Patents by Inventor Alexander Volfman

Alexander Volfman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SYSTEM AND METHOD FOR ISOLATION OF SPECIFIC FOURIER PUPIL FREQUENCY IN OVERLAY METROLOGY
    Publication number: 20230314344
    Abstract: A system includes an illumination source configured to generate an illumination beam, and a collection sub-system that includes an objective lens, one or more detectors located at a collection pupil plane, a light modulator, and a controller. The light modulator is configured to direct one or more selected portions of measurement light to the one or more detectors. The controller includes one or more processors configured to execute program instructions causing the one or more processors to execute a metrology recipe by: receiving detection signals from the one or more detectors, wherein the detection signals are associated with the one or more selected portions of the measurement light directed to the one or more detectors; and generating an overlay measurement associated with at least two layers of a sample based on the detection signals.
    Type: Application
    Filed: March 30, 2022
    Publication date: October 5, 2023
    Inventors: Yuri Paskover, Itay Gdor, Yuval Lubashevsky, Vladimir Levinski, Alexander Volfman, Yoram Uziel, Yevgeniy Men
  • ANNULAR APODIZER FOR SMALL TARGET OVERLAY MEASUREMENT
    Publication number: 20230236113
    Abstract: Metrology is performed on a semiconductor wafer using a system with an apodizer. A spot is formed on the semiconductor wafer with a diameter from 2 nm to 5 nm. The associated beam of light has a wavelength from 400 nm to 800 nm. Small target measurement can be performed at a range of optical wavelengths.
    Type: Application
    Filed: January 25, 2022
    Publication date: July 27, 2023
    Inventors: Itay GDOR, Yuval LUBASHEVSKY, Alon Alexander VOLFMAN, Daria NEGRI, Yevgeniy MEN, Elad FARCHI
  • On-the-fly scatterometry overlay metrology target
    Patent number: 11378394
    Abstract: A metrology target is disclosed, in accordance with one or more embodiments of the present disclosure. The metrology target includes a first set of pattern elements having a first pitch, where the first set of pattern elements includes segmented pattern elements. The metrology target includes a second set of pattern elements having a second pitch, where the second set of pattern elements includes segmented pattern elements. The metrology target includes a third set of pattern elements having a third pitch, where the third set of pattern elements includes segmented pattern elements.
    Type: Grant
    Filed: December 11, 2020
    Date of Patent: July 5, 2022
    Assignee: KLA Corporation
    Inventors: Yuri Paskover, Itay Gdor, Yuval Lubashevksy, Vladimir Levinski, Alexander Volfman, Yoram Uziel
  • ON-THE-FLY SCATTEROMETRY OVERLAY METROLOGY TARGET
    Publication number: 20220187062
    Abstract: A metrology target is disclosed, in accordance with one or more embodiments of the present disclosure. The metrology target includes a first set of pattern elements having a first pitch, where the first set of pattern elements includes segmented pattern elements. The metrology target includes a second set of pattern elements having a second pitch, where the second set of pattern elements includes segmented pattern elements. The metrology target includes a third set of pattern elements having a third pitch, where the third set of pattern elements includes segmented pattern elements.
    Type: Application
    Filed: December 11, 2020
    Publication date: June 16, 2022
    Applicant: KLA Corporation
    Inventors: Yuri Paskover, Itay Gdor, Yuval Lubashevksy, Vladimir Levinski, Alexander Volfman, Yoram Uziel