Patents by Inventor Alexander Zak Bradley

Alexander Zak Bradley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Volatile copper(1) complexes and processes for deposition of copper films by atomic layer deposition
    Patent number: 7759508
    Abstract: Provided are novel 1,3-diimine copper complexes, and processes for using 1,3-diimine copper complexes in the deposition of copper on substrates, or in or on porous solids, by atomic layer deposition.
    Type: Grant
    Filed: September 20, 2007
    Date of Patent: July 20, 2010
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Alexander Zak Bradley, Jeffery Scott Thompson, Kyung-Ho Park
  • CONCENTRATOR SOLAR CELL MODULES WITH LIGHT CONCENTRATING ARTICLES COMPRISING IONOMERIC MATERIALS
    Publication number: 20100154863
    Abstract: A concentrator solar cell module comprises at least one solar cell and at least one light concentrating article. The at least one light concentrating article is capable of concentrating about 1.02 to about 2000 sun equivalents of solar energy onto the solar cell(s) and comprises an ionomer composition. The ionomer composition comprises or is produced from an ionomer that has a temperature of onset of creep that is significantly greater than its peak melting temperature.
    Type: Application
    Filed: November 25, 2009
    Publication date: June 24, 2010
    Applicant: E.I. DU PONT DE NEMOURS AND COMPANY
    Inventors: ALISON MARGARET ANNE BENNETT, Philip L. Boydell, Alexander Zak Bradley, Richard Allen Hayes, Steven C. Pesek, George Wyatt Prejean, Jose Manuel Rodriguez-Parada, Lois A. Santopietro, W. Alexander Shaffer, Charles Anthony Smith, Roger Harquail French
  • Copper (II) complexes for deposition of copper films by atomic layer deposition
    Patent number: 7619107
    Abstract: The present invention relates to novel 1,3-diimines and 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an atomic layer deposition process.
    Type: Grant
    Filed: July 29, 2005
    Date of Patent: November 17, 2009
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Alexander Zak Bradley, Jeffery Scott Thompson, Kyung-Ho Park
  • Method of copper deposition from a supercritical fluid solution containing copper (I) complexes with monoanionic bidentate and neutral monodentate ligands
    Patent number: 7550179
    Abstract: Methods of depositing a copper film onto the surface of a substrate from a supercritical solution containing copper-containing precursors having monoanionic bidentate and neutral monodentate ligands, which comprise contacting the substrate with the solution; heating the substrate to a temperature between about 60° C. and less than 150° C.; and forming a copper-containing film on at least a portion of the substrate surface. Also provided are copper-containing precursor compositions used therein.
    Type: Grant
    Filed: August 30, 2005
    Date of Patent: June 23, 2009
    Assignee: E.I du Pont de Nemours and Company
    Inventors: Jeffrey Scott Thompson, Alexander Zak Bradley, Kyung-Ho Park
  • Volatile copper(II) complexes for deposition of copper films by atomic layer deposition
    Patent number: 7388113
    Abstract: The present invention relates to a process for the synthesis of novel 1,3-diimine copper complexes using amino-imines and novel amino-imines.
    Type: Grant
    Filed: December 16, 2004
    Date of Patent: June 17, 2008
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Alexander Zak Bradley, David Lincoln Thorn
  • Electroluminescent complexes of IR(III) and devices
    Publication number: 20080058517
    Abstract: There are provided compounds of Ir(III) having ?-diketimine ligands. The complexes having Formulae I: where: L is the same or different at each occurrence and is a cyclometalating bidentate monoanionic ligand coordinated through a nitrogen atom and a carbon atom; R1 and R3 can be the same or different and are independently selected from the group consisting of hydrogen, halogen, alkyl, aryl, alkylaryl and heterocyclic groups; and R10 and R11 can be the same or different and are independently selected from the group consisting of hydrogen, halogen, alkyl, aryl, alkylaryl, trialkylsilyl, triarylsilyl, and heterocyclic groups; and R2 is selected from the group consisting of hydrogen, alkyl, aryl, alkylaryl, heterocyclic groups, and fluorine wherein adjacent R groups can join together to form 5- or 6-membered rings. R8 is H, F, or alkyl There are also provided electronic devices containing such compounds.
    Type: Application
    Filed: September 6, 2006
    Publication date: March 6, 2008
    Inventors: Alexander Zak Bradley, Jeffrey A. Merlo
  • Copper (II) Complexes for Deposition of Copper Films by Atomic Layer Deposition
    Publication number: 20080044687
    Abstract: The present invention relates to novel 1,3-diimines and 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an atomic layer deposition process.
    Type: Application
    Filed: July 29, 2005
    Publication date: February 21, 2008
    Inventors: Alexander Zak Bradley, Jeffery Scott Thompson, Kyung-Ho Park
  • Volatile copper (II) complexes and reducing agents for deposition of copper films by Atomic Layer Deposition
    Patent number: 7268365
    Abstract: The present invention relates to novel 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an Atomic Layer Deposition process.
    Type: Grant
    Filed: June 20, 2006
    Date of Patent: September 11, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Alexander Zak Bradley, Jeffery Scott Thornpson, David Lincoln Thorn
  • Composition comprising amino-imine compounds
    Patent number: 7186835
    Abstract: The composition relates to amino-imine compounds used in the formation of 1,3-diimine copper complexes for deposition of copper films.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: March 6, 2007
    Assignee: E. I. duPont de Nemours and Company
    Inventors: Alexander Zak Bradley, Jeffery Scott Thompson, David Lincoln Thorn
  • Volatile copper(II) complexes and reducing agents for deposition of copper films by atomic layer deposition
    Patent number: 7087774
    Abstract: The present invention relates to novel 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an Atomic Layer Deposition process.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: August 8, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Alexander Zak Bradley, David Lincoln Thorn, Jeffery Scott Thornpson
  • Volatile copper(II) complexes for deposition of copper films by atomic layer deposition
    Patent number: 6939578
    Abstract: The present invention relates to novel 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an Atomic Layer Deposition process. This invention also provides a process for making amino-imines and novel amino-imines.
    Type: Grant
    Filed: January 17, 2003
    Date of Patent: September 6, 2005
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Alexander Zak Bradley, Jeffrey Scott Thompson, David Lincoln Thorn
  • Volatile copper(I) complexes for deposition of copper films by atomic layer deposition
    Publication number: 20040247905
    Abstract: The present invention relates to novel 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an Atomic Layer Deposition process.
    Type: Application
    Filed: April 8, 2004
    Publication date: December 9, 2004
    Inventors: Alexander Zak Bradley, Jeffrey Scott Thompson
  • Volatile copper(II) complexes for deposition of copper films by atomic layer deposition
    Publication number: 20030232142
    Abstract: The present invention relates to novel 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an Atomic Layer Deposition process. This invention also provides a process for making amino-imines and novel amino-imines.
    Type: Application
    Filed: January 17, 2003
    Publication date: December 18, 2003
    Inventors: Alexander Zak Bradley, Jeffrey Scott Thompson, David Lincoln Thorn