets disposed in an arc-shaped arrangement, and a plurality of electrically conductive sheets arranged respectively between adjacent ones of the magnets. A relative movement between the magnets and the electrically conductive sheets in a direction to be damped inducing eddy currents in the electrically conductive sheets.

Abstract: Method of controlling a laser marking matrix system, the matrix system comprising an N×M matrix of lasers to produce the laser marking, the method comprising the sequential transformation of at least two images to be marked into a series of marking commands according to an N×M matrix of dots, which comprises the following phases: division of a first image into a fixed portion and a variable portion, transformation of the fixed portion into a fixed matrix and the variable portion into a variable matrix, combination of said fixed and variable matrices, laser marking of the first image, processing of a second image, obtaining a new variable matrix which is added to the previous fixed matrix, producing a complete new matrix, laser marking of the second image.

Abstract: The invention relates to an arrangement for actuating an element in an optical system, in particular an optical system of a projection exposure apparatus, wherein the optical element is tiltable about at least one tilting axis via at least one joint having a joint stiffness, comprising at least one actuator for exerting a force on the optical element, wherein the actuator has an actuator stiffness which at least partly compensates for the joint stiffness.

Abstract: The invention relates to an arrangement for actuating an element in an optical system, in particular an optical system of a projection exposure apparatus, wherein the optical element is tiltable about at least one tilting axis via at least one joint having a joint stiffness, comprising at least one actuator for exerting a force on the optical element, wherein the actuator has an actuator stiffness which at least partly compensates for the joint stiffness.

Abstract: On-demand laser marking device manufacturing method and laser marking device obtained by said method Method of producing equipment for marking products by laser, comprising the steps of: having at least one base plate; having various types of modules in which equipment components are grouped; having casings, rear covers and front covers that can be attached to said base plate; selecting modules from each of the different module types; removably attaching the selected modules to the base plate; attaching the casing, rear cover and front cover to the base plate.

Abstract: A damping device of an optical element of a projection exposure machine includes at least two mass dampers arranged spaced apart from one another, the vibration absorbers each having at least one damper mass and at least one damping element and the damper masses of the at least two mass dampers being interconnected by at least one connecting element. The optical element can be part of a projection exposure machine.

Abstract: Device for the laser marking of products, of the type that comprises an outer casing defining at least one internal volume, the said internal volume comprising: at least one laser beam generating source, at least one optical system for the output from the laser, and electronic and control means of the device, the said casing additionally comprising at least one air outlet of the device, and at least one fan for generating a flow of cooling air from the generating source and the electronic and control means of the device through interior of the casing between the said air inlet and the said air outlet, wherein the said air inlet is more distant from the said laser output than the air output.

Abstract: The invention relates to an arrangement for actuating an element in an optical system, in particular an optical system of a projection exposure apparatus, wherein the optical element is tiltable about at least one tilting axis via at least one joint having a joint stiffness, comprising at least one actuator for exerting a force on the optical element, wherein the actuator has an actuator stiffness which at least partly compensates for the joint stiffness.