Patents by Inventor Alexandra McClelland
Alexandra McClelland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11681227Abstract: The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.Type: GrantFiled: February 25, 2019Date of Patent: June 20, 2023Inventors: Alex P. G. Robinson, Carmen Popescu, John Roth, Andreas Frommhold, Edward Jackson, Alexandra McClelland, Tom Lada, Greg O'Callahan
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Patent number: 11474430Abstract: The present disclosure relates to novel multiple trigger monomer containing negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions utilize novel monomers and mixtures of novel monomers. The methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.Type: GrantFiled: August 26, 2017Date of Patent: October 18, 2022Assignee: IRRESISTIBLE MATERIALS LTDInventors: Alex Philip Graham Robinson, Alexandra McClelland, Andreas Frommhold, Dongxu Yang, John Roth, David Ure
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Publication number: 20200272050Abstract: The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.Type: ApplicationFiled: February 25, 2019Publication date: August 27, 2020Applicant: IRRESISTIBLE MATERIALS, LTDInventors: Alex P. G. Robinson, Carmen Popescu, John Roth, Andreas Frommhold, Edward Jackson, Alexandra McClelland, Tom Lada, Greg O'Callahan
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Publication number: 20190137876Abstract: The present disclosure relates to novel multiple trigger monomer containing negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions utilize novel monomers and mixtures of novel monomers. The methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.Type: ApplicationFiled: August 26, 2017Publication date: May 9, 2019Inventors: Alex Philip Graham Robinson, Alexandra McClelland, Andreas Frommhold, Dongxu Yang, John Roth, David Ure
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Patent number: 10095112Abstract: The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.Type: GrantFiled: February 24, 2017Date of Patent: October 9, 2018Assignee: IRRESISTIBLE MATERIALS LTDInventors: Alex Phillip Graham Robinson, Alexandra McClelland, Andreas Frommhold, Dongxu Yang, John Roth
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Publication number: 20180246408Abstract: The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.Type: ApplicationFiled: February 24, 2017Publication date: August 30, 2018Applicant: Irresistible Materials, LTDInventors: Alex Phillip Graham Robinson, Alexandra McClelland, Andreas Frommhold, Dongxu Yang, John Roth
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Patent number: 9323149Abstract: The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.Type: GrantFiled: February 24, 2014Date of Patent: April 26, 2016Assignee: IRRESISTIBLE MATERIALS LTDInventors: Alex Philip Graham Robinson, Jon Andrew Preece, Richard Edward Palmer, Andreas Frommhold, Dongxu Yang, Alexandra McClelland, Drew Athans, Xiang Xue
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Patent number: 9256126Abstract: The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.Type: GrantFiled: October 31, 2013Date of Patent: February 9, 2016Assignee: IRRESISTIBLE MATERIALS LTDInventors: Alex Philip Graham Robinson, Jon Andrew Preece, Richard Edward Palmer, Andreas Frommhold, Dongxu Yang, Alexandra McClelland, Drew Athens, Xiang Xu
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Publication number: 20140255849Abstract: The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.Type: ApplicationFiled: February 24, 2014Publication date: September 11, 2014Inventors: Alex Philip Graham Robinson, Jon Andrew Preece, Richard Edward Palmer, Andreas Frommhold, Dongxu Yang, Alexandra McClelland, Drew Athans, Xiang Xue
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Publication number: 20140134843Abstract: The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.Type: ApplicationFiled: October 31, 2013Publication date: May 15, 2014Inventors: Alex Philip Graham Robinson, Jon Andrew Preece, Richard Edward Palmer, Andreas Frommhold, Dongxu Yang, Alexandra McClelland, Drew Athens, Xiang Xu