Patents by Inventor Alexandr DOLGOV

Alexandr DOLGOV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220276553
    Abstract: A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.
    Type: Application
    Filed: August 20, 2020
    Publication date: September 1, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Andrey NIKIPELOV, Sander BALTUSSEN, Vadim Yevgenyevich BANINE, Alexandr DOLGOV, DONMEZ NOYAN, Zomer Silvester HOUWELING, Arnoud Willem NOTENBOOM, Marcus Adrianus VAN DE KERKHOF, Ties Wouter VAN DER WOORD, Paul Alexander VERMEULEN, David Ferdinand VLES, Victoria VORONINA, Halil Gökay YEGEN
  • Publication number: 20210079519
    Abstract: Methods and apparatuses for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated with electromagnetic radiation having a wavelength of less than 100 nm during a deposition process. Furthermore, an electric field controller is configured to apply an electric field that is oriented so as to force secondary electrons away from the substrate. The irradiation locally drives the deposition process in the selected portion and thereby causes the deposition process to, for example, form a layer of material in a pattern defined by the selected portion.
    Type: Application
    Filed: February 21, 2019
    Publication date: March 18, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pieter Willem Herman DE JAGER, Sander Frederik WUISTER, Marie-Claire VAN LARE, Ruben Cornelis MAAS, Alexey Olegovich POLYAKOV, Tamara DRUZHININA, Victoria VORONINA, Evgenia KURGANOVA, Jim Vincent OVERKAMP, Bernardo KASTRUP, Maarten VAN KAMPEN, Alexandr DOLGOV