Abstract: The invention relates to an instrument for measuring the curvature of a surface of a sample (8), comprising a light source (1) and a mask (2), Ie light source (1) illuminating the mask (2) so as to generate a light beam (10) incident on the surface of the sample and to form a light beam (20) reflected by the sample. According to the invention, the mask (2) comprises a transparent background and opaque patterns (14) arranged at predetermined positions, the opaque patterns (14) of the mask having a total surface area smaller than the surface area of the transparent background, the instrument comprises an imaging system (5) and a camera (6) suitable for forming an image (32) of the mask by reflection on the sample (8), an image processing system being suitable for processing the image (32) of the mask by reflection on the surface of the sample, so as to deduce therefrom the radius of the curvature of the sample (8).

Abstract: A method is provided for analyzing a reflective surface through deflectometry, with a system including a display and imaging optics. The method includes the following steps: successively displaying n luminous images on the display, a luminous image having a binarized luminous intensity that is obtained by dithering the pattern M(x?xi), detecting, on the matrix detector, n images obtained by reflection of the n luminous images from the reflective surface, determining a function, referred to as object absolute phase function, based on the n detected images, the function g also satisfying the relationship: g(k·M)=g(M), with k being any real value, comparing the object absolute phase function with a reference absolute phase function, and deducing therefrom information about the shape of the surface.

Abstract: The invention relates to an instrument for measuring the curvature of a surface of a sample (8), comprising a light source (1) and a mask (2), le light source (1) illuminating the mask (2) so as to generate a light beam (10) incident on the surface of the sample and to form a light beam (20) reflected by the sample. According to the invention, the mask (2) comprises a transparent background and opaque patterns (14) arranged at predetermined positions, the opaque patterns (14) of the mask having a total surface area smaller than the surface area of the transparent background, the instrument comprises an imaging system (5) and a camera (6) suitable for forming an image (32) of the mask by reflection on the sample (8), an image processing system being suitable for processing the image (32) of the mask by reflection on the surface of the sample, so as to deduce therefrom the radius of the curvature of the sample (8).

Abstract: A method for measuring the deformation of a reflective surface of an object is provided. The measuring device includes a lighting pattern containing spots of light, a camera and an image-analyzing device, the lighting pattern and the camera being arranged so that, in the measurement position, the virtual or real image of the lighting pattern is visible to the detector of the camera via the surface, the image being representative of the deformation of the lit region. The method comprises the following steps: measuring a distance between the images of two spots of light; computing the ratio between this measured distance and a reference distance; computing, from this ratio, the enlargement in a defined direction; computing the deformation of the reflective surface in the defined direction.

Abstract: A device for measuring a matter flux, including: at least one first light source to emit a first light beam having a measurement wavelength corresponding to the absorption wavelength of an element of interest of the matter flux; an optical connector; and a light sensor to receive, via the optical connector: an attenuated beam resulting from a transmission of the first light beam through the matter flux; and a non-attenuated beam resulting from a transmission of the first light beam without passing through the matter flux. The light sensor is one-dimensional and the optical connector is positioned relative to the light sensor so that the center of the optical connector is aligned with the center of the light sensor, the non-attenuated beam is spectrally directed towards a first part of the light sensor and the attenuated beam is spectrally directed towards a second part of the light sensor.

Abstract: A device for measuring a matter flux, including: at least one first light source to emit a first light beam having a measurement wavelength corresponding to the absorption wavelength of an element of interest of the matter flux; an optical connector; and a light sensor to receive, via the optical connector: an attenuated beam resulting from a transmission of the first light beam through the matter flux; and a non-attenuated beam resulting from a transmission of the first light beam without passing through the matter flux. The light sensor is one-dimensional and the optical connector is positioned relative to the light sensor so that the center of the optical connector is aligned with the center of the light sensor, the non-attenuated beam is spectrally directed towards a first part of the light sensor and the attenuated beam is spectrally directed towards a second part of the light sensor.

Abstract: A method for measuring the deformation of a reflective surface of an object is provided. The measuring device includes a lighting pattern containing spots of light, a camera and an image-analyzing device, the lighting pattern and the camera being arranged so that, in the measurement position, the virtual or real image of the lighting pattern is visible to the detector of the camera via the surface, the image being representative of the deformation of the lit region. The method comprises the following steps: measuring a distance between the images of two spots of light; computing the ratio between this measured distance and a reference distance; computing, from this ratio, the enlargement in a defined direction; computing the deformation of the reflective surface in the defined direction.