Patents by Inventor Alexandre V. Demtchouk

Alexandre V. Demtchouk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8681594
    Abstract: An EAMR disk drive includes a media, a laser, and a slider coupled with the laser. The laser for provides energy. The slider has an air-bearing surface, a laser input side, an EAMR transducer and an antireflective coating (ARC) layer occupying a portion of the laser input side. The ARC layer is configured to reduce back reflections of the energy. The EAMR transducer includes a write pole, a waveguide optically coupled with the laser and at least one coil. The waveguide has a waveguide input. A portion of the ARC layer resides between the laser and the waveguide input. A method aligns the laser to the ARC layer, and then aligns the laser to the waveguide input. The laser may then be coupled to the slider.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: March 25, 2014
    Assignee: Western Digital (Fremont), LLC
    Inventors: Zhong Shi, Arkadi B. Goulakov, Alexandre V. Demtchouk, Lei Wang, Michael V. Morelli
  • Publication number: 20100183957
    Abstract: Aspects include methods to produce pattern media templates and the templates. A pattern of resist structures is formed on a first material layer. A conformal layer of a second material is deposited on the resist pattern, covering tops and side walls of the resist structures. The first material is more resistant to ion milling than the second material, and less resistant to plasma etching than the second material. The first material can be amorphous carbon and the second material can be aluminum oxide. The second material is removed on the tops, and preserved on the side walls. The resist structures and portions of the first layer not supporting second layer material are removed by plasma. The remaining structure is 2× denser than the resist pattern. Conformal deposition of second material and ion milling can be repeated.
    Type: Application
    Filed: January 21, 2009
    Publication date: July 22, 2010
    Applicant: Seagate Technology LLC
    Inventors: Zhongyan Wang, Thomas R. Boonstra, Mark H. Ostrowski, Alexandre V. Demtchouk, Xilin Peng, Kaizhong Gao