Abstract: The present invention is a method and apparatus for applying coatings in a rarefied gaseous medium. A cold cathode electron gun is used to generate an electron beam, which is directed to a crucible containing initial solid materials in a vacuum chamber, thus generating an initial solid material vapor. Nitrogen reaction gas is bled into the vacuum chamber, and ionization of the nitrogen gas in high frequency discharge. Subsequent interaction of initial material vapor with nitrogen ions and atoms results in generation of solid product heating of the substrate. Condensation of the vapor on the surface of substrate generates a thin film of solid electrode or electrolyte. The resulting rate of deposition of thin film of vitreous solid electrolyte and LiPon solid electrolyte is substantially higher than can be achieved with a magnetron sputtering process.

Abstract: The present invention involves a method for deposition of thin film and electrochemically active layered coatings for use as components including electrodes and solid electrolytes for electrochemical generation and storage devices including batteries, supercapacitors, fuel cell, solar cell and the like. According to the present invention, evaporation of the starting materials in a reactive gaseous medium is accomplished by means of a gas discharge electron gun with a cold cathode. The electron beam has a given specific power corresponding to the evaporation temperature of the starting material. Deposition of the evaporated starting material onto the substrate in a pressure controlled reactive gaseous medium is carried out at a controlled temperature and rate of condensate formation. This temperature is dependant on the partial pressure of the reactive gas.

Abstract: The present invention is a method and apparatus for applying coatings in a rarefied gaseous medium. A cold cathode electron gun is used to generate an electron beam, which is directed to a crucible containing initial solid materials in a vacuum chamber, thus generating an initial solid material vapor. Nitrogen reaction gas is bled into the vacuum chamber, and ionization of the nitrogen gas in high frequency discharge. Subsequent interaction of initial material vapor with nitrogen ions and atoms results in generation of solid product heating of the substrate. Condensation of the vapor on the surface of substrate generates a thin film of solid electrode or electrolyte. The resulting rate of deposition of thin film of vitreous solid electrolyte and LiPon solid electrolyte is substantially higher than can be achieved with a magnetron sputtering process.