Patents by Inventor Alexandre de Chambrier
Alexandre de Chambrier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240145221Abstract: A broad-band sensor for a radio frequency plasma processing system that includes a reaction chamber housing an electrode within a vacuum processing environment. The sensor includes an inductive pickup positioned in the vacuum processing environment proximate to the electrode. The inductive pickup includes a wire formed into a loop extending in an azimuthal direction about a symmetry axis of the reaction chamber. A lead carrying an electric signal from the inductive pickup extends through a vacuum wall of the reaction chamber outside the vacuum processing environment. An attenuator circuit including an electrical resistance bridge couples the lead to a signal carrier extending outside the vacuum processing environment. The broad-band sensor has radio frequency detection capability for measuring electromagnetic surface modes within the plasma chamber and coupling the measured electromagnetic surface modes to the signal carrier.Type: ApplicationFiled: October 11, 2023Publication date: May 2, 2024Applicant: COMET TECHNOLOGIES USA, INC.Inventors: STEPHEN E. SAVAS, ALEXANDRE DE CHAMBRIER, IVAN SHKURENKOV
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Patent number: 11961711Abstract: A method of providing data on radio frequency pulses in a radio frequency plasma processing system, the method including measuring an electrical parameter within a matching network of the radio frequency plasma processing system; determining an attribute of the measurement of the electrical parameter; defining a first statistic for the attribute of the measurement of the electrical parameter; defining a second statistic based on the first statistic for at least one of a phase and a process; delivering the first statistic and second statistic to a user; and storing the first statistic and the second statistic within the matching network.Type: GrantFiled: January 19, 2021Date of Patent: April 16, 2024Assignee: COMET TECHNOLOGIES USA, INC.Inventor: Alexandre De Chambrier
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Patent number: 11887820Abstract: A radio frequency plasma processing system including a reaction chamber, an electrode having an electrode symmetry axis, the electrode disposed in the reaction chamber, and a plurality of plates, each having an electrically conducting layer, disposed in the reaction chamber azimuthally with respect to the electrode symmetry axis around a perimeter of the electrode at a gap from the electrode surface, each of the plurality of plates connected to an electrical ground through a variable reactance circuit.Type: GrantFiled: January 8, 2021Date of Patent: January 30, 2024Assignee: COMET TECHNOLOGIES USA, INC.Inventors: Stephen E. Savas, Alexandre De Chambrier
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Patent number: 11830708Abstract: A broad-band sensor for a radio frequency plasma processing system that includes a reaction chamber housing an electrode within a vacuum processing environment. The sensor includes an inductive pickup positioned in the vacuum processing environment proximate to the electrode. The inductive pickup includes a wire formed into a loop extending in an azimuthal direction about a symmetry axis of the reaction chamber. A lead carrying an electric signal from the inductive pickup extends through a vacuum wall of the reaction chamber outside the vacuum processing environment. An attenuator circuit including an electrical resistance bridge couples the lead to a signal carrier extending outside the vacuum processing environment. The broad-band sensor has radio frequency detection capability for measuring electromagnetic surface modes within the plasma chamber and coupling the measured electromagnetic surface modes to the signal carrier.Type: GrantFiled: January 8, 2021Date of Patent: November 28, 2023Assignee: COMET TECHNOLOGIES USA, INC.Inventors: Stephen E. Savas, Alexandre De Chambrier
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Publication number: 20230260755Abstract: A method of detecting plasma asymmetry in a radio frequency plasma processing system, the method including providing a radio frequency power to a reaction chamber having an approximate chamber symmetry axis and receiving from a plurality of broadband electromagnetic sensors a radio frequency signal. The method also including processing the radio frequency signals using Fourier analysis and determining based on the Fourier analysis of the radio frequency signals that a plasma asymmetry has occurred within the reaction chamber.Type: ApplicationFiled: April 25, 2023Publication date: August 17, 2023Applicant: COMET TECHNOLOGIES USA, INC.Inventors: STEPHEN E. SAVAS, ALEXANDRE DE CHAMBRIER
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Patent number: 11670488Abstract: A method of detecting plasma asymmetry in a radio frequency plasma processing system, the method including providing a radio frequency power to a reaction chamber having an approximate chamber symmetry axis and receiving from a plurality of broadband electromagnetic sensors a radio frequency signal. The method also including processing the radio frequency signals using Fourier analysis and determining based on the Fourier analysis of the radio frequency signals that a plasma asymmetry has occurred within the reaction chamber.Type: GrantFiled: January 8, 2021Date of Patent: June 6, 2023Assignee: COMET TECHNOLOGIES USA, INC.Inventors: Stephen E. Savas, Alexandre De Chambrier
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Patent number: 11605527Abstract: A method of controlling a radio frequency processing system, the method including determining an end time of a radio frequency pulse; stopping a load applied to the radio frequency processing system based on the end time of the radio frequency pulse; adjusting an additional load having a predetermined impedance applied to the radio frequency processing system in response to the determined end time; determining a start point of a second radio frequency pulse; and stopping the additional load before the second radio frequency pulse occurs.Type: GrantFiled: January 19, 2021Date of Patent: March 14, 2023Assignee: COMET TECHNOLOGIES USA, INC.Inventors: Alexandre De Chambrier, Stephen E. Savas
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Patent number: 11521832Abstract: A radio frequency plasma processing system including a reaction chamber, a pedestal disposed in the reaction chamber, and a plurality of sector plates disposed azimuthally around the pedestal in an annulus between the pedestal and the reaction chamber.Type: GrantFiled: January 8, 2021Date of Patent: December 6, 2022Assignee: COMET TECHNOLOGIES USA, INC.Inventors: Stephen E. Savas, Alexandre De Chambrier
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Publication number: 20210225613Abstract: A method of controlling a radio frequency processing system, the method including determining an end time of a radio frequency pulse; stopping a load applied to the radio frequency processing system based on the end time of the radio frequency pulse; adjusting an additional load having a predetermined impedance applied to the radio frequency processing system in response to the determined end time; determining a start point of a second radio frequency pulse; and stopping the additional load before the second radio frequency pulse occurs.Type: ApplicationFiled: January 19, 2021Publication date: July 22, 2021Inventors: STEPHEN E. SAVAS, ALEXANDRE DE CHAMBRIER
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Publication number: 20210217589Abstract: A radio frequency plasma processing system including a reaction chamber, a pedestal disposed in the reaction chamber, and a plurality of sector plates disposed azimuthally around the pedestal in an annulus between the pedestal and the reaction chamber.Type: ApplicationFiled: January 8, 2021Publication date: July 15, 2021Inventors: STEPHEN E. SAVAS, ALEXANDRE DE CHAMBRIER
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Publication number: 20210217588Abstract: A radio frequency plasma processing system including a reaction chamber having an approximate chamber symmetry axis, a first plasma powering device, and a plurality of azimuthally disposed broadband electromagnetic sensors located approximately equidistant from the chamber symmetry axis to measure electromagnetic behavior about the reaction chamber during a radio frequency plasma process.Type: ApplicationFiled: January 8, 2021Publication date: July 15, 2021Inventors: STEPHEN E. SAVAS, ALEXANDRE DE CHAMBRIER
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Publication number: 20210217593Abstract: A radio frequency plasma processing system including a reaction chamber, an electrode having an electrode symmetry axis, the electrode disposed in the reaction chamber, and a plurality of plates, each having an electrically conducting layer, disposed in the reaction chamber azimuthally with respect to the electrode symmetry axis around a perimeter of the electrode at a gap from the electrode surface, each of the plurality of plates connected to an electrical ground through a variable reactance circuit.Type: ApplicationFiled: January 8, 2021Publication date: July 15, 2021Inventors: STEPHEN E. SAVAS, ALEXANDRE DE CHAMBRIER
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Publication number: 20210217595Abstract: A broad-band sensor for a radio frequency plasma processing system including a capacitive pickup for electrical potentials disposed on an electrically conducting component of a reaction chamber. Also, a lead that comprises a circuit, the lead connecting the pickup to a connector mounted into an electrically grounded plate proximate the pickup with an electrical resistance of the circuit and a capacitance to an electrical ground of the connector being such that the pickup voltage differs by less than 5% from a surface voltage of the electrically conducting component and an attenuator circuit connected to the connector, comprising at least one current limiting resistor in series from an attenuator input to an attenuator output, wherein the broad-band sensor has detection within a radio frequency range from about 10 kHz to at least about 1 GHz for radio frequency electrical potential measurements in the radio frequency plasma processing system.Type: ApplicationFiled: January 8, 2021Publication date: July 15, 2021Inventors: STEPHEN E. SAVAS, ALEXANDRE DE CHAMBRIER
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Publication number: 20210217587Abstract: A method of detecting non-uniformity in a plasma in a radio frequency plasma processing system, the method including generating a plasma within a reaction chamber of the radio frequency plasma processing system and detecting electrical signals from the plasma in a frequency range from a frequency of radio frequency power sustaining the plasma to a multiple of about ten times a frequency with a plurality of sensors disposed azimuthally about a chamber symmetry axis of the radio frequency plasma processing system. The method also including comparing the waveforms of the electrical signals picked up from the plasma by the plurality of sensors and determining when a plasma non-uniformity occurs based on the comparing the electrical property of the plasma detected by each of the plurality of sensors.Type: ApplicationFiled: January 8, 2021Publication date: July 15, 2021Inventors: STEPHEN E. SAVAS, ALEXANDRE DE CHAMBRIER
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Publication number: 20210217590Abstract: A method of detecting plasma asymmetry in a radio frequency plasma processing system, the method including providing a radio frequency power to a reaction chamber having an approximate chamber symmetry axis and receiving from a plurality of broadband electromagnetic sensors a radio frequency signal. The method also including processing the radio frequency signals using Fourier analysis and determining based on the Fourier analysis of the radio frequency signals that a plasma asymmetry has occurred within the reaction chamber.Type: ApplicationFiled: January 8, 2021Publication date: July 15, 2021Inventors: STEPHEN E. SAVAS, ALEXANDRE DE CHAMBRIER
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Publication number: 20130206725Abstract: Disclosed are methods and associated apparatus for depositing layers of material on a substrate (e.g., a semiconductor substrate) using ionized physical vapor deposition (iPVD). Also disclosed are methods and associated apparatus for plasma etching (e.g., resputtering) layers of material on a semiconductor substrate.Type: ApplicationFiled: March 16, 2010Publication date: August 15, 2013Inventors: Karl Leeser, Ishtak Karim, Alexandre de Chambrier, Liqi Wu, Chunming Zhou
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Patent number: 5986874Abstract: An electrostatic support assembly for supporting a substrate. The support assembly includes a non-metallic body having a support surface for supporting the substrate and an integral peripheral outer portion extending outwardly from and substantially surrounding the support surface of the substrate. The support assembly also includes at least one electrode carried by the non-metallic body for electrostatically coupling a substrate to the support surface of the non-metallic body and a base coupled to the underside of the non-metallic body for the transfer of heat between the non-metallic body and the base.Type: GrantFiled: June 3, 1997Date of Patent: November 16, 1999Assignee: Watkins-Johnson CompanyInventors: Eric Ross, Jae Park, Alexandre de Chambrier